| US 7,476,490 B2 | ||
| Method for producing a marker on a substrate, lithographic apparatus and device manufacturing method | ||
| Maurits Van Der Schaar, Veldhoven (Netherlands); Jacobus Burghoorn, Haelen (Netherlands); Richard Johannes Franciscus Van Haren, Waalre (Netherlands); Everhardus Cornelis Mos, Eindhoven (Netherlands); and Rene Monshouwer, Leiden (Netherlands) | ||
| Assigned to ASML Netherlands B.V., Veldhoven (Netherlands) | ||
| Filed on Jun. 25, 2004, as Appl. No. 10/875,605. | ||
| Prior Publication US 2006/0008714 A1, Jan. 12, 2006 | ||
| Int. Cl. G03C 9/00 (2006.01) | ||
| U.S. Cl. 430—292 [430/330] | 14 Claims |
| 7. A method of producing a marker on a substrate, comprising:
projecting a patterned beam on a layer of resist disposed on a substrate in a lithographic apparatus to create a latent marker;
and
within the lithographic apparatus, locally heating a selected portion of the substrate, said selected portion including the
latent marker, to substantially increase a detectability of the latent marker.
|