| US 7,476,881 B2 | ||
| Charged beam drawing apparatus and charged beam drawing method | ||
| Kiyoshi Hattori, Tokyo (Japan); Kenji Ohtoshi, Kawasaki (Japan); Tomohiro Iijima, Numazu (Japan); Yoshiaki Onimaru, Numazu (Japan); Hayato Kimura, Numazu (Japan); and Tateki Watanabe, Tagata-gun (Japan) | ||
| Assigned to NuFlare Technology, Inc., Numazu-shi (Japan) | ||
| Filed on Nov. 15, 2006, as Appl. No. 11/560,127. | ||
| Claims priority of application No. 2005-332998 (JP), filed on Nov. 17, 2005; and application No. 2006-047787 (JP), filed on Feb. 24, 2006. | ||
| Prior Publication US 2007/0114461 A1, May 24, 2007 | ||
| Int. Cl. G21K 5/04 (2006.01) | ||
| U.S. Cl. 250—492.22 [250/492.1; 250/492.2; 250/492.21; 250/492.3; 250/396 ML] | 16 Claims |
| 1. A charged beam drawing apparatus which draws a desired pattern on a sample by use of a charged beam deflected in main/sub
two stages, comprising:
a main deflector which deflects a charged beam, the main deflector sequentially selecting a plurality of sub-deflection drawing
regions obtained by dividing a main deflection drawing region of a sample,
a main deflection driving unit which drives the main deflector,
a sub deflector which deflects the charged beam in the selected sub deflection region, the sub deflector drawing a pattern
in the selected sub deflection region, and
a sub deflection driving unit which drives the sub deflector, the sub deflection driving unit including a sub deflection sensitivity
correction circuit which corrects deflection sensitivity according to a shot position in the sub deflection region, a sub
deflection astigmatic correction circuit which corrects a deflection astigmatic point according to a shot position in the
sub deflection region, an adder circuit which superimposes an output of the sub deflection sensitivity correction circuit
and an output of the sub deflection astigmatic correction circuit and a deflection amplifier which applies an output of the
adder circuit to the sub deflector.
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