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Outline
Indent Level
Color Curly Brackets (indicating CPC extensions to IPC) References Date Revised
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CPC
COOPERATIVE PATENT CLASSIFICATION
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PLASMA TECHNIQUE (fusion reactors G21B; ion-beam tubes H01J 27/00; magnetohydrodynamic generators H02K 44/08; producing X-rays involving plasma generation H05G 2/00); PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS (obtaining neutrons from radioactive sources G21, e.g. G21B, G21C, G21G); PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS (atomic clocks G04F 5/14; devices using stimulated emission H01S; frequency regulation by comparison with a reference frequency determined by energy levels of molecules, atoms, or subatomic particles H03L 7/26) [2013‑01]
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Generating plasma; Handling plasma [2013‑01]
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.
{
Investigating plasma, e.g. degree of ionisation (electron temperature)
}
[2013‑01]
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H05H 1/0012
. .
{
by using radiation
}
[2013‑01]
H05H 1/0018
. . .
{
Details
}
[2013‑01]
. . .
{
by using photoelectric means (H05H 1/0031 to H05H 1/0043 take precedence)
}
[2013‑01]
H05H 1/0031
. . .
{
by interferrometry
}
[2013‑01]
. . .
{
by spectrometry (see G01N 3/00)
}
[2013‑01]
H05H 1/0043
. . .
{
by using infra-red or ultra-violet radiation
}
[2013‑01]
. . .
{
by using X-rays or alpha rays (see G01N 23/00)
}
[2013‑01]
. . .
{
by using neutrons (see G01N 23/00)
}
[2013‑01]
. . .
{
by using microwaves (see G01N 23/223)
}
[2013‑01]
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. .
{
by thermal means (see G01N 25/00)
}
[2013‑01]
H05H 1/0075
. . .
{
Langmuir probes
}
[2013‑01]
. .
{
by electric means (see G01N 27/00, G01R)
}
[2013‑01]
. .
{
by magnetic means (see G01N 27/00, G01R)
}
[2013‑01]
. .
{
by acoustic, e.g. ultrasonic means (see G01N 29/02)
}
[2013‑01]
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.
Arrangements for confining plasma by electric or magnetic fields; Arrangements for heating plasma (
{
G21B 1/00 takes precedence;
}
electron optics H01J)
[2013‑01]
H05H 1/03
. .
using electrostatic fields [2013‑01]
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H05H 1/04
. .
using magnetic fields substantially generated by the discharge in the plasma [2013‑01]
H05H 1/06
. . .
longitudinal pinch devices [2013‑01]
H05H 1/08
. . .
Theta pinch devices
{
e.g. SCYLLA
}
[2013‑01]
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H05H 1/10
. .
using externally-applied magnetic field only
{
e.g. Q-machines, Yin-Yang, base-ball
}
[2013‑01]
H05H 1/105
. . .
{
using magnetic pumping
}
[2013‑01]
. . .
using cusp configuration (H05H 1/14 takes precedence) [2013‑01]
. . .
wherein the containment vessel forms a closed or nearly closed loop
{
(G21B 1/05 takes precedence)
}
[2013‑01]
. . .
wherein the containment vessel is straight and has magnetic mirrors [2013‑01]
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. .
using externally-applied electric and magnetic field [2013‑01]
. . .
wherein the field oscillate at very high frequency, e.g. in the microwave range
{
e.g. using cyclotron resonance
}
[2013‑01]
. .
Ohmic heating [2013‑01]
. .
for injection heating
{
(G21B 1/15 takes precedence)
}
[2013‑01]
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.
Generating plasma
{
(gas-filled discharge reactors H01J 37/32; nuclear fusion reactors G21B 1/00; ohmic heating H05H 1/20; injection heating H05H 1/22)
}
[2013‑01]
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. .
{
Dielectric barrier discharges
}
[2013‑01]
H05H 2001/2412
. . .
{
the dielectric being interposed between the electrodes
}
[2013‑01]
H05H 2001/2418
. . .
{
the electrodes being embedded in the dielectric
}
[2013‑01]
H05H 2001/2425
. . .
{
the electrodes being flush with the dielectric
}
[2013‑01]
H05H 2001/2431
. . .
{
Cylindrical electrodes
}
[2013‑01]
H05H 2001/2437
. . .
{
Multilayer systems
}
[2013‑01]
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H05H 2001/2443
. . .
{
Flow through, i.e. the plasma fluid flowing in a dielectric tube
}
[2013‑01]
H05H 2001/245
. . . .
{
Internal electrodes
}
[2013‑01]
H05H 2001/2456
. . . .
{
External electrodes
}
[2013‑01]
H05H 2001/2462
. . . .
{
Ring electrodes
}
[2013‑01]
H05H 2001/2468
. . . .
{
Spiral electrodes
}
[2013‑01]
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. .
{
Acoustic pressure discharge
}
[2013‑01]
H05H 2001/2481
. . .
{
Piezoelectric actuators
}
[2013‑01]
H05H 2001/2487
. . .
{
Mechanical actuators
}
[2013‑01]
H05H 2001/2493
. . .
{
Horns
}
[2013‑01]
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. .
Plasma torches
{
(metal working with constricted arc B23K 10/00, B23K 10/02; metal spraying B05B 7/18, B05B 7/20)
}
[2015‑07]
. . .
Cooling arrangements [2013‑01]
. . .
using applied electromagnetic fields, e.g. high frequency or microwave energy (H05H 1/28 takes precedence) [2013‑01]
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. . .
using an arc (H05H 1/28 takes precedence) [2013‑01]
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. . . .
Details, e.g. electrodes, nozzles
{
(cf. B23K 9/24)
}
[2013‑01]
. . . . .
{
Arc stabilising or constricting arrangements, e.g. by an additional gas flow (by externally applied magnetic field H05H 1/40; by using powders or liquids H05H 1/42; using coaxial protecting fluid H05H 1/341)
}
[2013‑01]
. . . . .
{
using coaxial protecting fluid (arc stabilising or constricting arrangements H05H 1/3405; introducing materials into the plasma H05H 1/42)
}
[2013‑01]
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H05H 2001/3415
. . . . .
{
indexing scheme associated with H05H 1/34
}
[2013‑01]
H05H 2001/3421
. . . . . .
{
transferred arc mode
}
[2013‑01]
H05H 2001/3426
. . . . . .
{
pilot arc
}
[2013‑01]
H05H 2001/3431
. . . . . .
{
coaxial cylindrical electrodes
}
[2013‑01]
H05H 2001/3436
. . . . . .
{
hollow cathode with internal coolant flow
}
[2013‑01]
H05H 2001/3442
. . . . . .
{
cathode with inserted tip
}
[2013‑01]
H05H 2001/3447
. . . . . .
{
rod-like cathode
}
[2013‑01]
H05H 2001/3452
. . . . . .
{
supplementary electrodes between cathode and anode, e.g. cascade
}
[2013‑01]
H05H 2001/3457
. . . . . .
{
nozzle protection devices
}
[2013‑01]
H05H 2001/3463
. . . . . .
{
oblique nozzle
}
[2013‑01]
H05H 2001/3468
. . . . . .
{
vortex generator
}
[2013‑01]
H05H 2001/3473
. . . . . .
{
safety means
}
[2013‑01]
H05H 2001/3478
. . . . . .
{
geometrical details
}
[2013‑01]
H05H 2001/3484
. . . . . .
{
convergent/divergent nozzle
}
[2013‑01]
H05H 2001/3489
. . . . . .
{
contact starting
}
[2013‑01]
H05H 2001/3494
. . . . . .
{
discharge parameter control
}
[2013‑01]
. . . . .
Circuit arrangements (H05H 1/38,H05H 1/40 take precedence) [2013‑01]
. . . . .
Guiding or centering of electrodes [2013‑01]
. . . . .
using applied magnetic fields, e.g. for fucusing or rotating the arc
{
(cf. B23K 9/08, B23K 9/073)
}
[2013‑01]
. . . .
with provision for introducing materials into the plasma, e.g. powder, liquid (electrostatic spraying, spraying apparatus with means for charging the spray electrically B05B 5/00
{
cf. B23K 9/324, B05B 7/22; arc stabilising or constricting arrangements H05H 1/3405; coaxial protecting fluids H05H 1/341
}
)
[2013‑01]
H05H 1/44
. . . .
using more than one torch [2013‑01]
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. .
using applied electromagnetic fields, e.g. high frequency or microwave energy (H05H 1/26 takes precedence) [2013‑01]
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H05H 2001/4607
. . .
{
Microwave discharges
}
[2013‑01]
H05H 2001/4615
. . . .
{
Surface waves
}
[2013‑01]
H05H 2001/4622
. . . .
{
Waveguides
}
[2013‑01]
H05H 2001/463
. . . .
{
Antennas or applicators
}
[2013‑01]
H05H 2001/4637
. . . .
{
Cables
}
[2013‑01]
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H05H 2001/4645
. . .
{
Radiofrequency discharges
}
[2013‑01]
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H05H 2001/4652
. . . .
{
Inductively coupled
}
[2013‑01]
H05H 2001/466
. . . . .
{
Electrodes
}
[2013‑01]
H05H 2001/4667
. . . . .
{
Coiled antennas
}
[2013‑01]
H05H 2001/4675
. . . .
{
Capacitively coupled
}
[2013‑01]
H05H 2001/4682
. . . .
{
Associated power generators, e. G. Circuits, matching networks
}
[2013‑01]
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H05H 2001/469
. . .
{
Flow through, i.e the plasma fluid flowing in a non-dielectric vessel
}
[2013‑01]
H05H 2001/4692
. . . .
{
dielectric barrier discharge (H05H 1/2406 takes precedence)
}
[2013‑01]
H05H 2001/4695
. . . .
{
Arc discharge
}
[2013‑01]
H05H 2001/4697
. . . .
{
Glow discharge
}
[2013‑01]
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. .
using an arc (H05H 1/26 takes precedence) [2013‑01]
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. . .
{
Corona discharges
}
[2013‑01]
H05H 2001/483
. . . .
{
Pointed electrodes
}
[2013‑01]
H05H 2001/485
. . . .
{
Cylindrical electrodes, e.g. Rotary drums electrodes
}
[2013‑01]
H05H 2001/486
. . . .
{
Filamentary electrodes
}
[2013‑01]
H05H 2001/488
. . . .
{
Segmented electrodes
}
[2013‑01]
. . .
and using applied magnetic fields, e.g. for focusing or rotating the arc [2013‑01]
. .
using exploding wires or spark gaps (H05H 1/26 takes precedence; spark gaps in general H01T) [2013‑01]
.
Plasma accelerators [2013‑01]
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Production or acceleration of neutral particle beams, e.g. molecular or atomic beams [2013‑01]
.
Molecular or atomic beam generation
{
(charge exchange devices G21K 1/14; polarising devices G21K 1/16; using resonance or molecular beams for analysing or investigating materials G01N 24/002; atomic clock G04F 5/14; beam masers H01S 1/06)
}
[2013‑01]
.
Acceleration by electromagnetic wave pressure [2013‑01]
.
Generating neutron beams (targets for producing nuclear reactions H05H 6/00; neutron sources G21G 4/02) [2013‑01]
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Direct voltage accelerators; Accelerators using single pulses (H05H 3/06 takes precedence) [2013‑01]
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.
Details (targets for producing nuclear reactions H05H 6/00) [2013‑01]
. .
Accelerating tubes (vessels or containers of electric discharge tubes with improved potential distribution over surface of vessel H01J 5/06; shields of X-ray tubes associated with vessels or containers H01J 35/16) [2013‑01]
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H05H 5/04
.
{
energised by electrostatic generators
}
[2013‑01]
H05H 5/042
. .
{
of the van de Graaf type
}
[2013‑01]
. .
{
High voltage cascades, e.g. Greinacher cascade
}
[2013‑01]
H05H 5/047
. .
{
Pulsed generators
}
[2013‑01]
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H05H 5/06
.
{
Multistage accelerators
}
[2013‑01]
H05H 5/063
. .
{
Tandems
}
[2013‑01]
H05H 5/066
. .
{
Onion-like structures
}
[2013‑01]
H05H 5/08
.
Particle accelerators using step-up transformers, e.g. resonance transformers [2013‑01]
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Targets for producing nuclear reactions (supports for targets or objects to be irradiated G21K 5/08
{
preparation of tritium C01B 4/00
}
)
;
{
targets, e.g. pellets for fusion reactions by laser or charged particles beam injection H05H 1/22
}
[2013‑01]
H05H 2006/002
.
{
Windows
}
[2013‑01]
.
{
Polarised targets (polarising devices, e.g. for obtaining a polarised ion beam G21K 1/16)
}
[2013‑01]
H05H 2006/007
.
{
Radiation protection arrangements , e.g. screens
}
[2013‑01]
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Details of devices of the types covered by groups H05H 9/00, H05H 11/00, H05H 13/00 [2013‑01]
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.
{
Arrangements for beam delivery or irradiation (irradiation systems per se G21K 5/00)
}
[2013‑01]
H05H 2007/002
. .
{
for modifying beam trajectory , e.g. gantries
}
[2013‑01]
H05H 2007/004
. .
{
for modifying beam energy, e.g. spread out Bragg peak devices
}
[2013‑01]
H05H 2007/005
. .
{
for modifying beam emittance , e.g. stochastic cooling devices, stripper foils
}
[2013‑01]
H05H 2007/007
. .
{
for focusing the beam to irradiation target
}
[2013‑01]
H05H 2007/008
. .
{
for measuring beam parameters
}
[2013‑01]
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.
Circuits or systems for supplying or feeding radio-frequency energy (radio-frequency generators H03B) [2013‑01]
H05H 2007/022
. .
{
Pulsed systems
}
[2013‑01]
H05H 2007/025
. .
{
Radiofrequency systems
}
[2013‑01]
H05H 2007/027
. .
{
Microwave systems
}
[2013‑01]
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.
Magnet systems
{
e.g. undulators, wigglers (free-electron laser H01S 3/0903)
}
; Energisation thereof [2013‑01]
H05H 2007/041
. .
{
for beam bunching , e.g. undulators
}
[2013‑01]
H05H 2007/043
. .
{
for beam focusing
}
[2013‑01]
H05H 2007/045
. .
{
for beam bending
}
[2013‑01]
H05H 2007/046
. .
{
for beam deflection
}
[2013‑01]
H05H 2007/048
. .
{
for modifying beam trajectory , e.g. gantry systems
}
[2013‑01]
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.
Two-beam arrangements; Multi-beam arrangements
{
storage rings
}
; Electron rings [2013‑01]
H05H 2007/065
. .
{
Multi-beam merging , e.g. funneling
}
[2013‑01]
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.
Arrangements for injecting particles into orbits [2013‑01]
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H05H 2007/081
. .
{
Sources
}
[2013‑01]
H05H 2007/082
. . .
{
Ion sources, e.g. ECR, duoplasmatron, PIG, laser sources
}
[2013‑01]
H05H 2007/084
. . .
{
Electron sources
}
[2013‑01]
H05H 2007/085
. .
{
by electrostatic means
}
[2013‑01]
H05H 2007/087
. .
{
by magnetic means
}
[2013‑01]
H05H 2007/088
. .
{
by mechanical means, e.g. stripping foils
}
[2013‑01]
.
Arrangements for ejecting particles from orbits [2013‑01]
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.
Arrangements for varying final energy of beam [2013‑01]
H05H 2007/122
. .
{
by electromagnetic means , e.g. RF cavities
}
[2013‑01]
H05H 2007/125
. .
{
by mechanical means , e.g. stripping foils
}
[2013‑01]
H05H 2007/127
. .
{
by emittance variation , e.g. stochastic cooling
}
[2013‑01]
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.
Vacuum chambers (H05H 5/03 takes precedence) [2013‑01]
H05H 7/16
. .
of the waveguide type [2013‑01]
Collapse
. .
Cavities; Resonators
{
(travelling-wave tubes H01J 23/18; hyperfrequency cavities in general H01P 7/04, H01P 7/06)
}
[2013‑01]
H05H 7/20
. . .
with superconductive walls [2013‑01]
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.
Details of linear accelerators, e.g. drift tubes (H05H 7/02 to H05H 7/20 take precedence) [2013‑01]
H05H 2007/222
. .
{
drift tubes
}
[2013‑01]
H05H 2007/225
. .
{
coupled cavities arrangements
}
[2013‑01]
H05H 2007/227
. .
{
power coupling , e.g. coupling loops
}
[2013‑01]
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Linear accelerators [2013‑01]
H05H 9/005
.
{
Dielectric wall accelerators
}
[2013‑01]
.
Travelling-wave linear accelerators
{
(travelling-wave tubes H01J 25/34)
}
[2013‑01]
Collapse
.
Standing-wave linear accelerators [2013‑01]
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H05H 9/041
. .
{
Hadron LINACS
}
[2013‑01]
. . .
{
Drift tube LINACS
}
[2013‑01]
H05H 9/044
. . .
{
Coupling cavity LINACS, e.g. side coupled
}
[2013‑01]
H05H 9/045
. . .
{
Radio frequency quadrupoles
}
[2013‑01]
. . .
{
Hybrid systems
}
[2013‑01]
. .
{
Lepton LINACS
}
[2013‑01]
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Magnetic induction accelerators, e.g. betatrons [2013‑01]
H05H 11/02
.
Air-cored betatrons [2013‑01]
H05H 11/04
.
Biased betatrons [2013‑01]
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Magnetic resonance accelerators; Cyclotrons
{
(strophotrons, turbine tubes H01J 25/62)
}
[2013‑01]
H05H 13/005
.
{
Cyclotrons
}
[2013‑01]
H05H 13/02
.
Synchrocyclotrons, i.e. frequency modulated cyclotrons [2013‑01]
H05H 13/04
.
Synchrotrons [2013‑01]
H05H 13/06
.
Air-cored magnetic resonance accelerators [2013‑01]
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H05H 13/08
.
Alternating-gradient magnetic resonance accelerators [2013‑01]
H05H 13/085
. .
{
Fixed-field alternating gradient accelerators [FFAG]
}
[2013‑01]
H05H 13/10
.
Accelerators comprising one or more linear accelerating sections and bending magnets or the like to return the charged particles in a trajectory parallel to the first accelerating section, e.g. microtrons [2013‑01]
Methods or devices for acceleration of charged particles not otherwise provided for [2013‑01]
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H05H 2240/00
Test [2013‑01]
H05H 2240/10
.
at atmospheric pressure [2013‑01]
H05H 2240/20
.
Non-thermal plasma [2013‑01]
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H05H 2242/00
Auxiliary systems [2013‑01]
Collapse
H05H 2242/10
.
Cooling arrangements [2013‑01]
H05H 2242/1005
. .
Power supply other than for plasma torches [2013‑01]
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H05H 2245/00
test [2013‑01]
H05H 2245/104
.
spiral electrodes [2013‑01]
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H05H 2245/12
.
Applications [2013‑01]
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H05H 2245/121
. .
treatment of exhaust gas, e.g. Ambient air, ozonizers [2013‑01]
H05H 2245/1215
. . .
Exhaust gas [2013‑01]
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H05H 2245/122
. .
medical applications
{
e.g. plasma scalpels, blades, bistouri
}
[2013‑01]
H05H 2245/1225
. . .
Sterilization of objects [2013‑01]
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H05H 2245/123
. .
surface treatments [2013‑01]
H05H 2245/1235
. . .
coating of large volume items [2013‑01]
H05H 2245/124
. .
production of nanostructures [2013‑01]
H05H 2245/125
. .
portable devices [2013‑01]
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H05H 2277/00
Applications [2013‑01]
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H05H 2277/10
.
Medical devices [2013‑01]
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H05H 2277/11
. .
Radiotherapy [2013‑01]
H05H 2277/113
. . .
Diagnostic systems [2013‑01]
H05H 2277/116
. . .
Isotope production [2013‑01]
H05H 2277/12
.
Ion implantation [2013‑01]
H05H 2277/13
.
High energy applications , e.g. fusion [2013‑01]
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H05H 2277/14
.
Portable devices [2013‑01]
H05H 2277/1405
. .
Detection systems [2013‑01]
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Last Modified: 10/10/2013