| Outline |
Indent Level
| |
| Color | Curly Brackets (indicating CPC extensions to IPC) | |
CPC | COOPERATIVE PATENT CLASSIFICATION | ||
![]() | PLASMA TECHNIQUE (fusion reactors G21B; ion-beam tubes H01J 27/00; magnetohydrodynamic generators H02K 44/08; producing X-rays involving plasma generation H05G 2/00); PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS (obtaining neutrons from radioactive sources G21, e.g. G21B, G21C, G21G); PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS (atomic clocks G04F 5/14; devices using stimulated emission H01S; frequency regulation by comparison with a reference frequency determined by energy levels of molecules, atoms, or subatomic particles H03L 7/26) |
![]() | Generating plasma; Handling plasma |
![]() | . | { Investigating plasma, e.g. degree of ionisation (electron temperature)} |
![]() | H05H 1/0012 | . . | { by using radiation} |
H05H 1/0018 | . . . | { Details} |
H05H 1/0025 | . . . |
H05H 1/0031 | . . . | { by interferrometry} |
H05H 1/0037 | . . . |
H05H 1/0043 | . . . | { by using infra-red or ultra-violet radiation} |
H05H 1/005 | . . . |
H05H 1/0056 | . . . |
H05H 1/0062 | . . . | { by using microwaves (see G01N23/34)} |
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H05H 1/0081 | . . |
H05H 1/0087 | . . |
H05H 1/0093 | . . |
![]() | . |
H05H 1/03 | . . | using electrostatic fields |
![]() | H05H 1/04 | . . | using magnetic fields substantially generated by the discharge in the plasma |
![]() | H05H 1/10 | . . | using externally-applied magnetic field only { e.g. Q-machines, Yin-Yang, base-ball} |
H05H 1/105 | . . . | { using magnetic pumping} |
H05H 1/11 | . . . | using cusp configuration (H05H 1/14 takes precedence) |
H05H 1/12 | . . . |
H05H 1/14 | . . . | wherein the containment vessel is straight and has magnetic mirrors { electron mirrors G21K1/08B} |
![]() | . . | using externally-applied electric and magnetic field |
H05H 1/18 | . . . | wherein the field oscillate at very high frequency, e.g. in the microwave range { e.g. using cyclotron resonance} |
H05H 1/20 | . . | Ohmic heating |
H05H 1/22 | . . |
![]() | . | Generating plasma { (gas-filled discharge reactors H01J 37/32; nuclear fusion reactors G21B 1/00; ohmic heating H05H 1/20; injection heating H05H 1/22)} |
H05H 1/2406 | . . | { Dielectric barrier discharges} |
H05H 1/2475 | . . | { Acoustic pressure discharge} |
![]() | . . | Plasma torches { (metal working with constricted arc B23K 10/00, H05H10/02; metal spraying B05B 7/18, B05B 7/20)} |
H05H 1/28 | . . . | Cooling arrangements |
H05H 1/30 | . . . | using applied electromagnetic fields, e.g. high frequency or microwave energy (H05H 1/28 takes precedence) |
![]() | . . . | using an arc (H05H 1/28 takes precedence) |
![]() | . . . . |
H05H 1/3405 | . . . . . | { Arc stabilising or constricting arrangements, e.g. by an additional gas flow (by externally applied magnetic fieldH05H 1/40; by using powders or liquidsH05H 1/42; using coaxial protecting fluidH05H 1/341)} |
H05H 1/341 | . . . . . | { using coaxial protecting fluid (arc stabilising or constricting arrangementsH05H 1/3405; introducing materials into the plasmaH05H 1/42)} |
H05H 1/36 | . . . . . |
H05H 1/38 | . . . . . | Guiding or centering of electrodes |
H05H 1/40 | . . . . . |
H05H 1/42 | . . . . | with provision for introducing materials into the plasma, e.g. powder, liquid (electrostatic spraying, spraying apparatus with means for charging the spray electrically B05B 5/00) { cf. B23K 9/324, B05B 7/22; arc stabilising or constricting arrangements H05H 1/3405; coaxial protecting fluids H05H 1/341} |
H05H 1/44 | . . . . | using more than one torch |
H05H 1/46 | . . | using applied electromagnetic fields, e.g. high frequency or microwave energy (H05H 1/26 takes precedence) |
![]() | . . | using an arc (H05H 1/26 takes precedence) |
H05H 1/52 | . . |
H05H 1/54 | . | Plasma accelerators |
![]() | Production or acceleration of neutral particle beams, e.g. molecular or atomic beams |
H05H 3/02 | . | Molecular or atomic beam generation { (charge exchange devices G21K 1/14; polarising devices G21K 1/16; using resonance or molecular beams for analysing or investigating materials G01N 24/002; atomic clock G04F 5/14; beam masers H01S 1/06)} |
H05H 3/04 | . | Acceleration by electromagnetic wave pressure |
H05H 3/06 | . |
![]() | Direct voltage accelerators; Accelerators using single pulses (H05H 3/06 takes precedence) |
![]() | . | Details (targets for producing nuclear reactions H05H 6/00) |
H05H 5/03 | . . | Accelerating tubes (vessels or containers of electric discharge tubes with improved potential distribution over surface of vessel H01J 5/06; shields of X-ray tubes associated with vessels or containers H01J 35/16) |
![]() | H05H 5/04 | . | { energised by electrostatic generators} |
H05H 5/042 | . . | { of the van de Graaf type} |
H05H 5/045 | . . | { High voltage cascades, e.g. Greinacher cascade} |
H05H 5/047 | . . | { Pulsed generators} |
![]() | H05H 5/06 | . | { Multistage accelerators} |
H05H 5/08 | . | Particle accelerators using step-up transformers, e.g. resonance transformers |
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H05H 7/001 | . |
H05H 7/02 | . | Circuits or systems for supplying or feeding radio-frequency energy (radio-frequency generators H03B) |
H05H 7/04 | . |
H05H 7/06 | . | Two-beam arrangements; Multi-beam arrangements { storage rings} ; Electron rings |
H05H 7/08 | . | Arrangements for injecting particles into orbits |
H05H 7/10 | . | Arrangements for ejecting particles from orbits |
H05H 7/12 | . | Arrangements for varying final energy of beam |
![]() | . | Vacuum chambers (H05H 5/03 takes precedence) |
H05H 7/16 | . . | of the waveguide type |
![]() | . . | Cavities; Resonators { (travelling-wave tubes H01J 23/18; hyperfrequency cavities in general H01P 7/04, H01P 7/06)} |
H05H 7/22 | . |
![]() | Linear accelerators |
![]() | Magnetic induction accelerators, e.g. betatrons |
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H05H 13/005 | . | { Cyclotrons} |
H05H 13/02 | . | Synchrocyclotrons, i.e. frequency modulated cyclotrons |
H05H 13/04 | . | Synchrotrons |
H05H 13/06 | . | Air-cored magnetic resonance accelerators |
![]() | H05H 13/08 | . | Alternating-gradient magnetic resonance accelerators |
H05H 15/00 | Methods or devices for acceleration of charged particles not otherwise provided for |
![]() | H05H 2001/00 | Generating plasma; Handling plasma |
![]() | H05H 2001/24 | . | Generating plasma { (gas-filled discharge reactors H01J 37/32; nuclear fusion reactors G21B 1/00; ohmic heating H05H 1/20; injection heating H05H 1/22)} |
![]() | H05H 2001/2406 | . . | { Dielectric barrier discharges} |
H05H 2001/2412 | . . . | the dielectric being interposed between the electrodes |
H05H 2001/2418 | . . . | the electrodes being embedded in the dielectric |
H05H 2001/2425 | . . . | the electrodes being flush with the dielectric |
H05H 2001/2431 | . . . | Cylindrical electrodes |
H05H 2001/2437 | . . . | Multilayer systems |
![]() | H05H 2001/2443 | . . . | Flow through, i.e. the plasma fluid flowing in a dielectric tube |
![]() | H05H 2001/2475 | . . | { Acoustic pressure discharge} |
H05H 2001/2481 | . . . | Piezoelectric actuators |
H05H 2001/2487 | . . . | Mechanical actuators |
H05H 2001/2493 | . . . | Horns |
![]() | H05H 2001/26 | . . | Plasma torches { (metal working with constricted arc B23K 10/00, H05H10/02; metal spraying B05B 7/18, B05B 7/20)} |
![]() | H05H 2001/32 | . . . | using an arc (H05H 1/28 takes precedence) |
![]() | H05H 2001/34 | . . . . |
![]() | H05H 2001/3415 | . . . . . | indexing scheme associated with 1/34 |
H05H 2001/3421 | . . . . . . | transferred arc mode |
H05H 2001/3426 | . . . . . . | pilot arc |
H05H 2001/3431 | . . . . . . | coaxial cylindrical electrodes |
H05H 2001/3436 | . . . . . . | hollow cathode with internal coolant flow |
H05H 2001/3442 | . . . . . . | cathode with inserted tip |
H05H 2001/3447 | . . . . . . | rod-like cathode |
H05H 2001/3452 | . . . . . . | supplementary electrodes between cathode and anode, e.g. cascade |
H05H 2001/3457 | . . . . . . | nozzle protection devices |
H05H 2001/3463 | . . . . . . | oblique nozzle |
H05H 2001/3468 | . . . . . . | vortex generator |
H05H 2001/3473 | . . . . . . | safety means |
H05H 2001/3478 | . . . . . . | geometrical details |
H05H 2001/3484 | . . . . . . | convergent/divergent nozzle |
H05H 2001/3489 | . . . . . . | contact starting |
H05H 2001/3494 | . . . . . . | discharge parameter control |
![]() | H05H 2001/46 | . . | using applied electromagnetic fields, e.g. high frequency or microwave energy (H05H 1/26 takes precedence) |
![]() | H05H 2001/4607 | . . . | Microwave discharges |
H05H 2001/4615 | . . . . | Surface waves |
H05H 2001/4622 | . . . . | Waveguides |
H05H 2001/463 | . . . . | Antennas or applicators |
H05H 2001/4637 | . . . . | Cables |
![]() | H05H 2001/4645 | . . . | Radiofrequency discharges |
![]() | H05H 2001/4652 | . . . . | Inductively coupled |
H05H 2001/4675 | . . . . | Capacitively coupled |
H05H 2001/4682 | . . . . | Associated power generators, e. G. Circuits, matching networks |
![]() | H05H 2001/469 | . . . | Flow through, i.e the plasma fluid flowing in a non-dielectric vessel |
H05H 2001/4692 | . . . . | dielectric barrier discharge (H05H 1/2406 takes precedence) |
H05H 2001/4695 | . . . . | Arc discharge |
H05H 2001/4697 | . . . . | Glow discharge |
![]() | H05H 2001/48 | . . | using an arc (H05H 1/26 takes precedence) |
![]() | H05H 2006/00 |
![]() | H05H 2007/00 |
![]() | H05H 2007/001 | . |
H05H 2007/002 | . . | for modifying beam trajectory , e.g. gantries |
H05H 2007/004 | . . | for modifying beam energy, e.g. spread out Bragg peak devices |
H05H 2007/005 | . . | for modifying beam emittance , e.g. stochastic cooling devices, stripper foils |
H05H 2007/007 | . . | for focusing the beam to irradiation target |
H05H 2007/008 | . . | for measuring beam parameters |
![]() | H05H 2007/02 | . | Circuits or systems for supplying or feeding radio-frequency energy (radio-frequency generators H03B) |
H05H 2007/022 | . . | Pulsed systems |
H05H 2007/025 | . . | Radiofrequency systems |
H05H 2007/027 | . . | Microwave systems |
![]() | H05H 2007/04 | . |
H05H 2007/041 | . . | for beam bunching , e.g. undulators |
H05H 2007/043 | . . | for beam focusing |
H05H 2007/045 | . . | for beam bending |
H05H 2007/046 | . . | for beam deflection |
H05H 2007/048 | . . | for modifying beam trajectory , e.g. gantry systems |
![]() | H05H 2007/06 | . | Two-beam arrangements; Multi-beam arrangements { storage rings} ; Electron rings |
![]() | H05H 2007/08 | . | Arrangements for injecting particles into orbits |
![]() | H05H 2007/081 | . . | Sources |
H05H 2007/082 | . . . | Ion sources, e.g. ECR, duoplasmatron, PIG, laser sources |
H05H 2007/084 | . . . | Electron sources |
H05H 2007/085 | . . | by electrostatic means |
H05H 2007/087 | . . | by magnetic means |
H05H 2007/088 | . . | by mechanical means, e.g. stripping foils |
![]() | H05H 2007/12 | . | Arrangements for varying final energy of beam |
H05H 2007/122 | . . | by electromagnetic means , e.g. RF cavities |
H05H 2007/125 | . . | by mechanical means , e.g. stripping foils |
H05H 2007/127 | . . | by emittance variation , e.g. stochastic cooling |
![]() | H05H 2007/22 | . |
![]() | H05H 2242/00 | Auxiliary systems |
![]() | H05H 2245/00 | test |
H05H 2245/104 | . | spiral electrodes |
![]() | H05H 2245/12 | . | Applications |
![]() | H05H 2277/00 | Applications |