US 7,475,588 B2
	Apparatus and process for sensing fluoro species in semiconductor processing systems
Frank Dimeo, Jr., Danbury, Conn. (US); Philip S. H. Chen, Bethel, Conn. (US); Jeffrey W. Neuner, Bethel, Conn. (US); James Welch, Wolcott, Conn. (US); Michele Stawacz, New Milford, Conn. (US); Thomas H. Baum, New Fairfield, Conn. (US); Mackenzie E. King, Southbury, Conn. (US); Ing-Shin Chen, Danbury, Conn. (US); and Jeffrey F. Roeder, Brookfield, Conn. (US)
Assigned to Advanced Technology Materials, Inc., Danbury, Conn. (US)
Filed on Feb. 14, 2005, as Appl. No. 11/57,734.
Application 11/057734 is a division of application No. 10/273036, filed on Oct. 17, 2002, granted, now 7,080,545.
Prior Publication US 2005/0205424 A1, Sep. 22, 2005
Int. Cl. G01N 9/00 (2006.01)

U.S. Cl. 73—31.05  [73/23.2; 73/25.01; 73/31.06]

64 Claims

1. A gas sensor assembly including an array of posts, and one or more free-standing metal sensor wire(s) woven about said posts to provide a woven wire structure for contacting with gas susceptible to presence of one or more target species therein with which the wire is interactive to produce a response indicative of the presence of said one or more target species.