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 [Search a list of Patent Appplications for class 564]   CLASS 564,ORGANIC COMPOUNDS -- PART OF THE CLASS 532-570 SERIES
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SUBCLASSES

[List of Patents for class 564 subclass 1]    1AMINO NITROGEN CONTAINING (E.G., UREA, SULFONAMIDES, NITROSAMINES, OXYAMINES, ETC., AND SALTS THEREOF)
 This subclass is indented under subclass 1.  Compounds under Class 532, ... which contain nitrogen in a form other than as nitrogen in an inorganic ion of an addition salt, nitro, or nitroso.
(1) Note. This group of compounds includes for example, ureas, thioureas, amides, amidines, azines, hydrazones, carbodiimides, oximes, hydroxylamines, and amines, inter alia, as well as their inorganic acid salts.
(2) Note. This subclass is residual for alicyclic amines not specifically provided for below.
(3) Note. This subclass contains, for example:

Image 1 for class 564 subclass 1

(4) Note. If amino nitrogen is present, the compound may additionally contain nitro, nitroso, or nitrogen in an inorganic ion of an addition salt.
(5) Note. Component parts of an "adduct" will be considered to be attached to each other ionically, except if it is clear that the mode of attachment is nonionic.

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588Hazardous or Toxic Waste Destruction or Containment,   subclasses 405 through 409for the chemical destruction of organic hazardous or toxic waste containing halogen, sulfur, oxygen, nitrogen, phosphorus, or metals.
  
[List of Patents for class 564 subclass 1.5]    1.5Adducts or inclusion compounds of urea per se or of of thiourea per se with organic compounds (e.g., urea-alkane inclusion compounds, etc.)
 This subclass is indented under subclass 1.  Compounds wherein urea, per se, of thiourea, per se, forms an adduct or inclusion compound with an organic compound.
(1) Note. by adduct or inclusion compound is meant a type of complex in which the urea or thiourea is bound with another suitable chemical without changing the chemical character of either the urea-thiourea or of the other chemical; the respective molecules will be unaltered in their chemical nature and the individual compounds may readily be constituted and isolated.
(2) Note. An example of a compound provided for herein is the adduct of urea and an alkane.
  
[List of Patents for class 564 subclass 2]    2With preservative or stabilizer
 This subclass is indented under subclass 1.  Products wherein the amino nitrogen containing compound is mixed with a preserving agent whose sole function is to prevent physical or chemical change.
  
[List of Patents for class 564 subclass 3]    3Ureas or thioureas with preservative or stabilizer
 This subclass is indented under subclass 2.  Products wherein the compound stabilized or preserved contains the grouping below, wherein X is O or S. NN
  
[List of Patents for class 564 subclass 4]    4Carboxamides with preservative or stabilizer
 This subclass is indented under subclass 2.  Products wherein the compound stabilized or preserved is a carboxamide containing the grouping RN
  
[List of Patents for class 564 subclass 5]    5Benzene ring containing compound with preservative or stabilizer
 This subclass is indented under subclass 2.  Products wherein the compound being preserved contains a benzene ring.
  
[List of Patents for class 564 subclass 6]    6Inorganic preservative or stabilizer
 This subclass is indented under subclass 5.  Products wherein the preserving or stabilizing agent is inorganic.
  
[List of Patents for class 564 subclass 7]    7Sulfur or phenol containing preservative or stabilizer
 This subclass is indented under subclass 5.  Products wherein the preserving or stabilizing agent contains sulfur or a phenolic group.
  
[List of Patents for class 564 subclass 8]    8Boron containing (e.g., boron containing complexes, salts, etc.)
 This subclass is indented under subclass 1.  Compounds which contain boron.
(1) Note. This subclass contains boron containing complexes, adducts, and salts.
(2) Note. This subclass contains, for example:

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[List of Patents for class 564 subclass 9]    9Boron attached directly to amino nitrogen by nonionic bonding
 This subclass is indented under subclass 8.  Compounds wherein the boron is directly attached to an amino nitrogen by nonionic bonding.
(1) Note. This subclass contains, for example:

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[List of Patents for class 564 subclass 10]    10The boron and amino nitrogen are members of the same ring
 This subclass is indented under subclass 9.  Compounds wherein the nonionically bonded boron and amino nitrogen are both members of the same ring.
(1) Note. This subclass contains, for example:

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[List of Patents for class 564 subclass 11]    11Polycyclo ring system having the nitrogen and boron containing ring as one of the cyclos
 This subclass is indented under subclass 10.  Compounds wherein the boron and nitrogen containing ring is part of a polycyclo ring system.
(1) Note. This subclass contains, for example:

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[List of Patents for class 564 subclass 12]    12Phosphorus attached directly to amino nitrogen by nonionic bonding
 This subclass is indented under subclass 1.  Compounds which contain phosphorus directly attached to an amino nitrogen by nonionic bonding.
(1) Note. This subclass contains, for example:

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[List of Patents for class 564 subclass 13]    13The phosphorus and nitrogen are members of the same ring
 This subclass is indented under subclass 12.  Compounds wherein the phosphorus and amino nitrogen are both members of the same ring.
(1) Note. This subclass contains, for example:

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[List of Patents for class 564 subclass 14]    14Chalcogen and plural nitrogens bonded directly to the same phosphorus
 This subclass is indented under subclass 12.  Compounds wherein at least two amino nitrogens and oxygen or sulfur are bonded to the same phosphorus.
(1) Note. This subclass contains, for example:

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[List of Patents for class 564 subclass 15]    15Phosphorus attached indirectly to amino nitrogen by nonionic bonding
 This subclass is indented under subclass 1.  Compounds which contain phosphorus indirectly attached to amino nitrogen by nonionic bonding.
(1) Note. This subclass contains, for example:

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[List of Patents for class 564 subclass 16]    16The phosphorus is a ring member
 This subclass is indented under subclass 15.  Compounds wherein the phosphorus is a member of a ring.
(1) Note. This subclass contains, for example:

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[List of Patents for class 564 subclass 17]    17Thioureas (i.e., HNH-C(=S)-HNH, wherein substitution may be made for hydrogen only)
 This subclass is indented under subclass 1.  Compounds which contain the grouping NN
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 17

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558Organic Compounds,   subclasses 4 and 5 for isothioureas or pseudothioureas.
  
[List of Patents for class 564 subclass 18]    18Thiocarbazides or thiosemicarbazides (i.e. HNH-NH-C(=S)-HNH, wherein the N bonded directly to the thiourea N is an amino N and substitution may be made for hydrogen only)
 This subclass is indented under subclass 17.  Compounds which contain the thiocarbazide radical wherein an amino nitrogen is bonded directly to each of the thiorea nitrogens, or the thiosemicarbazide radical wherein an amino nitrogen is bonded to one thiourea nitrogen -N- .
(1) Note. This subclass contains, for example:

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[List of Patents for class 564 subclass 19]    19Thiocarbazones or thiosemicarbazones (i.e., HCH=N-NH-C(=S)-HNH, wherein substitution may be made for hydrogen only)
 This subclass is indented under subclass 18.  Compounds which contain the thiocarbazone radical (Figure 1) or the thiosemicarbazone radical (Fig.2).

FIGURE 1

FIGURE 1

FIGURE 2

FIGURE 2

(1) Note. This subclass contains, for example:

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[List of Patents for class 564 subclass 20]    20Benzene ring containing
 This subclass is indented under subclass 19.  Compounds which contain a benzene ring.
(1) Note. This subclass contains, for example:

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[List of Patents for class 564 subclass 21]    21Additional nitrogen attached indirectly to the thiocarbonyl by nonionic bonding
 This subclass is indented under subclass 20.  Compounds which contain nitrogen in addition to that of the thiocarbazone or thiosemicarbazone.
(1) Note. This subclass contains, for example:

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[List of Patents for class 564 subclass 22]    22Thiobiurets (i.e., HNH-C(=S)-NH-C(=X)-HNH, wherein X is S or O and substitution may be made for hydrogen only)
 This subclass is indented under subclass 17.  Compounds which contain the grouping in the figure below, wherein X may be oxygen or sulfur, i.e., mono- or dithiobiurets. --
(1) Note. This subclass contains, for example:

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[List of Patents for class 564 subclass 23]    23Carbonyl, sulfur, or cyano attached directly to thiourea nitrogen by nonionic bonding
 This subclass is indented under subclass 17.  Compounds wherein a thiourea nitrogen has carbonyl, sulfur, or cyano group directly attached by nonionic bonding.
(1) Note. This subclass contains, for example:

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[List of Patents for class 564 subclass 24]    24Processes utilizing carbon disulfide
 This subclass is indented under subclass 17.  Processes wherein carbon disulfide is utilized in preparing a thiourea.
(1) Note. This subclass contains, for example, the reaction of aniline and carbon disulfide to produce thiocarbanilide.
  
[List of Patents for class 564 subclass 25]    25Processes utilizing cyano containing compound
 This subclass is indented under subclass 17.  Processes wherein a cyano compound is utilized in preparing a thiourea.
(1) Note. This subclass contains, for example, the production of thiourea by reaction of cyanamide with hydrogen sulfide.
  
[List of Patents for class 564 subclass 26]    26Benzene ring containing
 This subclass is indented under subclass 17.  Compounds which contain a benzene ring.
(1) Note. This subclass contains, for example:

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[List of Patents for class 564 subclass 27]    27Nitrogen attached indirectly to the thiocarbonyl by nonionic bonding
 This subclass is indented under subclass 26.  Compounds which contain nitrogen in addition to the thiourea nitrogen.
(1) Note. This subclass contains, for example:

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[List of Patents for class 564 subclass 28]    28Hydroxy, bonded directly to carbon, or ether containing (H of -OH may be replaced by a substituted or unsubstituted ammonium ion or a Group IA or IIA light metal)
 This subclass is indented under subclass 26.  Compounds which contain a hydroxyl group bonded directly to a carbon, or an ether, wherein H of the -OH may be replaced by a substituted or unsubstituted ammonium ion or a group IA or IIA light metal.
(1) Note. This subclass contains, for example:

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[List of Patents for class 564 subclass 29]    29Halogen attached indirectly to the thiocarbonyl by nonionic bonding
 This subclass is indented under subclass 26.  Compounds which contain halogen nonionically bonded.
(1) Note. This subclass contains, for example:

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[List of Patents for class 564 subclass 30]    30Acyclic
 This subclass is indented under subclass 17.  Compounds which do not contain any ring.
(1) Note. This subclass contains, for example:

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[List of Patents for class 564 subclass 31]    31Thiourea per se or salt thereof
 This subclass is indented under subclass 30.  The compound which is thiourea, or its salts and processes of preparation not provided for above.
  
[List of Patents for class 564 subclass 32]    32Ureas (i.e., HNH-CO-HNH, wherein substitution may be made for hydrogen only)
 This subclass is indented under subclass 1.  Compounds which have the grouping - -
(1) Note. This subclass contains, for example, adducts of urea with inorganic compounds such as hydrogen peroxide or calcium nitrate.

SEE OR SEARCH THIS CLASS, SUBCLASS:

260,Chemistry of Carbon Compounds, subclass 96.5 for adducts of urea with organic compounds.
558,Organic Compounds, subclass 8 for isoureas or pseudoureas.
564,Organic Compounds, subclass 1.5 for adducts of urea with organic compounds.
  
[List of Patents for class 564 subclass 33]    33Nitro or nitroso bonded directly to nitrogen
 This subclass is indented under subclass 32.  Compounds which contain a nitro or nitroso group bonded directly to an amino nitrogen (i.e., nitramine or nitrosamine containing).
(1) Note. This subclass contains, for example:

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[List of Patents for class 564 subclass 34]    34Carbazides or semicarbazides (i.e., HNH-NH-CO-HNH, wherein substitution may be made for hydrogen only)
 This subclass is indented under subclass 32.  Compounds which are carbazides or semicarbazides containing the grouping.

Image 1 for class 564 subclass 34

(1) Note. This subclass contains, for example:

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[List of Patents for class 564 subclass 35]    35Carbonyl or sulfur attached directly to carbazide or semicarbazide nitrogen by nonionic bonding
 This subclass is indented under subclass 34.  Compounds wherein a carbonyl group or sulfur is attached directly to a carbazide or semicarbazide nitrogen by nonionic bonding.
(1) Note. This subclass contains, for example:

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[List of Patents for class 564 subclass 36]    36Carbazones or semicarbazones (i.e., HCH=N-NH-CO-HNH, wherein substitution may be made for hydrogen only)
 This subclass is indented under subclass 34.  Compounds which contain the carbazone radical (Fig. 1) or the semicarbazone radical (Fig. 2).

FIGURE 1

FIGURE 1

FIGURE 2

FIGURE 2

(1) Note. This subclass contains, for example:

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[List of Patents for class 564 subclass 37]    37Acyclic
 This subclass is indented under subclass 34.  Compounds which do not contain any ring.
(1) Note. This subclass contains, for example:

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[List of Patents for class 564 subclass 38]    38Biurets (i.e., HNH-CO-NH-CO-HNH, wherein substitution may be made for hydrogen only)
 This subclass is indented under subclass 32.  Compounds which are biurets and contain the grouping --
(1) Note. This subclass contains, for example:

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[List of Patents for class 564 subclass 39]    39Sulfur attached directly to urea nitrogen by nonionic bonding
 This subclass is indented under subclass 32.  Compounds which contain sulfur attached directly to urea nitrogen by nonionic bonding.
(1) Note. This subclass contains, for example:

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[List of Patents for class 564 subclass 40]    40The sulfur is part of a substituent which contains nitrogen
 This subclass is indented under subclass 39.  Compounds wherein the sulfur is part of a group which contains additional nitrogen.
(1) Note. This subclass contains, for example:

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[List of Patents for class 564 subclass 41]    41The substituent nitrogen is the nitrogen of a benzamido group (e.g., Cl benzene-CO-NH-HCH-(O=)S(=O)-, bonded directly to urea nitrogen, etc.)
 This subclass is indented under subclass 40.  Compounds wherein the additional nitrogen is the nitrogen of a benzamido group.
(1) Note. This subclass contains, for example:

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[List of Patents for class 564 subclass 42]    42The sulfur is part of a monocyclic benzene ring containing substituent
 This subclass is indented under subclass 39.  Compounds wherein the sulfur is part of a substituent which is monocyclic and aromatic.
(1) Note. This subclass contains, for example:

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[List of Patents for class 564 subclass 43]    43Alicyclic ring bonded directly to urea nitrogen
 This subclass is indented under subclass 42.  Compounds wherein an alicyclic ring is bonded directly to a urea nitrogen.
(1) Note. This subclass contains, for example:

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[List of Patents for class 564 subclass 44]    44Additional carbonyl bonded directly to urea nitrogen
 This subclass is indented under subclass 32.  Compounds in which a urea nitrogen has been amidated by a carboxylic acid.
(1) Note. This subclass contains, for example:

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[List of Patents for class 564 subclass 45]    45The additional carbonyl is in a substituent which is acyclic
 This subclass is indented under subclass 44.  Compounds wherein the carboxylic acid contains no ring.
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 45

SEE OR SEARCH CLASS:

554Organic Compounds,   subclass 56 for compounds where the carboxylic acid is a higher fatty acid.
  
[List of Patents for class 564 subclass 46]    46Carbon to carbon unsaturation in the substituent
 This subclass is indented under subclass 45.  Compounds wherein the carboxylic acid contains a double or triple bond.
(1) Note. This subclass contains, for example:

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[List of Patents for class 564 subclass 47]    47Benzene ring containing
 This subclass is indented under subclass 32.  Compounds which contain a benzene ring (i.e., aromatic).
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 47

  
[List of Patents for class 564 subclass 48]    48Benzene ring bonded directly to urea nitrogen (i.e., anilides)
 This subclass is indented under subclass 47.  Compounds which are anilides, wherein a benzene ring is directly bonded to a urea nitrogen.
(1) Note. This subclass contains, for example:

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[List of Patents for class 564 subclass 49]    49The benzene ring is part of a substituent which contains sulfur
 This subclass is indented under subclass 48.  Compounds wherein the benzene ring is part of a substituent which contains sulfur
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 49

  
[List of Patents for class 564 subclass 50]    50The benzene ring is part of a substituent which contains nitrogen
 This subclass is indented under subclass 48.  Compounds wherein the benzene ring is part of a substituent which contains additional nitrogen.
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 50

  
[List of Patents for class 564 subclass 51]    51The substituent nitrogen is attached indirectly to the benzene ring by acyclic nonionic bonding
 This subclass is indented under subclass 50.  Compounds wherein the additional nitrogen is indirectly bonded to the benzene ring by acyclic nonionic bonding.
(1) Note. This subclass contains, for example:

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[List of Patents for class 564 subclass 52]    52The benzene ring is part of a substituent which contains oxygen
 This subclass is indented under subclass 48.  Compounds wherein the benzene ring is part of a substituent which contains oxygen.
(1) Note. This subclass contains, for example:

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[List of Patents for class 564 subclass 53]    53The benzene ring is part of a substituent which contains halogen bonded directly to carbon
 This subclass is indented under subclass 48.  Compounds wherein the benzene ring is part of a substituent which contains halogen bonded directly to carbon.
(1) Note. This subclass contains, for example:

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[List of Patents for class 564 subclass 54]    54The halogen is fluorine
 This subclass is indented under subclass 53.  Compounds wherein the halogen is fluorine.
(1) Note. This subclass contains, for example:

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[List of Patents for class 564 subclass 55]    55Plural benzene rings bonded directly to urea nitrogen
 This subclass is indented under subclass 48.  Compounds wherein more than one benzene ring is bonded directly to the same urea nitrogen or to different urea nitrogen.
(1) Note. This subclass contains, for example:

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[List of Patents for class 564 subclass 56]    56Aralkyl bonded directly to urea nitrogen
 This subclass is indented under subclass 47.  Compounds wherein an aralkyl group is bonded directly to a urea nitrogen.
(1) Note. This subclass contains, for example:

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[List of Patents for class 564 subclass 57]    57Alicyclic ring containing
 This subclass is indented under subclass 32.  Compounds which contain an alicyclic group.
(1) Note. This subclass contains, for example:

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[List of Patents for class 564 subclass 58]    58Additional carbon bonded directly to urea nitrogen
 This subclass is indented under subclass 32.  Compounds which contain an alkyl or substituted alkyl group bonded directly to a urea nitrogen.
(1) Note. This subclass contains, for example:

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[List of Patents for class 564 subclass 59]    59The additional carbon is part of a substituent which contains nitrogen
 This subclass is indented under subclass 58.  Compounds wherein the alkyl group contains an additional nitrogen.
(1) Note. This subclass contains, for example:

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[List of Patents for class 564 subclass 60]    60The additional carbon is part of a substituent which contains oxygen
 This subclass is indented under subclass 58.  Compounds wherein the alkyl group contains oxygen as a substituent.
(1) Note. This subclass contains, for example:

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[List of Patents for class 564 subclass 61]    61Processes
 This subclass is indented under subclass 58.  Processes for the preparation, purification, separation, or recovery of compounds classified therein.
  
[List of Patents for class 564 subclass 62]    62Preparing directly from compound having carbon to carbon unsaturation
 This subclass is indented under subclass 61.  Processes wherein one of the starting materials contain a double or triple bond between two carbons.
  
[List of Patents for class 564 subclass 63]    63Urea per se or salt thereof
 This subclass is indented under subclass 32.  The compound which is urea or salts thereof.

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32,for complexes of urea with inorganic compounds.
  
[List of Patents for class 564 subclass 64]    64Preparing directly from cyano containing compound
 This subclass is indented under subclass 63.  Processes which utilize a cyano containing compound, for example, calcium cyanamide in the preparation of urea.
  
[List of Patents for class 564 subclass 65]    65Preparing directly from ammonia and carbonmonoxide or carbon oxysulfide (e.g., from ammonia and COS, etc.)
 This subclass is indented under subclass 63.  Processes in which urea is prepared by reacting ammonia with carbon monoxide or carbon oxysulfide.
  
[List of Patents for class 564 subclass 66]    66Preparing directly from ammonium carbamate (i.e., from HNH-COO-HHNHH)
 This subclass is indented under subclass 63.  Processes in which urea is prepared directly from ammonium carbamate.

SEE OR SEARCH THIS CLASS, SUBCLASS:

70,for the preparation of urea from ammonia and carbon dioxide which includes the decomposition of by-product ammonium carbamate.
  
[List of Patents for class 564 subclass 67]    67Preparing directly from ammonia and carbon dioxide
 This subclass is indented under subclass 63.  Processes wherein urea is prepared by the reaction of ammonia with carbon dioxide.
  
[List of Patents for class 564 subclass 68]    68With corrosion inhibiting of reactor
 This subclass is indented under subclass 67.  Processes which include the prevention of corrosion of the reactor.
  
[List of Patents for class 564 subclass 69]    69With ammonia synthesis
 This subclass is indented under subclass 67.  Processes which include the step of synthesizing ammonia.
  
[List of Patents for class 564 subclass 70]    70With decomposition of by-product ammonium carbamate (i.e., decomposition of HNH-COO-HHNHH)
 This subclass is indented under subclass 67.  Processes wherein by-product ammonium carbamate is decomposed.

SEE OR SEARCH THIS CLASS, SUBCLASS:

66,for the preparation of urea directly from ammonium carbamate.
  
[List of Patents for class 564 subclass 71]    71Utilizing indirect heat exchange
 This subclass is indented under subclass 70.  Processes which utilize indirect heat exchange.
  
[List of Patents for class 564 subclass 72]    72In plural stages
 This subclass is indented under subclass 70.  Processes wherein the decomposition of ammonium carbamate is performed in plural stages.
  
[List of Patents for class 564 subclass 73]    73Purification or recovery
 This subclass is indented under subclass 63.  Processes directed to the purification, separation, or recovery of urea.
  
[List of Patents for class 564 subclass 74]    74Thiocarboxamides (i.e., compounds containing -C(=S)-HNH, wherein substitution may be made for hydrogen only)
 This subclass is indented under subclass 1.  Compounds which are thiocarboxamides containing the grouping N.
(1) Note. This subclass contains, for example:

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[List of Patents for class 564 subclass 75]    75Sulfur bonded directly to the thiocarbonyl
 This subclass is indented under subclass 74.  Compounds which contain the grouping -S- not provided for above.
(1) Note. This subclass contains, for example:

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[List of Patents for class 564 subclass 76]    76Thiuram sulfides (e.g., HNH-C(=S)-S-S-C(=S)-HN-alkyl, etc.)
 This subclass is indented under subclass 75.  Compounds which are thiuram sulfides containing the grouping below wherein X is a positive integer.

Image 1 for class 564 subclass 76

(1) Note. This subclass contains, for example:

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[List of Patents for class 564 subclass 77]    77Thiooxamides (i.e., HNH-C(=S)-C(=X)-HNH, wherein X is S or O and substitution may be made for hydrogen only)
 This subclass is indented under subclass 74.  Compounds which are thioxamides containing the grouping -- wherein X may be oxygen or sulfur.
(1) Note. This subclass contains, for example:

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[List of Patents for class 564 subclass 78]    78Acyclic
 This subclass is indented under subclass 74.  Compounds which do not contain a ring.
(1) Note. This subclass contains, for example:

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[List of Patents for class 564 subclass 79]    79Sulfamides (i.e., HNH-(O=)S(=O)-HNH, wherein substitution may be made for hydrogen only)
 This subclass is indented under subclass 1.  Compounds which are diamides of sulfuric acid (i.e., sulfamides) and contain the grouping

Image 1 for class 564 subclass 79

(1) Note. This subclass contains, for example:

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[List of Patents for class 564 subclass 80]    80Sulfonamides (i.e., Q-(O=)S(=O)-HNH, wherein Q is a substituent and wherein any substituent replacing one or both hydrogens shown will be referred to as E)
 This subclass is indented under subclass 1.  Compounds which are sulfonamides and contain the grouping below wherein R-SO2- is the residue of a sulfonic acid and N is the residue of an amino nitrogen containing compound.

Image 1 for class 564 subclass 80

(1) Note. This subclass contains, for example:

Image 2 for class 564 subclass 80

  
[List of Patents for class 564 subclass 81]    81Hydrazine containing
 This subclass is indented under subclass 80.  Compounds which contain a hydrazine group.
(1) Note. This subclass contains, for example:

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[List of Patents for class 564 subclass 82]    82Plural sulfonamide groups containing or containing plural sulfonyls bonded directly to the same nitrogen
 This subclass is indented under subclass 80.  Compounds which contain more than one sulfonamide group or contain plural sulfonyls bonded directly to the same nitrogen.
(1) Note. This subclass contains, for example:

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[List of Patents for class 564 subclass 83]    83Two sulfonamido sulfonyls having no sulfonamido nitrogen between the sulfonyls
 This subclass is indented under subclass 82.  Compounds wherein the sulfonyls of two sulfonamide groups contain no sulfonamide nitrogen between them.
(1) Note. This subclass contains, for example:

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[List of Patents for class 564 subclass 84]    84Substituent Q contains benzene ring
 This subclass is indented under subclass 80.  Compounds wherein the sulfonic acid residue is aromatic (i.e., benzene ring containing).
(1) Note. This subclass contains, for example:

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[List of Patents for class 564 subclass 85]    85Sulfur in substituent Q
 This subclass is indented under subclass 84.  Compounds wherein the aromatic sulfonic acid residue contains sulfur.
(1) Note. This subclass contains, for example:

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[List of Patents for class 564 subclass 86]    86Nitrogen in substituent Q
 This subclass is indented under subclass 84.  Compounds wherein the residue of the aromatic sulfonic acid contains nitrogen.
(1) Note. This subclass contains, for example:

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[List of Patents for class 564 subclass 87]    87Nitro or nitroso in substituent Q
 This subclass is indented under subclass 86.  Compounds wherein the residue of the aromatic sulfonic acid contains a nitro or nitroso group bonded directly to a carbon atom.
(1) Note. This subclass contains, for example:

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[List of Patents for class 564 subclass 88]    88Carbonyl in substituent Q
 This subclass is indented under subclass 84.  Compounds wherein the residue of the aromatic sulfonic acid contains a carbonyl group.
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 88

  
[List of Patents for class 564 subclass 89]    89Hydroxy, bonded directly to carbon, or ether in substituent Q (H of -OH may be replaced by a substituted or unsubstituted ammonium ion or a Group IA or IIA light metal)
 This subclass is indented under subclass 84.  Compounds wherein the residue of the aromatic sulfonic acid contains a hydroxyl group bonded directly to carbon or an ether wherein the H of the OH may be replaced by a substituted or unsubstituted ammonium ion or a Group IA or IIA light metal.
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 89

  
[List of Patents for class 564 subclass 90]    90Substituent Q is monocyclic
 This subclass is indented under subclass 84.  Compounds wherein the residue of the aromatic sulfonic acid is monocyclic.
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 90

  
[List of Patents for class 564 subclass 91]    91Carbonyl, cyano, nitro, nitroso, halogen, or sulfur attached directly to the sulfonamide nitrogen or to an amino nitrogen in a substituent E by nonionic bonding
 This subclass is indented under subclass 90.  Compounds wherein the amino nitrogen compound residue contains a carbonyl, cyano, nitro, nitroso, halogen, or sulfur attached directly to the sulfonamido nitrogen or to an amino nitrogen by nonionic bonding.
(1) Note. For purposes of this classification compounds having the structure RSO2-N-halogen are considered to be acid halides of analogs of hydroxamic acids and are classified in Class 562, subclass 837.
(2) Note. This subclass contains, for example:

Image 1 for class 564 subclass 91

  
[List of Patents for class 564 subclass 92]    92Benzene ring in a substituent E
 This subclass is indented under subclass 90.  Compounds wherein the amino nitrogen compound residue contains a benzene ring.
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 92

  
[List of Patents for class 564 subclass 93]    93Hydroxy, bonded directly to carbon, or ether in a substituent E (H of -OH may be replaced by a substituted or unsubstituted ammonium ion or a Group IA or IIA light metal)
 This subclass is indented under subclass 90.  Compounds wherein the amino nitrogen compound residue contains a hydroxyl bonded directly to carbon, or an ether, wherein the H of the -OH may be replaced by a substituted or unsubstituted ammonium ion or by a Group IA or IIA light metal.
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 93

  
[List of Patents for class 564 subclass 94]    94Nitrogen in an acyclic substituent E
 This subclass is indented under subclass 90.  Compounds wherein the amino nitrogen compound residue contains an additional nitrogen.
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 94

  
[List of Patents for class 564 subclass 95]    95Substituent Q is acyclic
 This subclass is indented under subclass 80.  Compounds wherein the sulfonic acid residue contains no ring.
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 95

  
[List of Patents for class 564 subclass 96]    96Halogen in substituent Q attached indirectly to the sulfonamide sulfur by nonionic bonding
 This subclass is indented under subclass 95.  Compounds wherein the sulfonic acid residue contains halogen nonionically bonded.
(1) Note. This subclass contains, for example:
F3C-(CF2)7-SO2NH-C2H4-N-(C2H5)2
H17C8-SO2NH-(CH2)3-(OCH2CH2)3-O-CH3
  
[List of Patents for class 564 subclass 97]    97Benzene ring in a substituent E
 This subclass is indented under subclass 96.  Compounds wherein the amino nitrogen compound residue contains a benzene ring.
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 97

  
[List of Patents for class 564 subclass 98]    98Substituent Q is alkyl
 This subclass is indented under subclass 95.  Compounds wherein the sulfonic acid residue consists of unsubstituted alkyl.
(1) Note. This subclass contains, for example:
H3C - CH2 - CH2 - CH2 - SO2 - NH - CH3
  
[List of Patents for class 564 subclass 99]    99Benzene ring in a substituent E
 This subclass is indented under subclass 98.  Compounds wherein the amine nitrogen compound residue contains a benzene ring.
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 99

  
[List of Patents for class 564 subclass 100]    100Sulfur and amino nitrogen attached directly to the same sulfur by nonionic bonding
 This subclass is indented under subclass 1.  Compounds which are thiosulfenamides containing the grouping -- S - S -
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 100

  
[List of Patents for class 564 subclass 101]    101Plural amino nitrogens attached directly to the same sulfur, or oxygen double bonded and amino nitrogen attached directly to the same sulfur, all by nonionic bonding (e.g., sulfinamides, etc.)
 This subclass is indented under subclass 1.  Compounds which contain two amino nitrogens nonionically bonded directly to the same sulfur or which contain sulfur doubly bonded to oxygen and directly attached to an amino nitrogen by nonionic bonding, as for example, sulfinamides.
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 101

  
[List of Patents for class 564 subclass 102]    102Sulfur attached directly to amino nitrogen by nonionic bonding (e.g., sulfenamides, etc.)
 This subclass is indented under subclass 1.  Compounds which contain sulfur bonded directly to an amino nitrogen by nonionic bonding, as for example, sulfenamides.
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 102

  
[List of Patents for class 564 subclass 103]    103Cyanamides (i.e., compounds containing cyano bonded directly to amino nitrogen)
 This subclass is indented under subclass 1.  Compounds which are cyanamides wherein a cyano group is bonded directly to an amino nitrogen.
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 103

  
[List of Patents for class 564 subclass 104]    104Cyanoguanidines (i.e., HNH-C(=NH)-HNH, wherein -CN is substituted for one of the hydrogens and substitution may be made for the remaining hydrogens only)
 This subclass is indented under subclass 103.  Compounds wherein the cyano group is bonded directly to a nitrogen of a guanidine group.
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 104

  
[List of Patents for class 564 subclass 105]    105Benzene ring containing
 This subclass is indented under subclass 103.  Compounds which contain a benzene ring.
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 105

  
[List of Patents for class 564 subclass 106]    106Acyclic
 This subclass is indented under subclass 103.  Compounds which contains no ring.
(1) Note. This subclass contains, for example:

NC - NH - ( CH subscript 2 CH subscript 2 -O ) subscript 3 - CH subscript 2 CH subscript 2 -OH

NC - NH - ( CH2CH2 -O )3 - CH2CH2 -OH

  
[List of Patents for class 564 subclass 107]    107Nitramines (i.e., compounds containing nitro bonded directly to amino nitrogen)
 This subclass is indented under subclass 1.  Compounds which are nitramines wherein a nitro group is attached directly to an amino nitrogen.
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 107

  
[List of Patents for class 564 subclass 108]    108Containing nitrogen double bonded directly to carbon (e.g., nitroguanidines, etc.)
 This subclass is indented under subclass 107.  Compounds which contain an amino nitrogen doubly bonded to carbon.
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 108

  
[List of Patents for class 564 subclass 109]    109Acyclic
 This subclass is indented under subclass 107.  Compounds which do not contain a ring.
(1) Note. This subclass contains, for example:
  
[List of Patents for class 564 subclass 110]    110Containing nitro bonded directly to carbon (i.e., plural nitro groups containing)
 This subclass is indented under subclass 109.  Compounds which contain a nitro group bonded directly to carbon.
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 110

  
[List of Patents for class 564 subclass 111]    111Hydroxy, bonded directly to carbon, or ether containing (H of -OH may be replaced by a substituted or unsubstituted ammonium ion or a Group IA or IIA light metal)
 This subclass is indented under subclass 110.  Compounds which contain hydroxy bonded directly to carbon, or an ether, wherein the H of the -OH may be replaced by a substituted or unsubstituted ammonium ion or by a Group IA or IIA light metal.
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 111

  
[List of Patents for class 564 subclass 112]    112Nitrosamines (i.e., compounds containing nitroso bonded directly to amino nitrogen)
 This subclass is indented under subclass 1.  Compounds which are nitrosamines, wherein a nitroso group is attached directly to an amino nitrogen.
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 112

  
[List of Patents for class 564 subclass 113]    113Acyclic
 This subclass is indented under subclass 112.  Compounds which do not contain a ring.
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 113

  
[List of Patents for class 564 subclass 114]    114Haloamines (i.e., compounds containing halogen attached directly to amino nitrogen by nonionic bonding)
 This subclass is indented under subclass 1.  Compounds which are haloamines, wherein halogen is attached directly to an amino nitrogen by nonionic bonding.
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 114

SEE OR SEARCH CLASS:

562Organic Compounds,   subclasses 800+ for compounds wherein halogen is nonionically bonded to the nitrogen of a carboxamide.
  
[List of Patents for class 564 subclass 115]    115Containing nitrogen double bonded directly to carbon
 This subclass is indented under subclass 114.  Compounds which contain nitrogen doubly bonded to carbon.
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 115

  
[List of Patents for class 564 subclass 116]    116Amidine containing (i.e., containing -C(=N)-HNH, wherein substitution may be made for hydrogen only)
 This subclass is indented under subclass 115.  Compounds which contain the amidine group

Image 1 for class 564 subclass 116

(1) Note. This subclass contains, for example:

Image 2 for class 564 subclass 116

  
[List of Patents for class 564 subclass 117]    117Alicyclic ring containing
 This subclass is indented under subclass 114.  Compounds which contain an alicyclic group.
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 117

  
[List of Patents for class 564 subclass 118]    118Acyclic
 This subclass is indented under subclass 114.  Compounds which do not contain a ring.
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 118

  
[List of Patents for class 564 subclass 119]    119Hydroxy, bonded directly to carbon, or ether containing (H of -OH may be replaced by a substituted or unsubstituted ammonium ion or a Group IA or IIA light metal)
 This subclass is indented under subclass 118.  Compounds which contain a hydroxyl bonded directly to carbon, or an ether, wherein the H of the -OH may be replaced by a substituted or unsubstituted ammonium ion or by a Group IA or IIA light metal.
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 119

  
[List of Patents for class 564 subclass 120]    120Carbon to carbon unsaturation containing
 This subclass is indented under subclass 118.  Compounds which contain a carbon to carbon double or triple bond.
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 120

  
[List of Patents for class 564 subclass 121]    121Plural difluoramine groups containing
 This subclass is indented under subclass 118.  Compounds which contain plural difluoramino groups.
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 121

  
[List of Patents for class 564 subclass 122]    122Plural difluoramine groups bonded directly to the same carbon
 This subclass is indented under subclass 121.  Compounds wherein the plural difluoramino groups are bonded directly to the same carbon.
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 122

  
[List of Patents for class 564 subclass 123]    123Carboxamides (i.e., Q-CO-HNH, wherein Q is a substituent having carbon bonded directly to the carbonyl or is hydrogen and wherein any substituent replacing one or both hydrogens shown will be referred to as E)
 This subclass is indented under subclass 1.  Compounds which are carboxamides and contain one of the groupings

Image 1 for class 564 subclass 123

(1) Note. This subclass contains, for example:

Image 2 for class 564 subclass 123

SEE OR SEARCH CLASS:

260Chemistry of Carbon Compounds,   subclasses 401 , 402.5, 404 and 404.5 for amides of higher fatty acids.
530Chemistry: Natural Resins or Derivatives; Peptides or Reaction Products Thereof,   subclasses 200+ for amides of natural resin acids wherein the acids are the mixture of acids naturally occurring in natural resins or for a natural resin acid amide wherein the amide does not have a known chemical structure.
554Organic Compounds,   subclasses 35+ for amides of higher fatty acids.
  
[List of Patents for class 564 subclass 124]    124Preparing directly from cyano containing compound
 This subclass is indented under subclass 123.  Processes wherein a carboxamide is prepared directly from a cyano containing compound.
(1) Note. Processes which involve catalytic hydration or hydrolysis of nitriles combined with other chemical reactions, such as for example, reduction of a nitro group to an amine are placed in this subclass. Where the only reaction is catalytic hydration, see subclasses 126+; and where the only reaction is acid hydrolysis, see subclass 129, even if purification or recovery steps are included.
  
[List of Patents for class 564 subclass 125]    125From HCN or cyanogen
 This subclass is indented under subclass 124.  Processes which utilize HCN or cyanogen in the preparation of a carboxamide.
(1) Note. This subclass includes, for example:

Image 1 for class 564 subclass 125

  
[List of Patents for class 564 subclass 126]    126Catalytic hydration only of nitrile
 This subclass is indented under subclass 124.  Processes wherein the sole chemical reaction for amide formation is the hydrolysis of a nitrile in water in the presence of a catalyst.
(1) Note. For processes including simultaneous hydrolysis and other reactions, such as for example, amination, alkylation, or reduction, see subclass 124.
(2) Note. This subclass includes the combination of hydrolysis followed by purification or recovery.
  
[List of Patents for class 564 subclass 127]    127Copper containing catalyst utilized
 This subclass is indented under subclass 126.  Processes which utilize a copper containing catalyst.
  
[List of Patents for class 564 subclass 128]    128Of acrylonitriles
 This subclass is indented under subclass 126.  Processes wherein acrylonitriles are catalytically hydrated.
  
[List of Patents for class 564 subclass 129]    129Acid hydrolysis only of nitrile
 This subclass is indented under subclass 124.  Processes wherein the sole chemicl reaction for amide formation is the acid hydrolysis of a nitrile.
(1) Note. This subclass includes the combination of hydrolysis followed by purification or recovery.

SEE OR SEARCH THIS CLASS, SUBCLASS:

124,for processes including simultaneous acid hydrolysis combined with other reactions.
  
[List of Patents for class 564 subclass 130]    130From acyclic nitrile
 This subclass is indented under subclass 124.  Processes wherein a carboxamide is prepared from a nitrile which contains no ring.
  
[List of Patents for class 564 subclass 131]    131Which contains carbon to carbon unsaturation
 This subclass is indented under subclass 130.  Processes wherein the nitrile contains a double or triple bond between two carbons.
  
[List of Patents for class 564 subclass 132]    132Preparing directly from carbon monoxide or carbon dioxide
 This subclass is indented under subclass 123.  Processes wherein a carboxamide is prepared by a reaction utilizing carbon monoxide or carbon dioxide.
(1) Note. This subclass contains for example, the reaction of an aliphatic alcohol with ammonia and carbon monoxide to prepare a formamide, or the reaction of an amine with carbon dioxide and hydrogen to prepare a formamide.
  
[List of Patents for class 564 subclass 133]    133Preparing directly by amidation of -C(=O)X group, where X is O- or halogen
 This subclass is indented under subclass 123.  Processes wherein a carboxamide is formed by reaction of a carboxylic acid, salt, ester, acid halide, or anhydride with ammonia or an amino nitrogen containing compound.
  
[List of Patents for class 564 subclass 134]    134Of carboxylic acid ester
 This subclass is indented under subclass 133.  Processes wherein a carboxylic acid ester is utilized.
  
[List of Patents for class 564 subclass 135]    135Having acyclic acid moiety
 This subclass is indented under subclass 134.  Processes wherein the carboxylic acid of the ester does not contain a ring.
  
[List of Patents for class 564 subclass 136]    136Additional oxygen in the acid moiety
 This subclass is indented under subclass 135.  Processes wherein the carboxylic acid of the ester contains additional oxygen.
  
[List of Patents for class 564 subclass 137]    137Lower fatty acid
 This subclass is indented under subclass 135.  Processes wherein the carboxylic acid of the ester is a lower fatty acid.
  
[List of Patents for class 564 subclass 138]    138Of carboxylic acid
 This subclass is indented under subclass 133.  Processes wherein a carboxylic acid is utilized.
  
[List of Patents for class 564 subclass 139]    139Benzene ring containing
 This subclass is indented under subclass 138.  Processes wherein the carboxylic acid contains a benzene ring.
  
[List of Patents for class 564 subclass 140]    140Hydroxy naphthoic
 This subclass is indented under subclass 139.  Processes wherein hydroxy naphthoic acid is utilized.
  
[List of Patents for class 564 subclass 141]    141Lower fatty acid
 This subclass is indented under subclass 138.  Processes wherein a lower fatty acid is utilized.
  
[List of Patents for class 564 subclass 142]    142Of carboxylic acid halide
 This subclass is indented under subclass 133.  Processes wherein a carboxylic acid halide is utilized.
  
[List of Patents for class 564 subclass 143]    143Acyclic
 This subclass is indented under subclass 142.  Processes wherein the carboxylic acid halide does not contain a ring.
  
[List of Patents for class 564 subclass 144]    144Of acyclic carboxylic acid anhydride
 This subclass is indented under subclass 133.  Processes wherein a carboxylic acid anhydride which does not have a ring is utilized.
  
[List of Patents for class 564 subclass 145]    145Preparing directly by reacting sulfur or sulfur containing compound with ammonia; or directly from ammonium polysulfide
 This subclass is indented under subclass 123.  Processes wherein a carboxamide is prepared by utilizing a mixture of sulfur or a sulfur containing compound with ammonia or by utilizing an ammonium polysulfide, as for example, by the Willgerodt reaction.
  
[List of Patents for class 564 subclass 146]    146Preparing directly by nitration
 This subclass is indented under subclass 123.  Processes wherein a nitro group is introduced into a carboxamide.
  
[List of Patents for class 564 subclass 147]    147Aminimine containing
 This subclass is indented under subclass 123.  Compounds which are aminimines and contain the grouping

Image 1 for class 564 subclass 147

(1) Note. This subclass contains, for example:

Image 2 for class 564 subclass 147

  
[List of Patents for class 564 subclass 148]    148Hydrazine containing
 This subclass is indented under subclass 123.  Compounds which contain a hydrazine group.
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 148

  
[List of Patents for class 564 subclass 149]    149Substituent Q contains benzene ring
 This subclass is indented under subclass 148.  Compounds wherein the carboxylic acid residue contains a benzene ring.
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 149

  
[List of Patents for class 564 subclass 150]    150Hydroxy, bonded directly to carbon, or ether in substituent Q (H of -OH may be replaced by a substituted or unsubstituted ammonium ion or a Group IA or IIA light metal)
 This subclass is indented under subclass 149.  Compounds wherein the carboxylic acid residue contains hydroxy bonded directly to carbon, or an ether, wherein the H of the -OH may be replaced by a substituted or unsubstituted ammonium ion or a Group IA or IIA light metal.
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 150

  
[List of Patents for class 564 subclass 151]    151Substituent Q is acyclic
 This subclass is indented under subclass 148.  Compounds wherein the carboxylic acid residue does not contain a ring.
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 151

  
[List of Patents for class 564 subclass 152]    152Plural carboxamide groups containing or containing plural carbonyls bonded directly to the same nitrogen
 This subclass is indented under subclass 123.  Compounds which contain more than one carboxamide group or contain plural carbonyls bonded directly to the same nitrogen.
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 152

  
[List of Patents for class 564 subclass 153]    153Three or more carboxamide groups
 This subclass is indented under subclass 152.  Compounds which contain three or more carboxamides.
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 153

  
[List of Patents for class 564 subclass 154]    154Sulfur containing
 This subclass is indented under subclass 152.  Compounds which contain nonionically bonded sulfur.
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 154

  
[List of Patents for class 564 subclass 155]    155Benzene ring containing
 This subclass is indented under subclass 152.  Compounds which contain a benzene ring.
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 155

  
[List of Patents for class 564 subclass 156]    156Two carboxamido carbonyls having benzene ring between the carbonyls and no carboxamido nitrogen between the carbonyls
 This subclass is indented under subclass 155.  Compounds wherein the carbonyls of two carboxamides have a benzene ring between them and no carboxamide nitrogen between them.
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 156

  
[List of Patents for class 564 subclass 157]    157Amino nitrogen, not bonded directly to carbonyl, containing
 This subclass is indented under subclass 155.  Compounds which contain a noncarboxamide amino nitrogen.
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 157

  
[List of Patents for class 564 subclass 158]    158Hydroxy, bonded directly to carbon, or ether containing (H of -OH may be replaced by a substituted or unsubstituted ammonium ion or a Group IA or IIA light metal)
 This subclass is indented under subclass 155.  Compounds which contain a hydroxyl bonded directly to carbon, or ether, wherein the H of -OH may be replaced by a substituted or unsubstitued ammonium ion or by a Group IA or IIA light metal.
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 158

  
[List of Patents for class 564 subclass 159]    159Acyclic
 This subclass is indented under subclass 152.  Compounds which contain no ring.
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 159

  
[List of Patents for class 564 subclass 160]    160Two carboxamido carbonyls having no carboxamido nitrogen between the carbonyls
 This subclass is indented under subclass 159.  Compounds wherein the carbonyls of two carboxamides have no carboxamide nitrogen between them.
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 160

  
[List of Patents for class 564 subclass 161]    161Substituent Q contains benzene ring
 This subclass is indented under subclass 123.  Compounds wherein the residue of the carboxylic acid contains a benzene ring.
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 161

  
[List of Patents for class 564 subclass 162]    162Sulfur in substituent Q
 This subclass is indented under subclass 161.  Compounds wherein the residue of the carboxylic acid contains sulfur.
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 162

SEE OR SEARCH THIS CLASS, SUBCLASS:

80+,100, 101, and 102, for carboxamides which also contain sulfur bonded directly to amino nitrogen.
  
[List of Patents for class 564 subclass 163]    163Nitrogen in substituent Q
 This subclass is indented under subclass 161.  Compounds wherein the carboxylic acid residue contains nitrogen.
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 163

  
[List of Patents for class 564 subclass 164]    164The substituent nitrogen is an amino nitrogen attached indirectly to a ring by acyclic nonionic bonding
 This subclass is indented under subclass 163.  Compounds wherein the carboxylic acid residue contains an amine nitrogen indirectly attached to a ring through a carbon or through an acyclic chain.
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 164

  
[List of Patents for class 564 subclass 165]    165Hydroxy, bonded directly to carbon, or ether in substituent Q (H of -OH may be replaced by a substituted or unsubstituted ammonium ion or a Group IA or IIA light metal)
 This subclass is indented under subclass 164.  Compounds wherein the carboxylic acid residue contains a hydroxyl bonded directly to carbon or an ether, wherein the H of the -OH may be replaced by a substituted or unsubstituted ammonium ion or by a Group IA or IIA light metal.
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 165

  
[List of Patents for class 564 subclass 166]    166Nitro in substituent Q
 This subclass is indented under subclass 163.  Compounds wherein the residue of the carboxylic acid contains a nitro group.
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 166

  
[List of Patents for class 564 subclass 167]    167Hydroxy, bonded directly to carbon, or ether in substituent Q (H of -OH may be replaced by a substituted or unsubstituted ammonium ion or a Group IA or IIA light metal)
 This subclass is indented under subclass 163.  Compounds wherein the carboxylic acid residue contains a hydroxyl bonded directly to carbon or an ether, wherein the H of the -OH may be replaced by a substituted or unsubstituted ammonium ion or by a Group IA or IIA light metal.
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 167

  
[List of Patents for class 564 subclass 168]    168Ring in a substituent E
 This subclass is indented under subclass 163.  Compounds wherein the amino nitrogen containing residue contains a ring.
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 168

  
[List of Patents for class 564 subclass 169]    169Carbonyl in substituent Q
 This subclass is indented under subclass 161.  Compounds wherein the carboxylic acid residue contains an aldehyde or ketone group.
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 169

  
[List of Patents for class 564 subclass 170]    170Hydroxy, bonded directly to carbon, or ether in substituent Q (H of -OH may be replaced by a substituted or unsubstituted ammonium ion or a Group IA or IIA light metal)
 This subclass is indented under subclass 161.  Compounds wherein the carboxylic acid residue contains a hydroxyl bonded directly to carbon or an ether, wherein the H of the -OH may be replaced by a substituted or unsubstituted ammonium ion or by a Group IA or IIA light metal.
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 170

  
[List of Patents for class 564 subclass 171]    171Plural rings in substituent Q
 This subclass is indented under subclass 170.  Compounds wherein the carboxylic acid residue contains more than one ring.
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 171

  
[List of Patents for class 564 subclass 172]    172Polycyclo ring system in substituent Q
 This subclass is indented under subclass 171.  Compounds wherein the carboxylic acid residue contains a polycyclo ring system.
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 172

  
[List of Patents for class 564 subclass 173]    173Q contains an ortho-hydroxy naphthyl bicyclo ring system, or its partially hydrogenated form, bonded directly to the carbonyl (H of -OH may be replaced by a substituted or unsubstituted ammonium ion or a Group IA or IIA light metal)
 This subclass is indented under subclass 172.  Compounds wherein the carboxylic acid residue is an ortho-hydroxy naphthoic acid or a partially hydrogenated form thereof.
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 173

  
[List of Patents for class 564 subclass 174]    174Ring in a substituent E
 This subclass is indented under subclass 171.  Compounds wherein the amino nitrogen residue contains a ring.
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 174

  
[List of Patents for class 564 subclass 175]    175Oxygen, bonded directly to the benzene ring, is part of an acyclic chain between the benzene ring and the carbonyl
 This subclass is indented under subclass 170.  Compounds wherein the carboxylic acid residue contains oxygen which is directly bonded to a benzene ring and is part of an acyclic chain which also contains the acid carbonyl group.
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 175

  
[List of Patents for class 564 subclass 176]    176Benzene ring bonded directly to the carbonyl
 This subclass is indented under subclass 170.  Compounds wherein the carboxylic acid residue contains a benzene ring bonded directly to the acid carbonyl group.
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 176

  
[List of Patents for class 564 subclass 177]    177Hydroxy bonded directly to the benzene ring (H of -OH may be replaced by a substituted or unsubstituted ammonium ion or a Group IA or IIA light metal)
 This subclass is indented under subclass 176.  Compounds wherein the carboxylic acid residue contains a hydroxy group or its Group IA or IIA light metal or ammonium derivative bonded directly to a benzene ring.
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 177

  
[List of Patents for class 564 subclass 178]    178Preparing directly by halogenation
 This subclass is indented under subclass 177.  Processes wherein the compounds are prepared directly by halogenation.
  
[List of Patents for class 564 subclass 179]    179Benzene ring in a substituent E
 This subclass is indented under subclass 177.  Compounds wherein the amino nitrogen containing residue has a benzene ring.
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 179

  
[List of Patents for class 564 subclass 180]    180Polycyclo ring system in substituent Q
 This subclass is indented under subclass 161.  Compounds wherein the carboxylic acid residue contains a polycyclo ring system.
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 180

  
[List of Patents for class 564 subclass 181]    181Two rings bonded directly to the same carbon in substituent Q
 This subclass is indented under subclass 161.  Compounds wherein the carboxylic acid residue contains two rings bonded directly to the same carbon.
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 181

  
[List of Patents for class 564 subclass 182]    182Substituent Q is monocyclic
 This subclass is indented under subclass 161.  Compounds wherein the carboxylic acid residue contains only one ring.
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 182

  
[List of Patents for class 564 subclass 183]    183The ring is bonded directly to the carbonyl
 This subclass is indented under subclass 182.  Compounds wherein the carboxylic acid residue contains a benzene ring bonded directly to the acid carbonyl.
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 183

  
[List of Patents for class 564 subclass 184]    184Benzene ring in a substituent E
 This subclass is indented under subclass 183.  Compounds wherein the amino nitrogen containing residue contains a benzene ring.
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 184

  
[List of Patents for class 564 subclass 185]    185Ring or polycyclo ring system in substituent E is attached indirectly to the carboxamide nitrogen or to an amino nitrogen in substituent E by acyclic nonionic bonding
 This subclass is indented under subclass 184.  Compounds wherein the amino nitrogen containing residue contains a ring or a polycyclo ring system which is attached indirectly to the carboxamido nitrogen or to an additional amino nitrogen in the amino nitrogen containing residue by acyclic nonionic bonding.
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 185

  
[List of Patents for class 564 subclass 186]    186Oxygen in a substituent E
 This subclass is indented under subclass 183.  Compounds wherein the amino nitrogen containing residue contains oxygen.
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 186

  
[List of Patents for class 564 subclass 187]    187Acyclic carbon to carbon unsaturation in a substituent E
 This subclass is indented under subclass 183.  Compounds wherein the amino nitrogen containing residue contains a double or triple bond between two carbons.
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 187

  
[List of Patents for class 564 subclass 188]    188Plural alicyclic rings in substituent Q
 This subclass is indented under subclass 123.  Compounds wherein the carboxylic acid residue contains more than one alicyclic ring.
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 188

  
[List of Patents for class 564 subclass 189]    189Five-membered ring in substituent Q
 This subclass is indented under subclass 123.  Compounds wherein the carboxylic acid residue contains a five-membered ring.
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 189

  
[List of Patents for class 564 subclass 190]    190Three-membered ring in substituent Q
 This subclass is indented under subclass 123.  Compounds wherein the carboxylic acid residue contains a three-membered ring.
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 190

  
[List of Patents for class 564 subclass 191]    191Alicyclic ring and an atom other than oxygen, carbon, or hydrogen in substituent Q
 This subclass is indented under subclass 123.  Compounds wherein the carboxylic acid residue contains an alicyclic ring and an atom other than carbon, hydrogen, or oxygen.
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 191

  
[List of Patents for class 564 subclass 192]    192Substituent Q is acyclic
 This subclass is indented under subclass 123.  Compounds wherein the carboxylic acid residue does not contain a ring.
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 192

  
[List of Patents for class 564 subclass 193]    193Nitrogen in substituent Q
 This subclass is indented under subclass 192.  Compounds wherein the carboxylic acid residue contains nitrogen.
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 193

  
[List of Patents for class 564 subclass 194]    194Benzene ring in a substituent E
 This subclass is indented under subclass 193.  Compounds wherein the amino nitrogen containing residue contains a benzene ring.
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 194

  
[List of Patents for class 564 subclass 195]    195Two rings bonded directly to the same carbon in a substituent E
 This subclass is indented under subclass 194.  Compounds wherein the amino nitrogen containing residue contains two rings bonded directly to the same carbon.
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 195

  
[List of Patents for class 564 subclass 196]    196A ring or polycyclo ring system in a substituent E is attached indirectly to the carboxamide nitrogen or to an amino nitrogen in substituent E by acyclic nonionic bonding
 This subclass is indented under subclass 194.  Compounds wherein the amino nitrogen containing residue contains a ring or a polycyclo ring system which is attached indirectly to the carboxamido nitrogen or to an additional amino nitrogen in the amino nitrogen containing residue by acyclic nonionic bonding.
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 196

  
[List of Patents for class 564 subclass 197]    197The compound is acyclic
 This subclass is indented under subclass 193.  Compounds wherein the amino nitrogen containing residue does not contain a ring.
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 197

  
[List of Patents for class 564 subclass 198]    198The carboxamide nitrogen is unsubstituted
 This subclass is indented under subclass 197.  Compounds wherein the amino nitrogen containing residue is unsubstituted.
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 198

  
[List of Patents for class 564 subclass 199]    199Carbonyl in substituent Q
 This subclass is indented under subclass 192.  Compounds wherein the carboxylic acid residue contains an aldehyde or keto group.
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 199

  
[List of Patents for class 564 subclass 200]    200Benzene ring in a substituent E
 This subclass is indented under subclass 199.  Compounds wherein the amino nitrogen containing residue contains a benzene ring.
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 200

  
[List of Patents for class 564 subclass 201]    201Hydroxy, bonded directly to carbon, or ether in substituent Q (H of -OH may be replaced by a substituted or unsubstituted ammonium ion or a Group IA or IIA light metal)
 This subclass is indented under subclass 192.  Compounds wherein the carboxylic acid residue contains a hydroxyl bonded directly to carbon, or an ether, wherein the H of the -OH may be replaced by a substituted or unsubstituted ammonium ion or by a Group IA or IIA light metal.
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 201

  
[List of Patents for class 564 subclass 202]    202Benzene ring in a substituent E
 This subclass is indented under subclass 201.  Compounds wherein the amino nitrogen containing residue contains a benzene ring.
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 202

  
[List of Patents for class 564 subclass 203]    203Hydroxy, bonded directly to carbon, or ether in an acyclic substituent E (Hof -OH may be replaced by a substituted or unsubstututed ammonium ion or a Group IA or IIA light metal)
 This subclass is indented under subclass 201.  Compounds wherein the amino nitrogen containing residue does not have a ring and contains a hydroxyl bonded directly to carbon, or an ether, wherein the H of the -OH may be replaced by a substituted or unsubstituted ammonium ion or by a Group IA or IIA light metal.
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 203

  
[List of Patents for class 564 subclass 204]    204Carbon to carbon unsaturation in substituent Q
 This subclass is indented under subclass 192.  Compounds wherein the carboxylic acid residue contains a double or triple bond between two carbons.
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 204

  
[List of Patents for class 564 subclass 205]    205Process which includes forming the unsaturation
 This subclass is indented under subclass 204.  Processes wherein unsaturation is introduced into the carboxylic acid residue of a carboxamide, as for example, by pyrolyzing an alkoxy or acetoxy alkanoic acid amide to split off the alkoxy or acetoxy groups, respectively.
  
[List of Patents for class 564 subclass 206]    206Purification or recovery
 This subclass is indented under subclass 204.  Processes directed to the purification, separation, or recovery of unsaturated carboxylic acid amides.
  
[List of Patents for class 564 subclass 207]    207Benzene ring in a substituent E
 This subclass is indented under subclass 204.  Compounds wherein the amino nitrogen containing residue contains a benzene ring.
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 207

  
[List of Patents for class 564 subclass 208]    208Hydroxy, bonded directly to carbon, or ether in an acyclic substituent E (H of -OH may be replaced by a substituted or unsubstituted ammonium ion or a Group IA or IIA light metal)
 This subclass is indented under subclass 204.  Compounds wherein the amino nitrogen containing residue does not have a ring and contains a hydroxyl bonded directly to carbon, or an ether, wherein the H of the -OH may be replaced by a substituted or unsubstituted ammonium ion or by a Group IA or IIA light metal.
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 208

  
[List of Patents for class 564 subclass 209]    209Halogen, bonded directly to carbon, in substituent Q
 This subclass is indented under subclass 192.  Compounds wherein the carboxylic acid residue contains halogen bonded directly to carbon.
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 209

  
[List of Patents for class 564 subclass 210]    210Ring in a substituent E
 This subclass is indented under subclass 209.  Compounds wherein the amino nitrogen containing residue contains a ring.
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 210

  
[List of Patents for class 564 subclass 211]    211Benzene ring in a substituent E
 This subclass is indented under subclass 210.  Compounds wherein the amino nitrogen containing residue contains a benzene ring.
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 211

  
[List of Patents for class 564 subclass 212]    212A ring or polycyclo ring system in a substituent E is attached indirectly to the carboxamide nitrogen or to an amino nitrogen in substituent E by acyclic nonionic bonding
 This subclass is indented under subclass 211.  Compounds wherein the amino nitrogen containing residue contains a ring or a polycyclo ring system which is attached indirectly to the carboxamido nitrogen or to an additional amino nitrogen in the amino nitrogen containing residue by acyclic nonionic bonding.
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 212

  
[List of Patents for class 564 subclass 213]    213Nitro and hydroxy, bonded directly to carbon, or ether in the substituent E (H of -OH may be replaced by a substituted or unsubstituted ammonium ion or a Group IA or IIA light metal)
 This subclass is indented under subclass 212.  Compounds wherein the amino nitrogen containing residue contains a nitro group and an ether, or contains a nitro group an a hydroxyl, which hydroxyl is bonded directly to carbon and wherein the H of the -OH may be replaced by a substituted or unsubstituted ammonium or a Group IA or IIA light metal.
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 213

  
[List of Patents for class 564 subclass 214]    214The compound is monocyclic
 This subclass is indented under subclass 211.  Compounds wherein the amino nitrogen containing residue contains only one ring.
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 214

  
[List of Patents for class 564 subclass 215]    215Q is hydrogen or a lower saturated alkyl substituent
 This subclass is indented under subclass 192.  Compounds wherein the carboxylic acid residue is from a lower fatty acid.
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 215

  
[List of Patents for class 564 subclass 216]    216Purification or recovery
 This subclass is indented under subclass 215.  Processes directed to the purification, separation, or recovery of lower fatty acid amides.
  
[List of Patents for class 564 subclass 217]    217Ring in a substituent E
 This subclass is indented under subclass 215.  Compounds wherein the amino nitrogen containing residue contains a ring.
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 217

  
[List of Patents for class 564 subclass 218]    218Benzene ring in a substituent E
 This subclass is indented under subclass 217.  Compounds wherein the amino nitrogen containing residue contains a benzene ring.
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 218

  
[List of Patents for class 564 subclass 219]    219A ring or polycyclo ring system in a substituent E is attached indirectly to the carboxamide nitrogen or to an amino nitrogen in substituent E by acyclic nonionic bonding
 This subclass is indented under subclass 218.  Compounds wherein the amino nitrogen containing residue contains a ring or a polycyclo ring system which is attached indirectly to the carboxamido nitrogen or to an additional amino nitrogen in the amino nitrogen containing residue by acyclic nonionic bonding.
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 219

  
[List of Patents for class 564 subclass 220]    220Amino nitrogen in the substituent E (i.e.,plural amino nitrogens containing)
 This subclass is indented under subclass 219.  Compounds wherein the amino nitrogen containing residue contains an additional amino nitrogen.
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 220

  
[List of Patents for class 564 subclass 221]    221Plural rings in a substituent E
 This subclass is indented under subclass 218.  Compounds wherein the amino nitrogen containing residue contains more than one ring.
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 221

  
[List of Patents for class 564 subclass 222]    222Polycyclo ring system in a substituent E
 This subclass is indented under subclass 221.  Compounds wherein the amino nitrogen containing residue contains a polycyclo ring system.
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 222

  
[List of Patents for class 564 subclass 223]    223Hydroxy, bonded directly to carbon, or ether in a substituent E (H of -OH may be replaced by a substituted or unsubstituted ammonium ion or a Group IA or IIA light metal)
 This subclass is indented under subclass 218.  Compounds wherein the amino nitrogen containing residue contains a hydroxyl bonded directly to carbon, or an ether, where H of the -OH may be replaced by a substituted or unsubstituted ammonium ion or by a Group IA or IIA light metal.
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 223

  
[List of Patents for class 564 subclass 224]    224Hydroxy, bonded directly to carbon, ether or nitrogen in a substituent E (H of -OH may be replaced by a substituted or unsubstituted ammonium ion or a Group IA or IIA light metal)
 This subclass is indented under subclass 215.  Compounds wherein the amino nitrogen residue contains a hydroxyl bonded directly to carbon, or an ether or an additional nitrogen, wherein the H of the -OH may be replaced by a substituted or unsubstituted ammonium ion or a Group IA and IIA light metal.
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 224

  
[List of Patents for class 564 subclass 225]    225Amidines (i.e., HN=CH-HNH, wherein substition may be made for hydrogen only)
 This subclass is indented under subclass 1.  Compounds which are amidines and contains the grouping

Image 1 for class 564 subclass 225

(1) Note. This subclass contains, for example:

Image 2 for class 564 subclass 225

  
[List of Patents for class 564 subclass 226]    226Amidino hydrazines or hydrazones (i.e., HNH-N=CH-HNH or HN=CH-NH-HNH, wherein substitution may be made for hydrogen only)
 This subclass is indented under subclass 225.  Compounds which are amidino hydrazine containing the grouping in Fig. 1 or amidino hydrazones containing the grouping in Fig. 2.

FIGURE 1

FIGURE 1

FIGURE 2

FIGURE 2

(1) Note. This subclass contains, for example:

Image 3 for class 564 subclass 226

  
[List of Patents for class 564 subclass 227]    227Guanyl hydrazines or hydrozones (i.e., HNH-N=C(-HNH)-HNH or HN=C(-HNH)-NH HNH, wherein substitution may be made for hydrogen only)
 This subclass is indented under subclass 226.  Compounds which are guanylhydrazines containing the grouping in Fig. 1 below, or guanylhydrazones containing the grouping in Fig. 2.

FIGURE 1

FIGURE 1

FIGURE 2

FIGURE 2

(1) Note. This subclass contains, for example:

Image 3 for class 564 subclass 227

  
[List of Patents for class 564 subclass 228]    228Benzene ring containing
 This subclass is indented under subclass 227.  Compounds which contain a benzene ring.
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 228

  
[List of Patents for class 564 subclass 229]    229Amidoximes (i.e., HON=CH-HNH, wherein substitution may be made for hydrogen only)
 This subclass is indented under subclass 225.  Compounds which are amidoximes containing the grouping below, wherein R may be H, an ester forming group or an ether forming group.

Image 1 for class 564 subclass 229

(1) Note. This subclass contains, for example:

Image 2 for class 564 subclass 229

  
[List of Patents for class 564 subclass 230]    230Guanidines (i.e., HN=C(-HNH)-HNH, wherein substitution may be made for hydrogen only)
 This subclass is indented under subclass 225.  Compounds which are guanidines, containing the grouping

Image 1 for class 564 subclass 230

(1) Note. This subclass contains, for example:

Image 2 for class 564 subclass 230

  
[List of Patents for class 564 subclass 231]    231Preparing from thioureas
 This subclass is indented under subclass 230.  Processes wherein a guanidine is prepared from a thiourea, as for example, by reaction with ammonia or an amino nitrogen containing compound in the presence of a desulfurizing agent.
  
[List of Patents for class 564 subclass 232]    232Preparing by reacting cyanogen halide with amino nitrogen containing compound
 This subclass is indented under subclass 230.  Processes wherein a guanidine is prepared by reaction of a cyanogen halide and an amino nitrogen containing compound, as for example:

Image 1 for class 564 subclass 232

  
[List of Patents for class 564 subclass 233]    233Biguanides (i.e., HN=C(-HNH)-NH-(HNH-)C=NH, wherein substitution may be made for hydrogen only)
 This subclass is indented under subclass 230.  Compounds which are biguanides, containing the grouping

Image 1 for class 564 subclass 233

(1) Note. This subclass contains, for example:

Image 2 for class 564 subclass 233

Image 3 for class 564 subclass 233

  
[List of Patents for class 564 subclass 234]    234Benzene ring containing
 This subclass is indented under subclass 233.  Compounds wherein a biguanide contains a benzene ring.
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 234

  
[List of Patents for class 564 subclass 235]    235Plural rings containing
 This subclass is indented under subclass 234.  Compounds wherein a biguanide contains more than one ring.
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 235

  
[List of Patents for class 564 subclass 236]    236Polyguanidines
 This subclass is indented under subclass 230.  Compounds wherein there are at least two guanidine groups.
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 236

  
[List of Patents for class 564 subclass 237]    237Benzene ring containing
 This subclass is indented under subclass 230.  Compounds wherein a guanidine contains a benzene ring.
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 237

  
[List of Patents for class 564 subclass 238]    238Benzene ring bonded directly to guanidine nitrogen
 This subclass is indented under subclass 237.  Compounds wherein a guanidine contains a benzene ring bonded directly to a guanidine nitrogen.
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 238

  
[List of Patents for class 564 subclass 239]    239Hydroxy, bonded directly to carbon, or ether containing (H of -OH may be replaced by a substituted or unsubstituted ammonium ion or a Group IA or IIA light metal)
 This subclass is indented under subclass 238.  Compounds wherein a guanidine contains a hydroxyl bonded directly to carbon, or an ether, wherein the H of the -OH may be replaced by a substituted or unsubstituted ammonium ion or by a Group IA or IIA light metal.
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 239

  
[List of Patents for class 564 subclass 240]    240Acyclic
 This subclass is indented under subclass 230.  Compounds wherein a guanidine does not contain a ring.
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 240

  
[List of Patents for class 564 subclass 241]    241Guanidine per se or salt thereof
 This subclass is indented under subclass 240.  The compound which is guanidine or its salts and processes of preparation not provided for above.
  
[List of Patents for class 564 subclass 242]    242Guanidine nitrate
 This subclass is indented under subclass 241.  The compound which is guanidine nitrate and processes of preparation not provided for above.
  
[List of Patents for class 564 subclass 243]    243Polyamidines
 This subclass is indented under subclass 225.  Compounds wherein there is more than one amidine group.
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 243

  
[List of Patents for class 564 subclass 244]    244Benzene ring containing
 This subclass is indented under subclass 225.  Compounds wherein an amidine contains a benzene ring.
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 244

  
[List of Patents for class 564 subclass 245]    245N(prime)-aryl formimidines (i.e., benzene-N=CH-HNH, wherein substitution may be made for hydrogen, including those bonded directly to the benzene ring only)
 This subclass is indented under subclass 244.  Compounds which are N (prime)-aryl formamidines containing the grouping

Image 1 for class 564 subclass 245

(1) Note. This subclass contains, for example:

Image 2 for class 564 subclass 245

  
[List of Patents for class 564 subclass 246]    246Additional nitrogen attached indirectly to amidine nitrogen by nonionic bonding
 This subclass is indented under subclass 244.  Compounds wherein an amidine contains an additional nitrogen which is nonionically bonded.
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 246

  
[List of Patents for class 564 subclass 247]    247Hydroxy, bonded directly to carbon, or ether containing (H of -OH may be replaced by a substituted or unsubstituted ammonium ion or a Group IA or IIA light metal)
 This subclass is indented under subclass 244.  Compounds wherein an amidine contains a hydroxyl bonded directly to carbon, or an ether, wherein the H of the -OH may be replaced by a substituted or unsubstituted ammonium ion or by a Group IA or IIA light metal.
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 247

  
[List of Patents for class 564 subclass 248]    248Containing nitrogen double bonded directly to carbon
 This subclass is indented under subclass 1.  Compounds which are characterized by the presence of the grouping below and correspond in constitution to those formed by reacting an aldehyde or ketone with ammonia or an amino nitrogen containing compound.

Image 1 for class 564 subclass 248

(1) Note. This subclass contains, for example:

Image 2 for class 564 subclass 248

  
[List of Patents for class 564 subclass 249]    249Azines (i.e., HCH=N-N=HCH, wherein substitution may be made for hydrogen)
 This subclass is indented under subclass 248.  Compounds which are azines and contain the grouping below.

Image 1 for class 564 subclass 249

(1) Note. This subclass contains, for example:

Image 2 for class 564 subclass 249

  
[List of Patents for class 564 subclass 250]    250Hydrazones (i.e., HCH=N-HNH, wherein substitution may be made for hydrogen only)
 This subclass is indented under subclass 248.  Compounds which are hydrazones containing the grouping below.

Image 1 for class 564 subclass 250

(1) Note. This subclass contains, for example:

Image 2 for class 564 subclass 250

  
[List of Patents for class 564 subclass 251]    251Benzene ring containing
 This subclass is indented under subclass 250.  Compounds wherein the hydrazone contains a benzene ring.
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 251

  
[List of Patents for class 564 subclass 252]    252Carbodiimides (i.e., HN=C=NH, wherein substitution may be made for hydrogen only)
 This subclass is indented under subclass 248.  Compounds which are carbodiimides containing the grouping below.

Image 1 for class 564 subclass 252

(1) Note. This subclass contains, for example:

Image 2 for class 564 subclass 252

  
[List of Patents for class 564 subclass 253]    253Oximes (HCH=N-OH, i.e., wherein substitution may be made for hydrogen only)
 This subclass is indented under subclass 248.  Compounds which are oximes containing the grouping below wherein X may be hydrogen, the carbon of an ether forming group or the residue of an ester forming compound not provided for above.

Image 1 for class 564 subclass 253

(1) Note. This subclass contains, for example:

Image 2 for class 564 subclass 253

  
[List of Patents for class 564 subclass 254]    254O-esters (i.e., H of oxime -OH replaced by ester forming group)
 This subclass is indented under subclass 253.  Compounds which are O-esters of oximes wherein X is the residue of an ester forming compound.
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 254

SEE OR SEARCH THIS CLASS, SUBCLASS:

15,for phosphorus containing acid O-esters of oximes.
  
[List of Patents for class 564 subclass 255]    255O-carbamoyl
 This subclass is indented under subclass 254.  Compounds wherein the residue of the ester forming group is that of a carbamic acid.
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 255

  
[List of Patents for class 564 subclass 256]    256O-ethers (i.e., H of oxime -OH replaced by ether forming group)
 This subclass is indented under subclass 253.  Compounds which are O-ethers of oximes wherein X is the carbon of an ether forming group.
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 256

  
[List of Patents for class 564 subclass 257]    257Polycyclo ring system
 This subclass is indented under subclass 256.  Compounds wherein the O-ether oxime contains a polycyclo ring system.
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 257

  
[List of Patents for class 564 subclass 258]    258Oxygen double bonded, or hydroxy or ether oxygen bonded directly to an alpha carbon (H of -OH may be replaced by a substituted or unsubstituted ammonium ion or a Group Ia or IIA light metal)
 This subclass is indented under subclass 253.  Compounds wherein a carbon atom in a position alpha to the oxime group is substituted by a double-bonded oxygen or an -OX, wherein X may be H, C, or a substituted or unsubstituted ammonium ion or a Group IA or IIA light metal.
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 258

  
[List of Patents for class 564 subclass 259]    259Preparing directly by reacting carbonyl with hydroxylamine or salt thereof
 This subclass is indented under subclass 253.  Processes wherein an oxime is produced directly by reaction of an aldehyde or ketone with hydroxyl amine or a salt thereof.
  
[List of Patents for class 564 subclass 260]    260Preparing directly by reducing nitronic acid salt
 This subclass is indented under subclass 253.  Processes wherein an oxime is produced directly by reduction of a nitronic acid salt, as for example, an alkali metal salt of a nitroparaffin.
  
[List of Patents for class 564 subclass 261]    261Preparing directly by reducing nitro group
 This subclass is indented under subclass 253.  Processes wherein an oxime is produced directly by reduction of a nitro group, as for example, with hydrogen or carbon monoxide.
  
[List of Patents for class 564 subclass 262]    262Preparing directly by oxidizing a hydroxyl amine
 This subclass is indented under subclass 253.  Processes wherein an oxime is produced directly by oxidation of a hydroxyl amine group.
  
[List of Patents for class 564 subclass 263]    263Preparing directly by nitrosation of olefin
 This subclass is indented under subclass 253.  Processes wherein an oxime is produced directly by reaction of an olefinic compound with a nitrosating agent such as, for example, nitrous acid or nitrosyl chloride.
  
[List of Patents for class 564 subclass 264]    264Purification or recovery
 This subclass is indented under subclass 253.  Processes which are directed to the purification, separation, or recovery of oximes.
  
[List of Patents for class 564 subclass 265]    265Benzene ring containing
 This subclass is indented under subclass 253.  Compounds wherein an oxime contains a benzene ring.
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 265

  
[List of Patents for class 564 subclass 266]    266The oxime carbon is acyclic and has two rings bonded directly thereto
 This subclass is indented under subclass 265.  Compounds wherein two rings are bonded directly to the carbon of an oxime group.
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 266

  
[List of Patents for class 564 subclass 267]    267Six-membered alicyclic ring double bonded directly to the oxime nitrogen
 This subclass is indented under subclass 253.  Compounds wherein a carbon of a cyclohexyl group is bonded directly to the oxime nitrogen.
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 267

  
[List of Patents for class 564 subclass 268]    268Acyclic
 This subclass is indented under subclass 253.  Compounds wherein an oxime does not contain a ring.
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 268

  
[List of Patents for class 564 subclass 269]    269Nitrogen double bonded and two rings bonded directly to the same acyclic carbon (e.g., auramines, etc.)
 This subclass is indented under subclass 248.  Compounds wherein two rings are directly bonded to the same carbon which, in turn, is double bonded to an amino nitrogen, e.g., auramines.
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 269

  
[List of Patents for class 564 subclass 270]    270Polycyclo ring system
 This subclass is indented under subclass 248.  Compounds wherein an aldimine or ketimine containing compound contains a polycyclo ring system.
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 270

  
[List of Patents for class 564 subclass 271]    271Aldimines or ketimines which contain benzene ring (i.e., HCH=NH, wherein substitution may be made for hydrogen only but a hydrogen or carbon must be bonded directly to the carbon)
 This subclass is indented under subclass 248.  Compounds which are aldimines or ketimines and contain a benzene ring.
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 271

  
[List of Patents for class 564 subclass 272]    272Benzylidene imines (i.e., Q-benzene-CH=NH, wherein Q is a substituent or hydrogen and substitution may be made for hydrogen only)
 This subclass is indented under subclass 271.  Compounds which are benzylideneimines containing the grouping below.

Image 1 for class 564 subclass 272

(1) Note. This subclass contains, for example:

Image 2 for class 564 subclass 272

  
[List of Patents for class 564 subclass 273]    273Substituent Q contains nitrogen bonded directly to carbon
 This subclass is indented under subclass 272.  Compounds wherein a substituent attached to the ring of the benzylidene group contains a nitrogen which is directly bonded to carbon.
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 273

  
[List of Patents for class 564 subclass 274]    274Substituent Q contains hydroxy, bonded directly to carbon, or ether (H of -OH may be replaced by a substituted or unsubstituted ammonium ion or a Group IA or IIA light metal)
 This subclass is indented under subclass 272.  Compounds wherein a substituent attached to the ring of the benzylidene group contains an OH bonded directly to carbon, or an ether, wherein the H of the -OH may be replaced by a substituted or unsubstituted ammonium ion or by a Group IA or IIA light metal.
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 274

  
[List of Patents for class 564 subclass 275]    275Q is hydrogen only
 This subclass is indented under subclass 272.  Compounds wherein the benzene of the benzylidene group is unsubstituted.
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 275

  
[List of Patents for class 564 subclass 276]    276Hydroxy, bonded diretly to carbon, or ether containing (H of -OH may be replaced by a substituted or unsubstituted ammonium ion or a Group IA or IIA light metal)
 This subclass is indented under subclass 271.  Compounds wherein the aldimine or ketimine contains hydroxyl bonded directly to carbon, or an ether, wherein the H of the -OH may be replaced by a substituted or unsubstituted ammonium ion or by a Group IA or IIA light metal.
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 276

  
[List of Patents for class 564 subclass 277]    277Unsubstituted phenyl bonded directly to the aldimine or ketimine nitrogen
 This subclass is indented under subclass 271.  Compounds wherein an unsubstituted benzene is directly attached to the imino nitrogen.
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 277

  
[List of Patents for class 564 subclass 278]    278Aldimines or ketimines which are acyclic
 This subclass is indented under subclass 248.  Compounds wherein an aldimine or ketimine does not contain a ring.
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 278

  
[List of Patents for class 564 subclass 279]    279Carbon to carbon unsaturation containing
 This subclass is indented under subclass 278.  Compounds wherein the aldimine or ketimine contains a double or triple bond between two carbons.
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 279

  
[List of Patents for class 564 subclass 280]    280Phenol or thiophenol addition salts
 This subclass is indented under subclass 1.  Compounds which are formed by addition of a phenol or thiophenol to an amino nitrogen containing compound, as for example: RNH2 . HOC6H5.
  
[List of Patents for class 564 subclass 281]    281Quaternary ammonium containing
 This subclass is indented under subclass 1.  Compounds which are quaternary ammonium compounds wherein a pentavalent nitrogen is bonded by four valences to carbon.
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 281

  
[List of Patents for class 564 subclass 282]    282Benzene ring containing
 This subclass is indented under subclass 281.  Compounds wherein the quaternary ammonium compound contains a benzene ring.
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 282

  
[List of Patents for class 564 subclass 283]    283Two rings bonded directly to the same carbon
 This subclass is indented under subclass 282.  Compounds wherein the quaternary ammonium contains two rings bonded directly to the same carbon.
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 283

  
[List of Patents for class 564 subclass 284]    284Nitro or nitroso, bonded directly to carbon containing
 This subclass is indented under subclass 282.  Compounds wherein the quaternary ammonium contains a nitro or nitroso group directly bonded to carbon.
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 284

  
[List of Patents for class 564 subclass 285]    285Hydroxy, bonded directly to carbon, or ether containing (H of -OH may be replaced by a substituted or unsubstituted ammonium ion or a Group IA or IIA light metal)
 This subclass is indented under subclass 282.  Compounds wherein the quaternary ammonium contains an OH bonded directly to carbon, or an ether group, wherein the H of the -OH may be replaced by a substituted or unsubstituted ammonium ion or by a Group IA or IIA light metal.
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 285

  
[List of Patents for class 564 subclass 286]    286Polyquaternary ammonium
 This subclass is indented under subclass 285.  Compounds which contain more than one quaternary ammonium group.
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 286

  
[List of Patents for class 564 subclass 287]    287The hydroxy or ether oxygen is bonded directly to a ring
 This subclass is indented under subclass 285.  Compounds wherein the quaternary ammonium contains an -OX group bonded directly to a ring carbon, where X may be H, C, a substituted or unsubstituted ammonium ion or a Group IA or IIA light metal.
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 287

  
[List of Patents for class 564 subclass 288]    288Acyclic carbon to carbon unsaturation containing
 This subclass is indented under subclass 282.  Compounds wherein the quaternary ammonium contains a double or triple bond between two acyclic carbons.
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 288

  
[List of Patents for class 564 subclass 289]    289Halogen attached indirectly to the ammonium nitrogen by nonionic bonding
 This subclass is indented under subclass 282.  Compounds wherein the quaternary ammonium contains nonionically bonded halogen.
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 289

  
[List of Patents for class 564 subclass 290]    290Polyquaternary ammonium
 This subclass is indented under subclass 282.  Compounds which contain more than one quaternary ammonium group.
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 290

  
[List of Patents for class 564 subclass 291]    291Acyclic
 This subclass is indented under subclass 281.  Compounds wherein a quaternary ammonium compound does not contain a ring.
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 291

  
[List of Patents for class 564 subclass 292]    292Hydroxy, bonded directly to carbon, or ether containing (H of -OH may be replaced by a substituted or unsubstituted ammonium ion or a Group IA or IIA light metal)
 This subclass is indented under subclass 291.  Compounds which contain an OH bonded directly to carbon, or an ether group, wherein the H of the -OH may be replaced by a substituted or unsubstituted ammonium ion or by a Group IA or IIA light metal.
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 292

  
[List of Patents for class 564 subclass 293]    293Choline, beta-alkylcholines, ethers thereof, and salts thereof
 This subclass is indented under subclass 292.  Compounds which are choline, beta-alkyl cholines, or ethers thereof and their salts having the structure below wherein X and Y are H or C.

Image 1 for class 564 subclass 293

(1) Note. This subclass contains, for example:

Image 2 for class 564 subclass 293

  
[List of Patents for class 564 subclass 294]    294Polyoxyalkylene
 This subclass is indented under subclass 292.  Compounds wherein a quaternary ammonium contains the grouping below where n and m are positive integers and m is greater than one.

Image 1 for class 564 subclass 294

(1) Note. This subclass contains, for example:

Image 2 for class 564 subclass 294

  
[List of Patents for class 564 subclass 295]    295Polyquaternary ammonium
 This subclass is indented under subclass 291.  Compounds which contain more than one quaternary ammounium group.
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 295

  
[List of Patents for class 564 subclass 296]    296Processes
 This subclass is indented under subclass 291.  Processes for the preparation, purification, separation, or recovery of quaternary ammonium compounds classifiable only in that subclass.
  
[List of Patents for class 564 subclass 297]    297Amine oxides
 This subclass is indented under subclass 1.  Compounds which are amine oxides characterized by the structure below.

Image 1 for class 564 subclass 297

(1) Note. This subclass contains, for example:

Image 2 for class 564 subclass 297

  
[List of Patents for class 564 subclass 298]    298Processes
 This subclass is indented under subclass 297.  Processes for the preparation, purification, separation, or recovery of amine oxides.
  
[List of Patents for class 564 subclass 299]    299Benzene ring containing
 This subclass is indented under subclass 297.  Compounds wherein the amine oxide contains a benzene ring.
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 299

  
[List of Patents for class 564 subclass 300]    300Nitroxides, oxyamines or hydroxylamines (i.e., HNH-O or HNH-OH, wherein substitution may be made for hydrogen only, including O-ether and O-ester derivatives)
 This subclass is indented under subclass 1.  Compounds which are nitroxides, free radicals, containing the structure in Fig. 1, or hydroxyl amines or their O-ethers or O- esters containing the structure in Fig. 2 wherein X is H, C, or the residue of an esterifying acid group.

FIGURE 1

FIGURE 1

FIGURE 2

FIGURE 2

(1) Note. This subclass also contains compounds which are O-ethers wherein the amino nitrogen is unsubstituted.
(2) Note. This subclass contains, for example:

Image 3 for class 564 subclass 300

  
[List of Patents for class 564 subclass 301]    301Acyclic
 This subclass is indented under subclass 300.  Compounds which are nitroxides, hydroxylamines, or their O-ethers or O-esters which do not contain a ring.
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 301

  
[List of Patents for class 564 subclass 302]    302Racemization per se or with resolution of optical isomers
 This subclass is indented under subclass 1.  Processes for the formation of a racemic mixture from an amino nitrogen containing enantiomer (optical isomer), per se, or together with the separation of the enantiomers of the racemic mixture.
  
[List of Patents for class 564 subclass 303]    303Resolution per se of optical isomers
 This subclass is indented under subclass 1.  Processes which are directed to the resolution (separation) of optical isomers, which may be diastereomers or enantiomers.
  
[List of Patents for class 564 subclass 304]    304Of benzene ring containing compounds
 This subclass is indented under subclass 303.  Processes wherein the optical isomers being separated contain a benzene ring.
  
[List of Patents for class 564 subclass 305]    305Benzene ring containing
 This subclass is indented under subclass 1.  Compounds not provided for above, which contain a benzene ring.
(1) Note. This is the residual subclass for aromatic amino nitrogen compounds not specifically provided for below.
(2) Note. This subclass contains, for example:

Image 1 for class 564 subclass 305

  
[List of Patents for class 564 subclass 306]    306Alicyclic ring or ring system, having plural amino nitrogens attached directly or indirectly thereto by acyclic nonionic bonding, attached indirectly to an aryl ring or ring system by acyclic nonionic bonding
 This subclass is indented under subclass 305.  Compounds wherein a benzene ring or benzene containing polycyclo is bonded to an alicyclic ring or ring system through a single atom or an acyclic chain and the alicyclic group contains more than one amino nitrogen attached to it either directly or through a single atom or acyclic chain.
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 306

  
[List of Patents for class 564 subclass 307]    307Amino nitrogen and a ring bonded directly to the same ring, and any other amino nitrogen in the compound is bonded directly to one of the rings
 This subclass is indented under subclass 305.  Compounds wherein a benzene ring is bonded directly to another ring and one or more amino nitrogens are bonded directly only to either ring or both rings.
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 307

  
[List of Patents for class 564 subclass 308]    308Polycyclo ring system
 This subclass is indented under subclass 307.  Compounds which contain a polycyclo ring system.
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 308

  
[List of Patents for class 564 subclass 309]    309Benzidines
 This subclass is indented under subclass 307.  Compounds which are benzidines containing the grouping below.

Image 1 for class 564 subclass 309

(1) Note. This subclass contains, for example:

Image 2 for class 564 subclass 309

  
[List of Patents for class 564 subclass 310]    310Hydrazines
 This subclass is indented under subclass 305.  Compounds which are hydrazines containing the radical -NHNH- or its hydrogen substitution products.
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 310

  
[List of Patents for class 564 subclass 311]    311Symmetrical diaryl hydrazines
 This subclass is indented under subclass 310.  Compounds wherein each nitrogen of the hydrazine radical is bonded directly to a benzene ring.
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 311

  
[List of Patents for class 564 subclass 312]    312Preparing directly by reducing nitrogen containing group with metal and metallic hydroxide
 This subclass is indented under subclass 311.  Processes wherein the compound is formed by reducing a nitrogen containing group with metal and metallic hydroxide.
  
[List of Patents for class 564 subclass 313]    313Aralkyl hydrazines
 This subclass is indented under subclass 310.  Compounds wherein an aralkyl group is bonded directly to the nitrogen of a hydrazine radical.
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 313

  
[List of Patents for class 564 subclass 314]    314Processes
 This subclass is indented under subclass 310.  Processes for the preparation, purification, separation or recovery of a hydrazine group containing compound.
  
[List of Patents for class 564 subclass 315]    315Two aryl rings or ring systems bonded directly to the same carbon
 This subclass is indented under subclass 305.  Compounds wherein two benzene rings or benzene containing polycyclos are bonded to the same carbon.
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 315

SEE OR SEARCH CLASS:

552Organic Compounds,   subclasses 101+ for triarylmethyl compounds.
  
[List of Patents for class 564 subclass 316]    316Amino nitrogen attached to the carbon by an acyclic carbon or chain
 This subclass is indented under subclass 315.  Compounds wherein an amino nitrogen is indirectly bonded to the inter aryl carbon through a single atom or an acyclic chain.
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 316

  
[List of Patents for class 564 subclass 317]    317Oxygen or sulfur is bonded directly to the carbon and is part of the chain
 This subclass is indented under subclass 316.  Compounds wherein oxygen or sulfur is directly bonded to the inter aryl carbon and is part of the acyclic chain which contains the amino nitrogen.
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 317

  
[List of Patents for class 564 subclass 318]    318Processes
 This subclass is indented under subclass 317.  Processes for the preparation, purification, separation or recovery of compounds classified in that subclass.
  
[List of Patents for class 564 subclass 319]    319Oxygen, carbonyl or carbon to carbon unsaturation in the chain; or ether, carbonyl, carbon to carbon unsaturation or hydroxy, bonded directly to carbon, is part of a substituent bonded directly to the acyclic carbon or chain (H of -OH may be replaced by a substituted or unsubstituted ammonium ion or a Group IA or IIA light metal)
 This subclass is indented under subclass 361.  Compounds which contain oxygen, carbonyl, a double bond or a triple bond in the chain; or wherein ether, carbonyl, a double bond, a triple bond or a hydroxyl, which hydroxyl is bonded directly to carbon, is part of a substituent, which substituent is bonded directly to theacyclic carbon or chain, wherein the H of the - OH may be replaced by a substituted or unsubstituted ammoniom ion or a Group IA or IIA light metal.

Image 1 for class 564 subclass 319

  
[List of Patents for class 564 subclass 320]    320Hydroxy or ether oxygen bonded directly to the carbon (H of -OH may be replaced by a substituted or unsubstituted ammonium ion or a Group IA or IIA light metal)
 This subclass is indented under subclass 316.  Compounds wherein an -OX is bonded directly to the inter aryl carbon where X may be H, C, a substituted or unsubstituted ammonium ion or a Group IA or IIA light metal.
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 320

  
[List of Patents for class 564 subclass 321]    321Amino nitrogen bonded directly to the carbon
 This subclass is indented under subclass 315.  Compounds wherein an amino nitrogen is bonded directly to the inter aryl carbon.
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 321

  
[List of Patents for class 564 subclass 322]    322The carbon is a ring member of an alicyclic ring or ring system
 This subclass is indented under subclass 315.  Compounds wherein the inter aryl carbon is a ring member of an alicyclic ring or ring system.
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 322

  
[List of Patents for class 564 subclass 323]    323Amino nitrogen attached to aryl ring or ring system by an acyclic carbon or chain
 This subclass is indented under subclass 315.  Compounds wherein an amino nitrogen is indirectly attached to the benzene ring or benzene containing polycyclo through a single atom or an acyclic chain.
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 323

  
[List of Patents for class 564 subclass 324]    324Oxygen or sulfur is bonded directly to the aryl ring or ring system and is part of the chain
 This subclass is indented under subclass 323.  Compounds wherein oxygen or sulfur bonded directly to the benzene ring or ring system is part of the acyclic chain which contains the amino nitrogen.
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 324

  
[List of Patents for class 564 subclass 325]    325Additional similar chain
 This subclass is indented under subclass 324.  Compounds which contain more than one of the chains described therein.
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 325

  
[List of Patents for class 564 subclass 326]    326Amino nitrogen is bonded directly to the aryl ring or ring system and is part of the chain
 This subclass is indented under subclass 323.  Compounds wherein an amino nitrogen bonded directly to the benzene ring or ring system is part of the acyclic chain which includes the indirectly attached amino nitrogen.
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 326

  
[List of Patents for class 564 subclass 327]    327Benzhydrols or benzthiols (i.e., -OH or -SH bonded directly to the carbon)
 This subclass is indented under subclass 315.  Compounds which are benzhydrols or benzthiols wherein an -OH or -SH group is bonded directly to the inter aryl carbon.
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 327

  
[List of Patents for class 564 subclass 328]    328Benzophenones or benzothiophenones (i.e., the carbon is part of a carbonyl or thiocarbonyl)
 This subclass is indented under subclass 315.  Compounds which are benzophenones or benzothiophenones wherein the inter aryl carbon is part of a carbonyl or thiocarbonyl group.
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 328

  
[List of Patents for class 564 subclass 329]    329Processes
 This subclass is indented under subclass 328.  Processes for the preparation, purification, separation, recovery of benzophenones or benzothiophenones.
  
[List of Patents for class 564 subclass 330]    330Diamino diphenyl methanes (i.e., two phenyls, each having amino nitrogen bonded directly thereto, bonded directly to the carbon)
 This subclass is indented under subclass 315.  Compounds wherein two phenyl groups, each having an amino nitrogen directly attached, are directly bonded to the same carbon (i.e., diamino diphenyl methanes).
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 330

  
[List of Patents for class 564 subclass 331]    331Preparing by reacting carbonyl containing compound with amino nitrogen containing compound
 This subclass is indented under subclass 330.  Processes wherein an amino nitrogen containing compound is condensed with an aldehyde or ketone, as for example, the condensation of formaldehyde or acetone with aniline.
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 331

  
[List of Patents for class 564 subclass 332]    332Solid catalyst utilized
 This subclass is indented under subclass 331.  Processes wherein the reaction is carried out in the presence of a solid catalyst.
  
[List of Patents for class 564 subclass 333]    333Hydrochloric acid utilized
 This subclass is indented under subclass 331.  Processes wherein the reaction is carried out in the presence of hydrochloric acid.
  
[List of Patents for class 564 subclass 334]    334Purification or recovery
 This subclass is indented under subclass 330.  Processes directed to the purification, separation, or recovery of diamino diphenyl methanes.
  
[List of Patents for class 564 subclass 335]    335Halogen or sulfur attached directly or indirectly to the carbon by nonionic bonding
 This subclass is indented under subclass 330.  Compounds which contain halogen or sulfur nonionically bonded to carbon.
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 335

  
[List of Patents for class 564 subclass 336]    336Amino nitrogen attached to aryl ring or ring system by an acyclic carbon or chain
 This subclass is indented under subclass 305.  Compounds wherein an amino nitrogen is indirectly bonded to an aryl ring or ring system through a single acyclic carbon or through an acyclic chain.
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 336

  
[List of Patents for class 564 subclass 337]    337The aryl ring or ring system is bonded directly to another ring
 This subclass is indented under subclass 336.  Compounds wherein the aryl ring or ring system is bonded directly to another ring.
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 337

SEE OR SEARCH THIS CLASS, SUBCLASS:

307,for compounds which contain two rings or ring systems bonded directly to each other and all amino nitrogens are bonded directly to a ring or ring system.
  
[List of Patents for class 564 subclass 338]    338The other ring is alicyclic
 This subclass is indented under subclass 337.  Compounds wherein the other ring is alicyclic.
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 338

  
[List of Patents for class 564 subclass 339]    339Double bonded oxygen, ether or hydroxy, bonded directly to carbon, is attached directly or indirectly to the alicyclic ring by acyclic nonionic bonding (H of -OH may be replaced by a substituted or unsubstituted ammonium ion or a Group IA or IIA light metal)
 This subclass is indented under subclass 338.  Compounds wherein the alicyclic ring contains an -OH bonded to carbon wherein the H of the -OH may be replaced by a substituted or unsubstituted ammonium ion or by a Group IA or IIA light metal or an ether or carbonyl group.
  
[List of Patents for class 564 subclass 340]    340Sulfur is part of the chain or is attached directly or indirectly to the acyclic carbon or chain by acyclic nonionic bonding with no amino nitrogen between the sulfur and the aryl ring or ring system
 This subclass is indented under subclass 336.  Compounds wherein the chain contains sulfur or has an acyclic sulfur substituent and there is no amino nitrogen between the sulfur and the ring.
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 340

  
[List of Patents for class 564 subclass 341]    341The sulfur is bonded directly to the aryl ring or ring system
 This subclass is indented under subclass 340.  Compounds wherein the sulfur is part of the chain and is bonded directly to the aryl ring or ring system.
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 341

  
[List of Patents for class 564 subclass 342]    342Carbonyl is part of the chain or is attached directly or indirectly to the acyclic carbon or chain by acyclic nonionic bonding with no amino nitrogen between the carbonyl and the aryl ring or ring system
 This subclass is indented under subclass 336.  Compounds wherein the chain contains a carbonyl or has an acyclic carbonyl substituent and there is no amino nitrogen between the carbonyl and the ring or ring system.
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 342

  
[List of Patents for class 564 subclass 343]    343Processes
 This subclass is indented under subclass 342.  Processes for the preparation, purification, separation, or recovery of compounds defined therein and in its dependent subclasses.
  
[List of Patents for class 564 subclass 344]    344Hydroxy or ether oxygen bonded directly to the aryl ring or ring system
 This subclass is indented under subclass 342.  Compounds wherein the aryl ring or ring system contains an -OX group bonded directly to a ring carbon and X may be H or C or a substituted or unsubstituted ammonium ion or a Group IA or IIA light metal.
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 344

  
[List of Patents for class 564 subclass 345]    345Halogen bonded directly to the aryl ring or ring system
 This subclass is indented under subclass 342.  Compounds wherein the aryl ring or ring system contains halogen bonded directly to a ring carbon.
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 345

  
[List of Patents for class 564 subclass 346]    346Ether oxygen is part of the chain
 This subclass is indented under subclass 336.  Compounds wherein oxygen is part of the chain.
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 346

  
[List of Patents for class 564 subclass 347]    347The ether oxygen is bonded directly to the aryl ring or ring system
 This subclass is indented under subclass 346.  Compounds wherein oxygen which is part of the chain is bonded directly to the aryl ring or ring system.
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 347

  
[List of Patents for class 564 subclass 348]    348Hydroxy, bonded directly to carbon, or ether oxygen is attached directly or indirectly to the chain by acyclic nonionic bonding with no amino nitrogen between the hydroxy or attached ether oxygen and the aryl ring or ring system (H of -OH may be replaced by a substituted or unsubstituted ammonium ion or a Group IA or IIA light metal)
 This subclass is indented under subclass 347.  Compounds wherein the chain contains an - OH bonded to carbon wherein the H of the - OH may be replaced by a substituted or unsubstituted ammonium ion by a Group IA or IIA light metal or an ether group as substituted and there in no amino nitrogen between this group and the ring or ring system.
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 348

  
[List of Patents for class 564 subclass 349]    349Alkanol group only between the amino nitrogen and the ether oxygen which is bonded directly to the aryl ring or ring system (i.e., aryloxy alkanol amines)
 This subclass is indented under subclass 348.  Compounds which are phenoxy alkanol amines wherein the additional substituent is a hydroxyl group bonded directly to a chain carbon between the amino nitrogen and the aryl ring or ring system.
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 349

  
[List of Patents for class 564 subclass 350]    350Nitrogen bonded directly to the aryl ring or ring system
 This subclass is indented under subclass 349.  Compounds wherein the nitrogen is bonded directly to a ring carbon of the aryl ring or ring system.
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 350

  
[List of Patents for class 564 subclass 351]    351Halogen bonded directly to the aryl ring oring system
 This subclass is indented under subclass 349.  Compounds wherein halogen is bonded directly to a ring carbon of the aryl ring or ring system.
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 351

  
[List of Patents for class 564 subclass 352]    352The aryl ring or ring system is polycyclo
 This subclass is indented under subclass 347.  Compounds wherein the ring system is polycyclo.
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 352

  
[List of Patents for class 564 subclass 353]    353Hydrogen or acyclic hydrocarbyl substituents only bonded directly to the part of the chain between the ether oxygen and amino nitrogen
 This subclass is indented under subclass 347.  Compounds wherein the part of the chain between the amino nitrogen and oxygen is unsubstituted or substituted by acyclic hydrocarbon groups.
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 353

  
[List of Patents for class 564 subclass 354]    354The part of the chain between the ether oxygen and amino nitrogen consists of two unsubstituted saturated carbons
 This subclass is indented under subclass 353.  Compounds which are aryloxyethlamines, wherein the part of the chain between the amino nitrogen and the oxygen contains two carbons and is unsubstituted.
(1) Note. This subclass contains, for example:

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[List of Patents for class 564 subclass 355]    355Hydroxy, bonded directly to carbon, or ether oxygen attached directly or indirectly to the acyclic carbon or chain by acyclic nonionic bonding with no amino nitrogen between the hydroxy or ether oxygen and the aryl ring or ring system (H of -OH may be replaced by a substituted or unsubstituted ammonium ion or a Group IA or IIA light metal)
 This subclass is indented under subclass 336.  Compounds which contain hydroxyl, which is bonded directly to carbon, or an ether oxygen attached directly or indirectly to the acyclic carbon or chain by acyclic nonionic bonding, with no amino nitrogen between the hydroxyl or ether oxygen and the aryl ring or ring system, wherein the H of the -OH may be replaced by a substituted or unsubstituted ammonium ion or a Group IA or IIA light metal.
(1) Note. This subclass contains, for example:

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[List of Patents for class 564 subclass 356]    356Preparing directly by reduction, other than by reductive amination
 This subclass is indented under subclass 355.  Processes wherein the compounds are prepared directly by reduction.
(1) Note. For processes of reductive amination, see the appropriate compound subclass.
  
[List of Patents for class 564 subclass 357]    357By direct hydrogenation
 This subclass is indented under subclass 356.  Processes wherein the reduction is by direct hydrogenation.
  
[List of Patents for class 564 subclass 358]    358Group VIII noble metal containing catalyst utilized
 This subclass is indented under subclass 357.  Processes wherein a Group VIII noble metal containing catalyst is utilized in the hydrogenation.
  
[List of Patents for class 564 subclass 359]    359Preparing directly by hydrolysis
 This subclass is indented under subclass 355.  Processes wherein the compounds are prepared directly by hydrolysis, as for examples of an amide.
  
[List of Patents for class 564 subclass 360]    360Additional hydroxy, bonded directly to carbon, or ether oxygen attached directly or indirectly to the acyclic carbon or chain by acyclic nonionic bonding with no amino nitrogen between the additional hydroxy or ether oxygen and the aryl ring or ring system (H of -OH may be replaced by a substituted or unsubstitited ammonium ion or a Group IA or IIA light metal)
 This subclass is indented under subclass 355.  Compounds wherein an additional hydroxyl or an ether wherein the H of the - OH may be replaced by a substituted or unsubstituted ammonium ion or by a Group IA or IIA light metal is bonded to the carbon or the chain between the amino nitrogen and the aryl ring or ring system.
(1) Note. This subclass contains, for example:

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[List of Patents for class 564 subclass 361]    361Plural hydroxy groups bonded directly to the aryl ring or ring system (H of -OH may be replaced by a substituted or unsubstituted ammonium ion or a Group IA or IIA light metal)
 This subclass is indented under subclass 355.  Compounds wherein the aryl ring or ring system has more than one hydroxy group wherein the H of the -OH may be replaced by a substituted or unsubstituted ammonium ion or by a Group IA or IIA light metal bonded directly to a ring carbon.
(1) Note. This subclass contains, for example:

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[List of Patents for class 564 subclass 362]    362Four or more substituents on the aryl ring or ring system
 This subclass is indented under subclass 361.  Compounds wherein the aryl ring or ring system contains at least four substituents bonded directly to ring carbons.
(1) Note. This subclass contains, for example:

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[List of Patents for class 564 subclass 363]    363Beta hydroxy phenethylamines (i.e., hydroxy and the benzene ring are bonded directly to the same carbon of the chain which consists of two carbons; H of -OH may be replaced by a substituted or unsubstituted ammonium ion or a Group IA or IIA light metal)
 This subclass is indented under subclass 355.  Compounds which are beta - OX phenethylamines wherein the chain contains two carbon atoms and a benzene ring and - OX group are bonded directly to the carbon beta to the amino nitrogen, wherein the X may be H, a substituted or unsubstituted ammonium ion or a Group IA or IIA light metal.
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 363

  
[List of Patents for class 564 subclass 364]    364Acyclic hydrocarbyl alpha substituent
 This subclass is indented under subclass 363.  Compounds wherein there is an acyclic hydrocarbyl substituent bonded directly to the chain carbon which is in a position alpha to the amino nitrogen.
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 364

  
[List of Patents for class 564 subclass 365]    365Hydroxy or ether oxygen bonded directly to the aryl ring or ring system (H of -OH may be replaced by a substituted or unsubstituted ammonium ion or a Group IA or IIA light metal)
 This subclass is indented under subclass 363.  Compounds wherein the aryl ring or ring system contains an -OX group bonded directly to a ring carbon where X is H, C, a substituted or unsubstituted ammonium ion or a Group IA or IIA light metal.
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 365

  
[List of Patents for class 564 subclass 366]    366Halogen attached directly or indirectly to the acyclic carbon or chain by acyclic nonionic bonding with no amino nitrogen between the halogen and the aryl ring or ring system
 This subclass is indented under subclass 336.  Compounds wherein a halogen is attached directly or indirectly to the acyclic carbon or chain by acyclic nonionic bonding, and there is no amino nitrogen between the halogen and the aryl ring or ring system.
  
[List of Patents for class 564 subclass 367]    367The chain contains nitrogen between the aryl ring or ring system and amino nitrogen
 This subclass is indented under subclass 336.  Compounds wherein an additional amino nitrogen is part of the chain between the amino nitrogen and the aryl ring or ring system.
(1) Note. This subclass contains, for example:

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[List of Patents for class 564 subclass 368]    368Ethylene diamines
 This subclass is indented under subclass 367.  Compounds wherein the chain contains an ethylene diamine group wherein the ethylene carbons may be substituted by alkyl substituents only.
(1) Note. This subclass contains, for example:

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[List of Patents for class 564 subclass 369]    369Mono ethylene diamines
 This subclass is indented under subclass 368.  Compounds wherein there is only one ethylene diamine group.
(1) Note. This subclass contains, for example:

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[List of Patents for class 564 subclass 370]    370Plural aryl rings, which are not part of the same polycyclo ring system, or ring systems containing
 This subclass is indented under subclass 369.  Compounds wherein there are plural discrete benzene ring or ring systems.
(1) Note. This subclass contains, for example:

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[List of Patents for class 564 subclass 371]    371Methylene diamines
 This subclass is indented under subclass 367.  Compounds wherein the chain contains a methylene diamine group.
(1) Note. This subclass contains, for example:

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[List of Patents for class 564 subclass 372]    372Additional amino nitrogen attached directly or indirectly to the acyclic carbon or chain by acyclic nonionic bonding
 This subclass is indented under subclass 336.  Compounds wherein an additional nonionic amino nitrogen is bonded to the carbon or the chain either directly or as part of an acyclic substituent.
(1) Note. This subclass contains, for example:

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[List of Patents for class 564 subclass 373]    373Alpha aralkyl benzyl amines
 This subclass is indented under subclass 336.  Compounds wherein an aralkyl group is bonded directly to the alpha carbon of a benzyl amine.
(1) Note. This subclass contains, for example:

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[List of Patents for class 564 subclass 374]    374The chain consists of two or more carbons which are unsubstituted or have acyclic hydrocarbyl substituents only
 This subclass is indented under subclass 336.  Compounds wherein the chain consists of two or more carbons which are unsubstituted or substituted by acyclic hydrocarbon groups.
(1) Note. This subclass contains, for example:

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[List of Patents for class 564 subclass 375]    375Forming amine group directly by reduction, other than by reductive amination
 This subclass is indented under subclass 374.  Processes wherein the amine group is formed directly by reduction.
(1) Note. For processes of reductive amination, see the appropriate product subclass.
  
[List of Patents for class 564 subclass 376]    376Forming directly by amination which replaces halogen
 This subclass is indented under subclass 374.  Processes wherein the compounds are formed by amination by replacing a halogen by an amino nitrogen or ammonia.
  
[List of Patents for class 564 subclass 377]    377Preparing directly by hydrolysis
 This subclass is indented under subclass 374.  Processes wherein the compounds are prepared directly by hydrolysis.
  
[List of Patents for class 564 subclass 378]    378The aryl ring or ring system is polycyclo
 This subclass is indented under subclass 374.  Compounds wherein the aryl ring system is a polycyclo ring system.
(1) Note. This subclass contains, for example:

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[List of Patents for class 564 subclass 379]    379Tricyclo ring system
 This subclass is indented under subclass 378.  Compounds wherein the polycyclo ring system is tricyclo.
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 379

  
[List of Patents for class 564 subclass 380]    380The chain contains carbon to carbon unsaturation
 This subclass is indented under subclass 379.  Compounds wherein the chain contains a double or triple bond between two carbons.
(1) Note. This subclass contains, for example:

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[List of Patents for class 564 subclass 381]    381Phenethylamines having alpha alkyl substituent
 This subclass is indented under subclass 374.  Compounds which are phenethylamines, having two carbons in the chain between the amino nitrogen and a benzene ring and an alkyl substituent on the carbon alpha to the amino nitrogen.
(1) Note. This subclass contains, for example:

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[List of Patents for class 564 subclass 382]    382Phenethylamines having beta alkyl substituent
 This subclass is indented under subclass 374.  Compounds which are phenethylamines, having two carbons in the chain between the amine nitrogen and a benzene ring and an alkyl substituent on the carbon beta to the amino nitrogen.
(1) Note. This subclass contains, for example:

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[List of Patents for class 564 subclass 383]    383The chain contains carbon to carbon unsaturation
 This subclass is indented under subclass 374.  Compounds wherein the chain contains a double or triple bond between two carbons.
(1) Note. This subclass contains, for example:

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[List of Patents for class 564 subclass 384]    384The aryl ring or ring system and amino nitrogen are bonded directly to the same acyclic carbon, which carbon additionally has only hydrogen or acyclic hydrocarbyl substituents bonded directly thereto
 This subclass is indented under subclass 336.  Compounds wherein an aryl ring or ring system and an amino nitrogen are both directly bonded to the same acyclic carbon, which carbon additionally has only hydrogen or acyclic hydrocarbyl substituents bonded directly thereto.
(1) Note. This subclass contains, for example:

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[List of Patents for class 564 subclass 385]    385Forming amine group directly by reduction, other than by reductive amination
 This subclass is indented under subclass 384.  Processes wherein the amine group is formed directly by reduction.
(1) Note. For processes of reductive amination, see the appropriate product subclass.
  
[List of Patents for class 564 subclass 386]    386Forming directly by amination which replaces halogen or forming amine group directly by hydrolysis
 This subclass is indented under subclass 384.  Processes wherein the compounds are formed directly by an amination process by replacing a halogen by an amino nitrogen or ammonia or wherein the compounds are formed directly by hydrolysis.
  
[List of Patents for class 564 subclass 387]    387The aryl ring or ring system is polycyclo
 This subclass is indented under subclass 384.  Compounds wherein the aryl ring system is a polycyclo ring system.
(1) Note. This subclass contains, for example:

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[List of Patents for class 564 subclass 388]    388Plural amino methylene groups bonded directly to the same benzene ring
 This subclass is indented under subclass 384.  Compounds wherein each of at least two amino nethylene groups are bonded directly to a benzene ring carbon.
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 388

  
[List of Patents for class 564 subclass 389]    389Benzyl amines having hydroxy or ether oxygen bonded directly to the benzene ring (H of -OH may be replaced by a substituted or unsubstituted ammonium ion or a Group IA or IIA light metal)
 This subclass is indented under subclass 384.  Compounds wherein the aryl ring has an -OX bonded directly to a ring carbon and X is H or C, or a substituted or unsubstituted ammonium ion or a Group IA or IIA light metal.
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 389

  
[List of Patents for class 564 subclass 390]    390Ortho hydroxy benzyl amines
 This subclass is indented under subclass 389.  Compounds which are ortho hydroxy benzylamines.
(1) Note. This subclass contains, for example:

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[List of Patents for class 564 subclass 391]    391Benzyl amines wherein the benzene ring has no other substituents
 This subclass is indented under subclass 384.  Compounds which are benzylamines where the benzene ring has no other substituent.
(1) Note. This subclass contains, for example:

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[List of Patents for class 564 subclass 392]    392Acyclic hydrocarbyl group bonded directly to the methylene carbon
 This subclass is indented under subclass 391.  Compounds wherein an acyclic hydrocarbyl group is bonded directly to the methylene carbon.
(1) Note. This subclass contains, for example:

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[List of Patents for class 564 subclass 393]    393Preparing directly from ester other than by reduction of nitrile
 This subclass is indented under subclass 305.  Processes wherein a benzene containing amino nitrogen compound is prepared directly from an ester.

SEE OR SEARCH THIS CLASS, SUBCLASS:

415,for preparation of an aromatic amine by reduction of a nitrile.
  
[List of Patents for class 564 subclass 394]    394Preparing directly from organic acid, acid halide or salt
 This subclass is indented under subclass 305.  Processes wherein abenzene containing amino nitrogen compound is prepared directly from an organic acid, acid halide, or salt.
  
[List of Patents for class 564 subclass 395]    395Preparing directly by amination
 This subclass is indented under subclass 305.  Processes wherein a benzene containing amine nitrogen compound is prepared directly by reacting an organic compound with ammonia or an amino nitrogen containing compound replacing a hydrogen thereof or another organic radical bonded to nitrogen to form a carbon to nitrogen bond.

SEE OR SEARCH THIS CLASS, SUBCLASS:

429,and 435, for the formation of a secondary amine by condensation of two primary amines with elimination of ammonia.
  
[List of Patents for class 564 subclass 396]    396Of carbonyl containing compound
 This subclass is indented under subclass 395.  Processes wherein an aldehyde or ketone compound is aminated.
  
[List of Patents for class 564 subclass 397]    397By reductive amination
 This subclass is indented under subclass 396.  Processes wherein an aldehyde or ketone is aminated to form an aldimine or ketimine which is then reduced to an amino nitrogen form.
(1) Note. For the purposes of this classification, this subclass has combined patents which claim the reductive amination in two distinct steps as well as those where the aldimine or ketimine formation and reduction are performed in a single step.
(2) Note. For processes which recite only the reduction of an aldimine or ketimine, see subclass 415.
  
[List of Patents for class 564 subclass 398]    398Group VIII noble metal containing catalyst utilized
 This subclass is indented under subclass 397.  Processes which utilize a Group VIII noble metal containing catalyst in a reductive amination process.
  
[List of Patents for class 564 subclass 399]    399Of ether or alkylene oxide
 This subclass is indented under subclass 395.  Processes wherein the compound aminated is an ether or an alkylene oxide.
  
[List of Patents for class 564 subclass 400]    400Of halohydrin
 This subclass is indented under subclass 395.  Processes wherein the compound aminated is a halohydrin.
  
[List of Patents for class 564 subclass 401]    401Of acyclic hydroxy containing compound
 This subclass is indented under subclass 395.  Processes wherein the compound aminated is an acyclic alcohol.
  
[List of Patents for class 564 subclass 402]    402By replacing hydroxy
 This subclass is indented under subclass 395.  Processes wherein a hydroxyl is replaced in the amination reaction.
  
[List of Patents for class 564 subclass 403]    403In compound having plural hydroxys bonded directly to benzene ring
 This subclass is indented under subclass 402.  Processes wherein the compound aminated contains two or more hydroxyl groups bonded directly to a benzene ring.
  
[List of Patents for class 564 subclass 404]    404Of halogen containing compound
 This subclass is indented under subclass 395.  Processes wherein the compound which is aminated contains halogen bonded direclty to carbon.
  
[List of Patents for class 564 subclass 405]    405Which also contains benzene ring
 This subclass is indented under subclass 404.  Processes wherein the halogen containing compound contains a benzene ring.
  
[List of Patents for class 564 subclass 406]    406And nitro
 This subclass is indented under subclass 405.  Processes wherein the compound aminated also contais a nitro group bonded directly to carbon.
  
[List of Patents for class 564 subclass 407]    407Preparing primary amines
 This subclass is indented under subclass 405.  Processes wherein a primary amine is formed.
  
[List of Patents for class 564 subclass 408]    408Of hydrocarbon
 This subclass is indented under subclass 395.  Processes wherein the compound aminated is a hydrocarbon.
  
[List of Patents for class 564 subclass 409]    409Preparing directly by ring alkylation or dealkylaton
 This subclass is indented under subclass 305.  Processes wherein an alkyl side chain is directly introduced to a ring or directly removed from a ring.
  
[List of Patents for class 564 subclass 410]    410Preparing directly by nitrosation
 This subclass is indented under subclass 305.  Processes of directly introducing a nitroso group bonded to a carbon.
  
[List of Patents for class 564 subclass 411]    411Preparing directly by nitration
 This subclass is indented under subclass 305.  Processes of directly introducing a nitro group bonded to carbon.
  
[List of Patents for class 564 subclass 412]    412Preparing of halogen containing compound directly by halogenation or dehalogenation
 This subclass is indented under subclass 305.  Processes wherein a halogenated benzene containing amino nitrogen compound is prepared directly by halogenating or dehalogenating.
  
[List of Patents for class 564 subclass 413]    413Preparing directly from hetero ring containing compound
 This subclass is indented under subclass 305.  Processes wherein the compounds are prepared directly from a heterocyclic compound.
  
[List of Patents for class 564 subclass 414]    414Preparing directly from an amide (e.g., preparing directly from a sulfenamide, nitrosamine, carboxamide, thiourea, etc.)
 This subclass is indented under subclass 305.  Processes wherein the compounds are prepared directly from an amide.
  
[List of Patents for class 564 subclass 415]    415Forming amine group directly by reduction
 This subclass is indented under subclass 305.  Processes wherein an amine group is formed directly by reducing a nitrogen containing group.
  
[List of Patents for class 564 subclass 416]    416Of nitro or nitroso
 This subclass is indented under subclass 415.  Processes wherein the group which is reduced is a nitro or nitroso.
  
[List of Patents for class 564 subclass 417]    417Preparing compound which contains halogen bonded directly to carbon
 This subclass is indented under subclass 416.  Processes wherein the compound produced by reduction of the nitro or nitroso group contains halogen directly bonded to carbon.
  
[List of Patents for class 564 subclass 418]    418Preparing compound which contains hydroxy, bonded directly to carbon, or ether
 This subclass is indented under subclass 416.  Processes wherein the compound produced by reduction of a nitro or nitroso group contains a hydroxyl bonded to carbon or an ether group.
  
[List of Patents for class 564 subclass 419]    419With initial nitration step
 This subclass is indented under subclass 416.  Processes wherein the compounds are produced by first nitrating and then reducing the nitro group.
  
[List of Patents for class 564 subclass 420]    420By direct hydrogenation
 This subclass is indented under subclass 416.  Processes wherein the nitro or nitroso group is reduced by addition of hydrogen.
  
[List of Patents for class 564 subclass 421]    421Group VI metal containing catalyst utilized
 This subclass is indented under subclass 420.  Processes wherein a Group VI metal containing catalyst is utilized in the hydrogenation.
  
[List of Patents for class 564 subclass 422]    422Group VIII metal containing catalyst utilized
 This subclass is indented under subclass 420.  Processes wherein a Group VIII metal containing catalyst is utilized in the hydrogenation.
  
[List of Patents for class 564 subclass 423]    423Group VIII noble metal containing catalyst utilized
 This subclass is indented under subclass 422.  Processes wherein a Group VIII noble metal containing catalyst is utilized in the hydrogenation.
  
[List of Patents for class 564 subclass 424]    424Separating isomers
 This subclass is indented under subclass 305.  Processes which are directed to the separation of isomers.

SEE OR SEARCH THIS CLASS, SUBCLASS:

302,and 304, for the separation of optical benzene containing isomers.
  
[List of Patents for class 564 subclass 425]    425By salt formation
 This subclass is indented under subclass 424.  Processes wherein the separation of the isomers is effected by salt formation.
  
[List of Patents for class 564 subclass 426]    426Polycyclo ring system
 This subclass is indented under subclass 305.  Compounds which contains a polycyclo ring system.
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 426

  
[List of Patents for class 564 subclass 427]    427Tricyclo ring system
 This subclass is indented under subclass 426.  Compounds wherein the polycyclo ring system is a tricyclo.
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 427

  
[List of Patents for class 564 subclass 428]    428Bicyclo ring system
 This subclass is indented under subclass 426.  Compounds wherein the polycyclo ring system is bicyclo.
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 428

  
[List of Patents for class 564 subclass 429]    429Naphthyl ring system and benzene ring bonded directly to the same nitrogen
 This subclass is indented under subclass 428.  Compounds wherein a naphthyl group and a benzene are both bonded directly to the same nitrogen.
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 429

  
[List of Patents for class 564 subclass 430]    430Two benzene rings bonded directly to the same oxygen, sulfur, or polysulfide chain
 This subclass is indented under subclass 305.  Compounds which are diphenyl ethers or diphenyl sulfides wherein both benzene rings are bonded directly to oxygen, sulfur, or a polysulfide group.
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 430

  
[List of Patents for class 564 subclass 431]    431Two carbocyclic rings, at least one of which is benzene, bonded directly to the same nitrogen
 This subclass is indented under subclass 305.  Compounds wherein two rings at least one of which is benzene are bonded directly to the same nitrogen.
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 431

  
[List of Patents for class 564 subclass 432]    432Condensation products and processes of acyclic ketone and compound which contains two benzene rings bonded directly to the same nitrogen
 This subclass is indented under subclass 431.  Compounds and processes for preparing them wherein an acyclic ketone is condensed with a diarylamine.
  
[List of Patents for class 564 subclass 433]    433Two benzene rings bonded directly to the same nitrogen
 This subclass is indented under subclass 431.  Compounds which are diphenylamines wherein two benzene rings are bonded directly to the same nitrogen.
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 433

  
[List of Patents for class 564 subclass 434]    434Additional amino nitrogen containing
 This subclass is indented under subclass 433.  Compounds which contain an additional amino nitrogen.
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 434

  
[List of Patents for class 564 subclass 435]    435Preparing directly by condensing a primary amine
 This subclass is indented under subclass 433.  Processes wherein the compounds classified therein are produced by the condensation of a primary amine.
  
[List of Patents for class 564 subclass 437]    437Purification or recovery
 This subclass is indented under subclass 305.  Processes directed to the purification, separation, or recovery of moncyclic amine nitrogen containing compounds.

SEE OR SEARCH THIS CLASS, SUBCLASS:

424+,for the separation of isomers.
  
[List of Patents for class 564 subclass 438]    438By salt formation
 This subclass is indented under subclass 437.  Processes which utilize a salt formation prior to purifying, separating, or recovering.
  
[List of Patents for class 564 subclass 439]    439Of compound having amino nitrogen and hydroxy bonded directly to the benzene ring (H of -OH may be replaced by a substituted or unsubstituted ammonium ion or a Group IA or IIA light metal)
 This subclass is indented under subclass 437.  Processes for the purification, separation or recovery of compounds having an amino group and a hydroxyl bonded directly to the benzene ring, wherein the H of the -OH may be replaced by a substituted or unsubstituted ammonium ion or a Group IA or IIA light metal (i.e., aminophenols).
  
[List of Patents for class 564 subclass 440]    440Sulfur attached indirectly to the amino nitrogen by nonionic bonding
 This subclass is indented under subclass 305.  Compounds which contain sulfur nonionically bonded.
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 440

  
[List of Patents for class 564 subclass 441]    441Nitro or nitroso, bonded directly to carbon, containing
 This subclass is indented under subclass 305.  Compounds which contain a nitro or nitorso group bonded directly to carbon.
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 441

  
[List of Patents for class 564 subclass 442]    442Halogen, bonded directly to carbon, containing
 This subclass is indented under subclass 305.  Compounds which contain halogen bonded directly to carbon.
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 442

  
[List of Patents for class 564 subclass 443]    443Hydroxy, bonded directly to carbon, or ether containing (H of -OH may be replaced by a substituted or unsubstituted ammonium ion or a Group IA or IIA light metal)
 This subclass is indented under subclass 305.  Compounds which contain a hydroxyl bonded directly to carbon or an ether group, wherein the H or the -OH may be replaced by a substituted or unsubstituted ammonium ion or by a Group IA or IIA light metal.
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 443

  
[List of Patents for class 564 subclass 444]    444Preparing alicyclic ring containing compound directly by isomerization
 This subclass is indented under subclass 1.  Processes wherein an amino nitrogen containing alicyclic compound is prepared directly by isomerization.
  
[List of Patents for class 564 subclass 445]    445Preparing alicyclic ring containing compound directly by amination
 This subclass is indented under subclass 1.  Processes wherein amino nitrogen containing alicyclic compounds are produced by reacting an organic compound with ammonia or an amine to replace an unreacted hydrogen or another organic radical bonded to nitrogen to form a carbon to nitrogen bond.
  
[List of Patents for class 564 subclass 446]    446Of aldehyde or ketone containing compound
 This subclass is indented under subclass 445.  Processes wherein the compound reacted is an aldehyde or ketone.
  
[List of Patents for class 564 subclass 447]    447Of hydroxy containing compound
 This subclass is indented under subclass 445.  Processes wherein the compound reacted is one containing a hydroxyl bonded to a noncarbonylic carbon.
  
[List of Patents for class 564 subclass 448]    448Forming amine group of alicyclic ring containing compound directly by reduction
 This subclass is indented under subclass 1.  Processes wherein an amino nitrogen containing alicyclic compound is formed directly by reduction of a nitrogen containing group.
  
[List of Patents for class 564 subclass 449]    449Including hydrogenating benzene ring
 This subclass is indented under subclass 448.  Processes which include the hydrogenation of a benzene ring.
  
[List of Patents for class 564 subclass 450]    450Preparing alicyclic ring containing compound directly by hydrogenating benzene ring
 This subclass is indented under subclass 1.  Processes wherein an amine nitrogen containing alicyclic compound is prepared directly by hydrogenation of a benzene ring.
  
[List of Patents for class 564 subclass 451]    451Plural amino nitrogens containing
 This subclass is indented under subclass 450.  Processes wherein the compound prepared contains more than one amine nitrogen.
  
[List of Patents for class 564 subclass 452]    452Plural alicyclic rings, which are not part of the same polycyclo ring system, or ring systems bonded directly to the same carbon
 This subclass is indented under subclass 1.  Compounds wherein two discrete alicyclic rings or ring systems are bonded directly to the same carbon.
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 452

  
[List of Patents for class 564 subclass 453]    453Alicyclic ring or ring system and amino nitrogen are attached indirectly by an acyclic carbon or chain
 This subclass is indented under subclass 1.  Compounds wherein an amino nitrogen is indirectly bonded to an alicyclic ring or ring system through a single acyclic carbon or through an acyclic chain.
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 453

  
[List of Patents for class 564 subclass 454]    454The chain consists of two or more carbons which are unsubstituted or have acyclic hydrocarbyl substituents only
 This subclass is indented under subclass 453.  Compounds wherein the chain contains at least two carbons and is either unsubstituted or substituted only by acyclic hydrocarbon groups.
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 454

  
[List of Patents for class 564 subclass 455]    455The alicyclic ring and amino nitrogen are bonded directly to the same acyclic carbon, which carbon additionally has only hydrogen or acyclic hydrocarbyl substituents bonded directly thereto
 This subclass is indented under subclass 453.  Compounds wherein the amino nitrogen is indirectly bonded to the alicyclic ring or ring system through a single acyclic carbon which is unsubstituted or may be substituted by acyclic hydrocarbon groups.
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 455

  
[List of Patents for class 564 subclass 456]    456Polycyclo ring system
 This subclass is indented under subclass 455.  Compounds wherein the alicyclic ring system is a polycyclo.
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 456

  
[List of Patents for class 564 subclass 457]    457Plural alicyclic rings
 This subclass is indented under subclass 1.  Compounds wherein there is more than one alicyclic ring.
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 457

  
[List of Patents for class 564 subclass 458]    458Polycyclo ring system
 This subclass is indented under subclass 457.  Compounds wherein the plural rings are in the form of a polycyclo ring system.
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 458

  
[List of Patents for class 564 subclass 459]    459Tricyclo ring system
 This subclass is indented under subclass 458.  Compounds wherein the polycyclo ring system is a tricyclo.
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 459

  
[List of Patents for class 564 subclass 460]    460Bicyclo ring system
 This subclass is indented under subclass 458.  Compounds wherein the polycyclo ring system is bicyclo.
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 460

  
[List of Patents for class 564 subclass 461]    461Alicyclic ring and plural amino nitrogens containing
 This subclass is indented under subclass 1.  Compounds which contain an alicyclic ring an more than one amino nitrogen.
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 461

  
[List of Patents for class 564 subclass 462]    462Cyclohexyl ring containing
 This subclass is indented under subclass 1.  Compounds which contain a cyclohexyl ring.
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 462

  
[List of Patents for class 564 subclass 463]    463Acyclic
 This subclass is indented under subclass 1.  Compounds which contain no ring.
(1) Note. This subclass contains, for example:

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[List of Patents for class 564 subclass 464]    464Aminimine or hydrazine containing
 This subclass is indented under subclass 463.  Compounds which contain a hydrazine group -NHNH- or its hydrogen substitution products; or aminimines containing the grouping below.

Image 1 for class 564 subclass 464

(1) Note. This subclass contains, for example:

Image 2 for class 564 subclass 464

  
[List of Patents for class 564 subclass 465]    465Preparing directly by reducing a nitrosamine
 This subclass is indented under subclass 464.  Processes wherein the compounds are prepared directly by reducing a nitrosamine.
  
[List of Patents for class 564 subclass 466]    466Preparing directly by condensing a haloamine
 This subclass is indented under subclass 464.  Processes wherein the compounds are produced by the condensation of a haloamine.
  
[List of Patents for class 564 subclass 467]    467Preparing directly utilizing carbon monoxide
 This subclass is indented under subclass 463.  Processes wherein the compounds are prepared by the direct utilization of carbon monoxide.
  
[List of Patents for class 564 subclass 468]    468Preparing directly from ester, organic acid or salt, other than by reduction of nitrile
 This subclass is indented under subclass 463.  Processes wherein the compounds are prepared directly from an ester or an organic acid or salt.

SEE OR SEARCH THIS CLASS, SUBCLASS:

490+,for the reduction of a nitrile to form an amino nitrogen compound.
  
[List of Patents for class 564 subclass 469]    469Preparing directly by amination
 This subclass is indented under subclass 463.  Processes wherein an acyclic amino nitrogen compound is prepared directly by reacting an organic compound with ammonia or an amino nitrogen containing compound replacing an hydrogen thereof or another organic radical bonded to nitrogen to form a carbon to nitrogen bond.
  
[List of Patents for class 564 subclass 470]    470By transamination
 This subclass is indented under subclass 469.  Processes wherein a radical bonded to amino nitrogen by a carbon to nitrogen bond is replaced by a different radical similarly bonded to another amino nitrogen or another radical to form a carbon to nitrogen bond.
  
[List of Patents for class 564 subclass 471]    471Of aldehyde or ketone containing compound
 This subclass is indented under subclass 469.  Processes wherein the organic compound reacted is an aldehyde or ketone.
  
[List of Patents for class 564 subclass 472]    472By reductive amination
 This subclass is indented under subclass 471.  Processes wherein the aldehyde or ketone is aminated to form an aldimine or ketimine which is then reduced to an amino nitrogen form.
(1) Note. This subclass contains patents which claim the reductive amination in two distinct steps as well as those wherein the aldimine or ketimine formation and reduction are performed in a single step.

SEE OR SEARCH THIS CLASS, SUBCLASS:

489,for processes which recite only the reduction of an aldimine or ketimine.
  
[List of Patents for class 564 subclass 473]    473Of aldehyde containing compound
 This subclass is indented under subclass 472.  Processes wherein an aldehyde is subjected to reductive amination.
  
[List of Patents for class 564 subclass 474]    474Of ether containing compound
 This subclass is indented under subclass 469.  Processes wherein the organic compound contains an ether group.
  
[List of Patents for class 564 subclass 475]    475Of an alkylene oxide
 This subclass is indented under subclass 474.  Processes wherein the organic compound is an alkylene oxide.
  
[List of Patents for class 564 subclass 476]    476Of an epihalohydrin
 This subclass is indented under subclass 475.  Processes wherein the organic compound is an epihalohydrin.
  
[List of Patents for class 564 subclass 477]    477Producing monohydroxy alkyl amines
 This subclass is indented under subclass 475.  Processes wherein the compounds produced are monohydroxy alkyl amines (i.e., HO-alkyl)x-N-(H)3-x).
  
[List of Patents for class 564 subclass 478]    478Of hydroxy containing compound
 This subclass is indented under subclass 469.  Processes wherein the organic compound contains a hydroxyl bonded to carbon.
  
[List of Patents for class 564 subclass 479]    479Catalyst utilized
 This subclass is indented under subclass 478.  Processes wherein a catalyst is utilized.
  
[List of Patents for class 564 subclass 480]    480Group VI or VIII metal containing catalyst utilized
 This subclass is indented under subclass 479.  Processes wherein the catalyst is a Group VI or Group VIII metal containing compound.
  
[List of Patents for class 564 subclass 481]    481Of halogen containing compound
 This subclass is indented under subclass 469.  Processes wherein the organic compound contains halogen bonded directly to carbon.
  
[List of Patents for class 564 subclass 482]    482Of an alkylene dihalide
 This subclass is indented under subclass 481.  Processes wherein the organic compound is an alkylene dihalide.
  
[List of Patents for class 564 subclass 483]    483Of compound which contains an atom other than carbon, hydrogen, and halogen
 This subclass is indented under subclass 481.  Processes wherein the organic compound contains a nonionically bonded element other than carbon, hydrogen, or halogen and not provided for above.
  
[List of Patents for class 564 subclass 484]    484Of compound which contains carbon to carbon unsaturation
 This subclass is indented under subclass 481.  Processes wherein the organic compound also contains a double or triple bond between two carbons.
  
[List of Patents for class 564 subclass 485]    485Of compound which contains carbon to carbon unsaturation
 This subclass is indented under subclass 469.  Processes wherein the organic compound contains a double or triple bond between two carbons.
  
[List of Patents for class 564 subclass 486]    486Preparing directly by dealkylation
 This subclass is indented under subclass 463.  Processes wherein an organic radical bonded directly to an amino nitrogen through carbon is replaced directly by hydrogen.
  
[List of Patents for class 564 subclass 487]    487Preparing directly from hetero ring containing compound
 This subclass is indented under subclass 463.  Processes wherein the compounds are produced directly from a heterocyclic compound.
  
[List of Patents for class 564 subclass 488]    488Preparing directly from an amide (e.g., preparing directly from a carboxamide, etc.)
 This subclass is indented under subclass 463.  Processes wherein the compounds are produced directly from an amide such as, for example, a carboxamide or a sulfonamide.
  
[List of Patents for class 564 subclass 489]    489Forming amine group directly by reduction
 This subclass is indented under subclass 463.  Processes wherein the amine group is formed directly by reduction of a nitrogen containing group.
  
[List of Patents for class 564 subclass 490]    490Of cyano
 This subclass is indented under subclass 489.  Processes wherein the group reduced is a cyano group.
(1) Note. The formation of secondary or tertiary amines by reduction of a nitrile is placed in this subclass.
  
[List of Patents for class 564 subclass 491]    491Of plural cyanos
 This subclass is indented under subclass 490.  Processes wherein more than one cyano group is reduced.
  
[List of Patents for class 564 subclass 492]    492Preparing hexamethylene diamine
 This subclass is indented under subclass 491.  Processes wherein hexamethylene diamine is produced.
  
[List of Patents for class 564 subclass 493]    493Preparing a primary monoamine
 This subclass is indented under subclass 490.  Processes wherein a primary mono amine is produced.
  
[List of Patents for class 564 subclass 494]    494Of nitro or nitroso
 This subclass is indented under subclass 489.  Processes wherein the nitrogen containing group which is reduced is a nitro or nitroso group.
  
[List of Patents for class 564 subclass 495]    495The nitro or nitroso is in a compound which contains hydroxy, bonded directly to carbon, or ether
 This subclass is indented under subclass 494.  Processes wherein a compound containing a nitro or nitroso group which is reduced also contains a hydroxyl group bonded directly to carbon or an ether group.
  
[List of Patents for class 564 subclass 496]    496Preparing directly by halogenation
 This subclass is indented under subclass 463.  Processes wherein the acyclic amino nitrogen compounds are produced by introducing halogen to form a direct bond to carbon.
  
[List of Patents for class 564 subclass 497]    497Purification or recovery
 This subclass is indented under subclass 463.  Processes directed to the purification, separation, or recovery of acyclic amino nitrogen containing compounds.
  
[List of Patents for class 564 subclass 498]    498Of an alkylene polyamine
 This subclass is indented under subclass 497.  Processes wherein the compounds prepared are alkylene polyamines.
  
[List of Patents for class 564 subclass 499]    499Separating primary, secondary, or tertiary amines from each other
 This subclass is indented under subclass 497.  Processes wherein mixtures of primary, secondary, or tertiary amines are separated from each other.
  
[List of Patents for class 564 subclass 500]    500Sulfur attached indirectly to the amino nitrogen by nonionic bonding
 This subclass is indented under subclass 463.  Compounds which contain nonionically bonded sulfur.
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 500

  
[List of Patents for class 564 subclass 501]    501Thioether containing
 This subclass is indented under subclass 500.  Compounds wherein the sulfur is present in the form of a thioether.
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 501

  
[List of Patents for class 564 subclass 502]    502Aldehyde or ketone containing
 This subclass is indented under subclass 463.  Compounds which contain an aldehyde or ketone group.
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 502

  
[List of Patents for class 564 subclass 503]    503Hydroxy, bonded directly to carbon, or ether containing (H of -OH may be replaced by a substituted or unsubstituted ammonium ion or a Group IA or IIA light metal)
 This subclass is indented under subclass 463.  Compounds which contain a hydroxyl group bonded directly to carbon, or an ether, wherein the H of the -OH Group may be replaced by a substituted or unsubstituted ammonium ion or by a Group IA or IIA light metal.
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 503

  
[List of Patents for class 564 subclass 504]    504Polyether
 This subclass is indented under subclass 503.  Compounds which contain more than one ether group.
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 504

  
[List of Patents for class 564 subclass 505]    505Polyoxyalkylene
 This subclass is indented under subclass 504.  Compounds which contain the grouping -O- (CnH2nO)m where m and n are positive integers and m is greater than one.
(1) Note. This subclass contains, for example: H37 C18 - O - ( CH2 CH2 O )19 - CH2CH2CH3
  
[List of Patents for class 564 subclass 506]    506Polyhydroxy (H of -OH may be replaced by a substituted or unsubstituted ammonium ion or a Group IA or IIA light metal)
 This subclass is indented under subclass 503.  Compounds which contain more than one hydroxyl bonded to carbon.
(1) Note. This subclass contains, for example: H37C18- OH HO - CH2 CH2 -NH - CH2 CH2CH2 -NH - CH2 CH2 - OH
  
[List of Patents for class 564 subclass 507]    507Plural hydroxys in the same substituent on the amino nitrogen (H of -OH may be replaced by a substituted or unsubstituted ammonium ion or a Group IA or IIA light metal)
 This subclass is indented under subclass 506.  Compounds which contain more than one hydroxyl bonded to carbon on the same amino nitrogen substituent.
(1) Note. This subclass contains, for example: HO - CH2 - (CHOH) 3OH HO - CH2CH2- OH
  
[List of Patents for class 564 subclass 508]    508Monoether
 This subclass is indented under subclass 503.  Compounds which contain only one ether group.
(1) Note. This subclass contains, for example: CH3 - CH2 - O - CH2- CH2 -CH3
  
[List of Patents for class 564 subclass 509]    509Carbon to carbon unsaturation containing
 This subclass is indented under subclass 463.  Compounds which contain a double or triple bond between two carbons.
(1) Note. This subclass contains, for example: H2C = CHCH2CH3
  
[List of Patents for class 564 subclass 510]    510Halogen, bonded directly to carbon, containing
 This subclass is indented under subclass 463.  Compounds which contain halogen bonded directly to carbon.
(1) Note. This subclass contains, for example: Br(CH2)3-NHCH3 H2N - CH2 - (CF2)3- CH2- NH2
  
[List of Patents for class 564 subclass 511]    511Plural amino nitrogens containing
 This subclass is indented under subclass 463.  Compounds which contain more than one amino nitrogen.
(1) Note. This subclass contains, for example. H31C15CH2CH2CH3

Image 1 for class 564 subclass 511

  
[List of Patents for class 564 subclass 512]    512Three or more amino nitrogens containing
 This subclass is indented under subclass 511.  Compounds which contain three or more amino nitrogens.
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 512

  

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