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 [Search a list of Patent Appplications for class 564]   CLASS 564,ORGANIC COMPOUNDS -- PART OF THE CLASS 532-570 SERIES
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SUBCLASSES

[List of Patents for class 564 subclass 1]    1AMINO NITROGEN CONTAINING (E.G., UREA, SULFONAMIDES, NITROSAMINES, OXYAMINES, ETC., AND SALTS THEREOF)
 This subclass is indented under subclass 1.  Compounds under Class 532, ... which contain nitrogen in a form other than as nitrogen in an inorganic ion of an addition salt, nitro, or nitroso.
(1) Note. This group of compounds includes for example, ureas, thioureas, amides, amidines, azines, hydrazones, carbodiimides, oximes, hydroxylamines, and amines, inter alia, as well as their inorganic acid salts.
(2) Note. This subclass is residual for alicyclic amines not specifically provided for below.
(3) Note. This subclass contains, for example:

Image 1 for class 564 subclass 1

(4) Note. If amino nitrogen is present, the compound may additionally contain nitro, nitroso, or nitrogen in an inorganic ion of an addition salt.
(5) Note. Component parts of an "adduct" will be considered to be attached to each other ionically, except if it is clear that the mode of attachment is nonionic.

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588Hazardous or Toxic Waste Destruction or Containment,   subclasses 405 through 409for the chemical destruction of organic hazardous or toxic waste containing halogen, sulfur, oxygen, nitrogen, phosphorus, or metals.
  
[List of Patents for class 564 subclass 1.5]    1.5Adducts or inclusion compounds of urea per se or of of thiourea per se with organic compounds (e.g., urea-alkane inclusion compounds, etc.)
 This subclass is indented under subclass 1.  Compounds wherein urea, per se, of thiourea, per se, forms an adduct or inclusion compound with an organic compound.
(1) Note. by adduct or inclusion compound is meant a type of complex in which the urea or thiourea is bound with another suitable chemical without changing the chemical character of either the urea-thiourea or of the other chemical; the respective molecules will be unaltered in their chemical nature and the individual compounds may readily be constituted and isolated.
(2) Note. An example of a compound provided for herein is the adduct of urea and an alkane.
  
[List of Patents for class 564 subclass 2]    2With preservative or stabilizer
 This subclass is indented under subclass 1.  Products wherein the amino nitrogen containing compound is mixed with a preserving agent whose sole function is to prevent physical or chemical change.
  
[List of Patents for class 564 subclass 3]    3Ureas or thioureas with preservative or stabilizer
 This subclass is indented under subclass 2.  Products wherein the compound stabilized or preserved contains the grouping below, wherein X is O or S. NN
  
[List of Patents for class 564 subclass 4]    4Carboxamides with preservative or stabilizer
 This subclass is indented under subclass 2.  Products wherein the compound stabilized or preserved is a carboxamide containing the grouping RN
  
[List of Patents for class 564 subclass 5]    5Benzene ring containing compound with preservative or stabilizer
 This subclass is indented under subclass 2.  Products wherein the compound being preserved contains a benzene ring.
  
[List of Patents for class 564 subclass 6]    6Inorganic preservative or stabilizer
 This subclass is indented under subclass 5.  Products wherein the preserving or stabilizing agent is inorganic.
  
[List of Patents for class 564 subclass 7]    7Sulfur or phenol containing preservative or stabilizer
 This subclass is indented under subclass 5.  Products wherein the preserving or stabilizing agent contains sulfur or a phenolic group.
  
[List of Patents for class 564 subclass 8]    8Boron containing (e.g., boron containing complexes, salts, etc.)
 This subclass is indented under subclass 1.  Compounds which contain boron.
(1) Note. This subclass contains boron containing complexes, adducts, and salts.
(2) Note. This subclass contains, for example:

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[List of Patents for class 564 subclass 9]    9Boron attached directly to amino nitrogen by nonionic bonding
 This subclass is indented under subclass 8.  Compounds wherein the boron is directly attached to an amino nitrogen by nonionic bonding.
(1) Note. This subclass contains, for example:

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[List of Patents for class 564 subclass 10]    10The boron and amino nitrogen are members of the same ring
 This subclass is indented under subclass 9.  Compounds wherein the nonionically bonded boron and amino nitrogen are both members of the same ring.
(1) Note. This subclass contains, for example:

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[List of Patents for class 564 subclass 11]    11Polycyclo ring system having the nitrogen and boron containing ring as one of the cyclos
 This subclass is indented under subclass 10.  Compounds wherein the boron and nitrogen containing ring is part of a polycyclo ring system.
(1) Note. This subclass contains, for example:

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[List of Patents for class 564 subclass 12]    12Phosphorus attached directly to amino nitrogen by nonionic bonding
 This subclass is indented under subclass 1.  Compounds which contain phosphorus directly attached to an amino nitrogen by nonionic bonding.
(1) Note. This subclass contains, for example:

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[List of Patents for class 564 subclass 13]    13The phosphorus and nitrogen are members of the same ring
 This subclass is indented under subclass 12.  Compounds wherein the phosphorus and amino nitrogen are both members of the same ring.
(1) Note. This subclass contains, for example:

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[List of Patents for class 564 subclass 14]    14Chalcogen and plural nitrogens bonded directly to the same phosphorus
 This subclass is indented under subclass 12.  Compounds wherein at least two amino nitrogens and oxygen or sulfur are bonded to the same phosphorus.
(1) Note. This subclass contains, for example:

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[List of Patents for class 564 subclass 15]    15Phosphorus attached indirectly to amino nitrogen by nonionic bonding
 This subclass is indented under subclass 1.  Compounds which contain phosphorus indirectly attached to amino nitrogen by nonionic bonding.
(1) Note. This subclass contains, for example:

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[List of Patents for class 564 subclass 16]    16The phosphorus is a ring member
 This subclass is indented under subclass 15.  Compounds wherein the phosphorus is a member of a ring.
(1) Note. This subclass contains, for example:

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[List of Patents for class 564 subclass 17]    17Thioureas (i.e., HNH-C(=S)-HNH, wherein substitution may be made for hydrogen only)
 This subclass is indented under subclass 1.  Compounds which contain the grouping NN
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 17

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558Organic Compounds,   subclasses 4 and 5 for isothioureas or pseudothioureas.
  
[List of Patents for class 564 subclass 18]    18Thiocarbazides or thiosemicarbazides (i.e. HNH-NH-C(=S)-HNH, wherein the N bonded directly to the thiourea N is an amino N and substitution may be made for hydrogen only)
 This subclass is indented under subclass 17.  Compounds which contain the thiocarbazide radical wherein an amino nitrogen is bonded directly to each of the thiorea nitrogens, or the thiosemicarbazide radical wherein an amino nitrogen is bonded to one thiourea nitrogen -N- .
(1) Note. This subclass contains, for example:

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[List of Patents for class 564 subclass 19]    19Thiocarbazones or thiosemicarbazones (i.e., HCH=N-NH-C(=S)-HNH, wherein substitution may be made for hydrogen only)
 This subclass is indented under subclass 18.  Compounds which contain the thiocarbazone radical (Figure 1) or the thiosemicarbazone radical (Fig.2).

FIGURE 1

FIGURE 1

FIGURE 2

FIGURE 2

(1) Note. This subclass contains, for example:

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[List of Patents for class 564 subclass 20]    20Benzene ring containing
 This subclass is indented under subclass 19.  Compounds which contain a benzene ring.
(1) Note. This subclass contains, for example:

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[List of Patents for class 564 subclass 21]    21Additional nitrogen attached indirectly to the thiocarbonyl by nonionic bonding
 This subclass is indented under subclass 20.  Compounds which contain nitrogen in addition to that of the thiocarbazone or thiosemicarbazone.
(1) Note. This subclass contains, for example:

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[List of Patents for class 564 subclass 22]    22Thiobiurets (i.e., HNH-C(=S)-NH-C(=X)-HNH, wherein X is S or O and substitution may be made for hydrogen only)
 This subclass is indented under subclass 17.  Compounds which contain the grouping in the figure below, wherein X may be oxygen or sulfur, i.e., mono- or dithiobiurets. --
(1) Note. This subclass contains, for example:

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[List of Patents for class 564 subclass 23]    23Carbonyl, sulfur, or cyano attached directly to thiourea nitrogen by nonionic bonding
 This subclass is indented under subclass 17.  Compounds wherein a thiourea nitrogen has carbonyl, sulfur, or cyano group directly attached by nonionic bonding.
(1) Note. This subclass contains, for example:

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[List of Patents for class 564 subclass 24]    24Processes utilizing carbon disulfide
 This subclass is indented under subclass 17.  Processes wherein carbon disulfide is utilized in preparing a thiourea.
(1) Note. This subclass contains, for example, the reaction of aniline and carbon disulfide to produce thiocarbanilide.
  
[List of Patents for class 564 subclass 25]    25Processes utilizing cyano containing compound
 This subclass is indented under subclass 17.  Processes wherein a cyano compound is utilized in preparing a thiourea.
(1) Note. This subclass contains, for example, the production of thiourea by reaction of cyanamide with hydrogen sulfide.
  
[List of Patents for class 564 subclass 26]    26Benzene ring containing
 This subclass is indented under subclass 17.  Compounds which contain a benzene ring.
(1) Note. This subclass contains, for example:

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[List of Patents for class 564 subclass 27]    27Nitrogen attached indirectly to the thiocarbonyl by nonionic bonding
 This subclass is indented under subclass 26.  Compounds which contain nitrogen in addition to the thiourea nitrogen.
(1) Note. This subclass contains, for example:

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[List of Patents for class 564 subclass 28]    28Hydroxy, bonded directly to carbon, or ether containing (H of -OH may be replaced by a substituted or unsubstituted ammonium ion or a Group IA or IIA light metal)
 This subclass is indented under subclass 26.  Compounds which contain a hydroxyl group bonded directly to a carbon, or an ether, wherein H of the -OH may be replaced by a substituted or unsubstituted ammonium ion or a group IA or IIA light metal.
(1) Note. This subclass contains, for example:

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[List of Patents for class 564 subclass 29]    29Halogen attached indirectly to the thiocarbonyl by nonionic bonding
 This subclass is indented under subclass 26.  Compounds which contain halogen nonionically bonded.
(1) Note. This subclass contains, for example:

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[List of Patents for class 564 subclass 30]    30Acyclic
 This subclass is indented under subclass 17.  Compounds which do not contain any ring.
(1) Note. This subclass contains, for example:

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[List of Patents for class 564 subclass 31]    31Thiourea per se or salt thereof
 This subclass is indented under subclass 30.  The compound which is thiourea, or its salts and processes of preparation not provided for above.
  
[List of Patents for class 564 subclass 32]    32Ureas (i.e., HNH-CO-HNH, wherein substitution may be made for hydrogen only)
 This subclass is indented under subclass 1.  Compounds which have the grouping - -
(1) Note. This subclass contains, for example, adducts of urea with inorganic compounds such as hydrogen peroxide or calcium nitrate.

SEE OR SEARCH THIS CLASS, SUBCLASS:

260,Chemistry of Carbon Compounds, subclass 96.5 for adducts of urea with organic compounds.
558,Organic Compounds, subclass 8 for isoureas or pseudoureas.
564,Organic Compounds, subclass 1.5 for adducts of urea with organic compounds.
  
[List of Patents for class 564 subclass 33]    33Nitro or nitroso bonded directly to nitrogen
 This subclass is indented under subclass 32.  Compounds which contain a nitro or nitroso group bonded directly to an amino nitrogen (i.e., nitramine or nitrosamine containing).
(1) Note. This subclass contains, for example:

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[List of Patents for class 564 subclass 34]    34Carbazides or semicarbazides (i.e., HNH-NH-CO-HNH, wherein substitution may be made for hydrogen only)
 This subclass is indented under subclass 32.  Compounds which are carbazides or semicarbazides containing the grouping.

Image 1 for class 564 subclass 34

(1) Note. This subclass contains, for example:

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[List of Patents for class 564 subclass 35]    35Carbonyl or sulfur attached directly to carbazide or semicarbazide nitrogen by nonionic bonding
 This subclass is indented under subclass 34.  Compounds wherein a carbonyl group or sulfur is attached directly to a carbazide or semicarbazide nitrogen by nonionic bonding.
(1) Note. This subclass contains, for example:

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[List of Patents for class 564 subclass 36]    36Carbazones or semicarbazones (i.e., HCH=N-NH-CO-HNH, wherein substitution may be made for hydrogen only)
 This subclass is indented under subclass 34.  Compounds which contain the carbazone radical (Fig. 1) or the semicarbazone radical (Fig. 2).

FIGURE 1

FIGURE 1

FIGURE 2

FIGURE 2

(1) Note. This subclass contains, for example:

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[List of Patents for class 564 subclass 37]    37Acyclic
 This subclass is indented under subclass 34.  Compounds which do not contain any ring.
(1) Note. This subclass contains, for example:

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[List of Patents for class 564 subclass 38]    38Biurets (i.e., HNH-CO-NH-CO-HNH, wherein substitution may be made for hydrogen only)
 This subclass is indented under subclass 32.  Compounds which are biurets and contain the grouping --
(1) Note. This subclass contains, for example:

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[List of Patents for class 564 subclass 39]    39Sulfur attached directly to urea nitrogen by nonionic bonding
 This subclass is indented under subclass 32.  Compounds which contain sulfur attached directly to urea nitrogen by nonionic bonding.
(1) Note. This subclass contains, for example:

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[List of Patents for class 564 subclass 40]    40The sulfur is part of a substituent which contains nitrogen
 This subclass is indented under subclass 39.  Compounds wherein the sulfur is part of a group which contains additional nitrogen.
(1) Note. This subclass contains, for example:

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[List of Patents for class 564 subclass 41]    41The substituent nitrogen is the nitrogen of a benzamido group (e.g., Cl benzene-CO-NH-HCH-(O=)S(=O)-, bonded directly to urea nitrogen, etc.)
 This subclass is indented under subclass 40.  Compounds wherein the additional nitrogen is the nitrogen of a benzamido group.
(1) Note. This subclass contains, for example:

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[List of Patents for class 564 subclass 42]    42The sulfur is part of a monocyclic benzene ring containing substituent
 This subclass is indented under subclass 39.  Compounds wherein the sulfur is part of a substituent which is monocyclic and aromatic.
(1) Note. This subclass contains, for example:

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[List of Patents for class 564 subclass 43]    43Alicyclic ring bonded directly to urea nitrogen
 This subclass is indented under subclass 42.  Compounds wherein an alicyclic ring is bonded directly to a urea nitrogen.
(1) Note. This subclass contains, for example:

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[List of Patents for class 564 subclass 44]    44Additional carbonyl bonded directly to urea nitrogen
 This subclass is indented under subclass 32.  Compounds in which a urea nitrogen has been amidated by a carboxylic acid.
(1) Note. This subclass contains, for example:

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[List of Patents for class 564 subclass 45]    45The additional carbonyl is in a substituent which is acyclic
 This subclass is indented under subclass 44.  Compounds wherein the carboxylic acid contains no ring.
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 45

SEE OR SEARCH CLASS:

554Organic Compounds,   subclass 56 for compounds where the carboxylic acid is a higher fatty acid.
  
[List of Patents for class 564 subclass 46]    46Carbon to carbon unsaturation in the substituent
 This subclass is indented under subclass 45.  Compounds wherein the carboxylic acid contains a double or triple bond.
(1) Note. This subclass contains, for example:

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[List of Patents for class 564 subclass 47]    47Benzene ring containing
 This subclass is indented under subclass 32.  Compounds which contain a benzene ring (i.e., aromatic).
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 47

  
[List of Patents for class 564 subclass 48]    48Benzene ring bonded directly to urea nitrogen (i.e., anilides)
 This subclass is indented under subclass 47.  Compounds which are anilides, wherein a benzene ring is directly bonded to a urea nitrogen.
(1) Note. This subclass contains, for example:

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[List of Patents for class 564 subclass 49]    49The benzene ring is part of a substituent which contains sulfur
 This subclass is indented under subclass 48.  Compounds wherein the benzene ring is part of a substituent which contains sulfur
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 49

  
[List of Patents for class 564 subclass 50]    50The benzene ring is part of a substituent which contains nitrogen
 This subclass is indented under subclass 48.  Compounds wherein the benzene ring is part of a substituent which contains additional nitrogen.
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 50

  
[List of Patents for class 564 subclass 51]    51The substituent nitrogen is attached indirectly to the benzene ring by acyclic nonionic bonding
 This subclass is indented under subclass 50.  Compounds wherein the additional nitrogen is indirectly bonded to the benzene ring by acyclic nonionic bonding.
(1) Note. This subclass contains, for example:

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[List of Patents for class 564 subclass 52]    52The benzene ring is part of a substituent which contains oxygen
 This subclass is indented under subclass 48.  Compounds wherein the benzene ring is part of a substituent which contains oxygen.
(1) Note. This subclass contains, for example:

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[List of Patents for class 564 subclass 53]    53The benzene ring is part of a substituent which contains halogen bonded directly to carbon
 This subclass is indented under subclass 48.  Compounds wherein the benzene ring is part of a substituent which contains halogen bonded directly to carbon.
(1) Note. This subclass contains, for example:

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[List of Patents for class 564 subclass 54]    54The halogen is fluorine
 This subclass is indented under subclass 53.  Compounds wherein the halogen is fluorine.
(1) Note. This subclass contains, for example:

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[List of Patents for class 564 subclass 55]    55Plural benzene rings bonded directly to urea nitrogen
 This subclass is indented under subclass 48.  Compounds wherein more than one benzene ring is bonded directly to the same urea nitrogen or to different urea nitrogen.
(1) Note. This subclass contains, for example:

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[List of Patents for class 564 subclass 56]    56Aralkyl bonded directly to urea nitrogen
 This subclass is indented under subclass 47.  Compounds wherein an aralkyl group is bonded directly to a urea nitrogen.
(1) Note. This subclass contains, for example:

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[List of Patents for class 564 subclass 57]    57Alicyclic ring containing
 This subclass is indented under subclass 32.  Compounds which contain an alicyclic group.
(1) Note. This subclass contains, for example:

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[List of Patents for class 564 subclass 58]    58Additional carbon bonded directly to urea nitrogen
 This subclass is indented under subclass 32.  Compounds which contain an alkyl or substituted alkyl group bonded directly to a urea nitrogen.
(1) Note. This subclass contains, for example:

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[List of Patents for class 564 subclass 59]    59The additional carbon is part of a substituent which contains nitrogen
 This subclass is indented under subclass 58.  Compounds wherein the alkyl group contains an additional nitrogen.
(1) Note. This subclass contains, for example:

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[List of Patents for class 564 subclass 60]    60The additional carbon is part of a substituent which contains oxygen
 This subclass is indented under subclass 58.  Compounds wherein the alkyl group contains oxygen as a substituent.
(1) Note. This subclass contains, for example:

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[List of Patents for class 564 subclass 61]    61Processes
 This subclass is indented under subclass 58.  Processes for the preparation, purification, separation, or recovery of compounds classified therein.
  
[List of Patents for class 564 subclass 62]    62Preparing directly from compound having carbon to carbon unsaturation
 This subclass is indented under subclass 61.  Processes wherein one of the starting materials contain a double or triple bond between two carbons.
  
[List of Patents for class 564 subclass 63]    63Urea per se or salt thereof
 This subclass is indented under subclass 32.  The compound which is urea or salts thereof.

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32,for complexes of urea with inorganic compounds.
  
[List of Patents for class 564 subclass 64]    64Preparing directly from cyano containing compound
 This subclass is indented under subclass 63.  Processes which utilize a cyano containing compound, for example, calcium cyanamide in the preparation of urea.
  
[List of Patents for class 564 subclass 65]    65Preparing directly from ammonia and carbonmonoxide or carbon oxysulfide (e.g., from ammonia and COS, etc.)
 This subclass is indented under subclass 63.  Processes in which urea is prepared by reacting ammonia with carbon monoxide or carbon oxysulfide.
  
[List of Patents for class 564 subclass 66]    66Preparing directly from ammonium carbamate (i.e., from HNH-COO-HHNHH)
 This subclass is indented under subclass 63.  Processes in which urea is prepared directly from ammonium carbamate.

SEE OR SEARCH THIS CLASS, SUBCLASS:

70,for the preparation of urea from ammonia and carbon dioxide which includes the decomposition of by-product ammonium carbamate.
  
[List of Patents for class 564 subclass 67]    67Preparing directly from ammonia and carbon dioxide
 This subclass is indented under subclass 63.  Processes wherein urea is prepared by the reaction of ammonia with carbon dioxide.
  
[List of Patents for class 564 subclass 68]    68With corrosion inhibiting of reactor
 This subclass is indented under subclass 67.  Processes which include the prevention of corrosion of the reactor.
  
[List of Patents for class 564 subclass 69]    69With ammonia synthesis
 This subclass is indented under subclass 67.  Processes which include the step of synthesizing ammonia.
  
[List of Patents for class 564 subclass 70]    70With decomposition of by-product ammonium carbamate (i.e., decomposition of HNH-COO-HHNHH)
 This subclass is indented under subclass 67.  Processes wherein by-product ammonium carbamate is decomposed.

SEE OR SEARCH THIS CLASS, SUBCLASS:

66,for the preparation of urea directly from ammonium carbamate.
  
[List of Patents for class 564 subclass 71]    71Utilizing indirect heat exchange
 This subclass is indented under subclass 70.  Processes which utilize indirect heat exchange.
  
[List of Patents for class 564 subclass 72]    72In plural stages
 This subclass is indented under subclass 70.  Processes wherein the decomposition of ammonium carbamate is performed in plural stages.
  
[List of Patents for class 564 subclass 73]    73Purification or recovery
 This subclass is indented under subclass 63.  Processes directed to the purification, separation, or recovery of urea.
  
[List of Patents for class 564 subclass 74]    74Thiocarboxamides (i.e., compounds containing -C(=S)-HNH, wherein substitution may be made for hydrogen only)
 This subclass is indented under subclass 1.  Compounds which are thiocarboxamides containing the grouping N.
(1) Note. This subclass contains, for example:

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[List of Patents for class 564 subclass 75]    75Sulfur bonded directly to the thiocarbonyl
 This subclass is indented under subclass 74.  Compounds which contain the grouping -S- not provided for above.
(1) Note. This subclass contains, for example:

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[List of Patents for class 564 subclass 76]    76Thiuram sulfides (e.g., HNH-C(=S)-S-S-C(=S)-HN-alkyl, etc.)
 This subclass is indented under subclass 75.  Compounds which are thiuram sulfides containing the grouping below wherein X is a positive integer.

Image 1 for class 564 subclass 76

(1) Note. This subclass contains, for example:

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[List of Patents for class 564 subclass 77]    77Thiooxamides (i.e., HNH-C(=S)-C(=X)-HNH, wherein X is S or O and substitution may be made for hydrogen only)
 This subclass is indented under subclass 74.  Compounds which are thioxamides containing the grouping -- wherein X may be oxygen or sulfur.
(1) Note. This subclass contains, for example:

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[List of Patents for class 564 subclass 78]    78Acyclic
 This subclass is indented under subclass 74.  Compounds which do not contain a ring.
(1) Note. This subclass contains, for example:

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[List of Patents for class 564 subclass 79]    79Sulfamides (i.e., HNH-(O=)S(=O)-HNH, wherein substitution may be made for hydrogen only)
 This subclass is indented under subclass 1.  Compounds which are diamides of sulfuric acid (i.e., sulfamides) and contain the grouping

Image 1 for class 564 subclass 79

(1) Note. This subclass contains, for example:

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[List of Patents for class 564 subclass 80]    80Sulfonamides (i.e., Q-(O=)S(=O)-HNH, wherein Q is a substituent and wherein any substituent replacing one or both hydrogens shown will be referred to as E)
 This subclass is indented under subclass 1.  Compounds which are sulfonamides and contain the grouping below wherein R-SO2- is the residue of a sulfonic acid and N is the residue of an amino nitrogen containing compound.

Image 1 for class 564 subclass 80

(1) Note. This subclass contains, for example:

Image 2 for class 564 subclass 80

  
[List of Patents for class 564 subclass 81]    81Hydrazine containing
 This subclass is indented under subclass 80.  Compounds which contain a hydrazine group.
(1) Note. This subclass contains, for example:

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[List of Patents for class 564 subclass 82]    82Plural sulfonamide groups containing or containing plural sulfonyls bonded directly to the same nitrogen
 This subclass is indented under subclass 80.  Compounds which contain more than one sulfonamide group or contain plural sulfonyls bonded directly to the same nitrogen.
(1) Note. This subclass contains, for example:

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[List of Patents for class 564 subclass 83]    83Two sulfonamido sulfonyls having no sulfonamido nitrogen between the sulfonyls
 This subclass is indented under subclass 82.  Compounds wherein the sulfonyls of two sulfonamide groups contain no sulfonamide nitrogen between them.
(1) Note. This subclass contains, for example:

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[List of Patents for class 564 subclass 84]    84Substituent Q contains benzene ring
 This subclass is indented under subclass 80.  Compounds wherein the sulfonic acid residue is aromatic (i.e., benzene ring containing).
(1) Note. This subclass contains, for example:

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[List of Patents for class 564 subclass 85]    85Sulfur in substituent Q
 This subclass is indented under subclass 84.  Compounds wherein the aromatic sulfonic acid residue contains sulfur.
(1) Note. This subclass contains, for example:

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[List of Patents for class 564 subclass 86]    86Nitrogen in substituent Q
 This subclass is indented under subclass 84.  Compounds wherein the residue of the aromatic sulfonic acid contains nitrogen.
(1) Note. This subclass contains, for example:

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[List of Patents for class 564 subclass 87]    87Nitro or nitroso in substituent Q
 This subclass is indented under subclass 86.  Compounds wherein the residue of the aromatic sulfonic acid contains a nitro or nitroso group bonded directly to a carbon atom.
(1) Note. This subclass contains, for example:

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[List of Patents for class 564 subclass 88]    88Carbonyl in substituent Q
 This subclass is indented under subclass 84.  Compounds wherein the residue of the aromatic sulfonic acid contains a carbonyl group.
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 88

  
[List of Patents for class 564 subclass 89]    89Hydroxy, bonded directly to carbon, or ether in substituent Q (H of -OH may be replaced by a substituted or unsubstituted ammonium ion or a Group IA or IIA light metal)
 This subclass is indented under subclass 84.  Compounds wherein the residue of the aromatic sulfonic acid contains a hydroxyl group bonded directly to carbon or an ether wherein the H of the OH may be replaced by a substituted or unsubstituted ammonium ion or a Group IA or IIA light metal.
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 89

  
[List of Patents for class 564 subclass 90]    90Substituent Q is monocyclic
 This subclass is indented under subclass 84.  Compounds wherein the residue of the aromatic sulfonic acid is monocyclic.
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 90

  
[List of Patents for class 564 subclass 91]    91Carbonyl, cyano, nitro, nitroso, halogen, or sulfur attached directly to the sulfonamide nitrogen or to an amino nitrogen in a substituent E by nonionic bonding
 This subclass is indented under subclass 90.  Compounds wherein the amino nitrogen compound residue contains a carbonyl, cyano, nitro, nitroso, halogen, or sulfur attached directly to the sulfonamido nitrogen or to an amino nitrogen by nonionic bonding.
(1) Note. For purposes of this classification compounds having the structure RSO2-N-halogen are considered to be acid halides of analogs of hydroxamic acids and are classified in Class 562, subclass 837.
(2) Note. This subclass contains, for example:

Image 1 for class 564 subclass 91

  
[List of Patents for class 564 subclass 92]    92Benzene ring in a substituent E
 This subclass is indented under subclass 90.  Compounds wherein the amino nitrogen compound residue contains a benzene ring.
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 92

  
[List of Patents for class 564 subclass 93]    93Hydroxy, bonded directly to carbon, or ether in a substituent E (H of -OH may be replaced by a substituted or unsubstituted ammonium ion or a Group IA or IIA light metal)
 This subclass is indented under subclass 90.  Compounds wherein the amino nitrogen compound residue contains a hydroxyl bonded directly to carbon, or an ether, wherein the H of the -OH may be replaced by a substituted or unsubstituted ammonium ion or by a Group IA or IIA light metal.
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 93

  
[List of Patents for class 564 subclass 94]    94Nitrogen in an acyclic substituent E
 This subclass is indented under subclass 90.  Compounds wherein the amino nitrogen compound residue contains an additional nitrogen.
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 94

  
[List of Patents for class 564 subclass 95]    95Substituent Q is acyclic
 This subclass is indented under subclass 80.  Compounds wherein the sulfonic acid residue contains no ring.
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 95

  
[List of Patents for class 564 subclass 96]    96Halogen in substituent Q attached indirectly to the sulfonamide sulfur by nonionic bonding
 This subclass is indented under subclass 95.  Compounds wherein the sulfonic acid residue contains halogen nonionically bonded.
(1) Note. This subclass contains, for example:
F3C-(CF2)7-SO2NH-C2H4-N-(C2H5)2
H17C8-SO2NH-(CH2)3-(OCH2CH2)3-O-CH3
  
[List of Patents for class 564 subclass 97]    97Benzene ring in a substituent E
 This subclass is indented under subclass 96.  Compounds wherein the amino nitrogen compound residue contains a benzene ring.
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 97

  
[List of Patents for class 564 subclass 98]    98Substituent Q is alkyl
 This subclass is indented under subclass 95.  Compounds wherein the sulfonic acid residue consists of unsubstituted alkyl.
(1) Note. This subclass contains, for example:
H3C - CH2 - CH2 - CH2 - SO2 - NH - CH3
  
[List of Patents for class 564 subclass 99]    99Benzene ring in a substituent E
 This subclass is indented under subclass 98.  Compounds wherein the amine nitrogen compound residue contains a benzene ring.
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 99

  
[List of Patents for class 564 subclass 100]    100Sulfur and amino nitrogen attached directly to the same sulfur by nonionic bonding
 This subclass is indented under subclass 1.  Compounds which are thiosulfenamides containing the grouping -- S - S -
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 100

  
[List of Patents for class 564 subclass 101]    101Plural amino nitrogens attached directly to the same sulfur, or oxygen double bonded and amino nitrogen attached directly to the same sulfur, all by nonionic bonding (e.g., sulfinamides, etc.)
 This subclass is indented under subclass 1.  Compounds which contain two amino nitrogens nonionically bonded directly to the same sulfur or which contain sulfur doubly bonded to oxygen and directly attached to an amino nitrogen by nonionic bonding, as for example, sulfinamides.
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 101

  
[List of Patents for class 564 subclass 102]    102Sulfur attached directly to amino nitrogen by nonionic bonding (e.g., sulfenamides, etc.)
 This subclass is indented under subclass 1.  Compounds which contain sulfur bonded directly to an amino nitrogen by nonionic bonding, as for example, sulfenamides.
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 102

  
[List of Patents for class 564 subclass 103]    103Cyanamides (i.e., compounds containing cyano bonded directly to amino nitrogen)
 This subclass is indented under subclass 1.  Compounds which are cyanamides wherein a cyano group is bonded directly to an amino nitrogen.
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 103

  
[List of Patents for class 564 subclass 104]    104Cyanoguanidines (i.e., HNH-C(=NH)-HNH, wherein -CN is substituted for one of the hydrogens and substitution may be made for the remaining hydrogens only)
 This subclass is indented under subclass 103.  Compounds wherein the cyano group is bonded directly to a nitrogen of a guanidine group.
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 104

  
[List of Patents for class 564 subclass 105]    105Benzene ring containing
 This subclass is indented under subclass 103.  Compounds which contain a benzene ring.
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 105

  
[List of Patents for class 564 subclass 106]    106Acyclic
 This subclass is indented under subclass 103.  Compounds which contains no ring.
(1) Note. This subclass contains, for example:

NC - NH - ( CH subscript 2 CH subscript 2 - O ) subscript 3 - CH subscript 2 CH subscript 2 - OH

NC - NH - ( CH2CH2 -O )3 - CH2CH2 - OH

  
[List of Patents for class 564 subclass 107]    107Nitramines (i.e., compounds containing nitro bonded directly to amino nitrogen)
 This subclass is indented under subclass 1.  Compounds which are nitramines wherein a nitro group is attached directly to an amino nitrogen.
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 107

  
[List of Patents for class 564 subclass 108]    108Containing nitrogen double bonded directly to carbon (e.g., nitroguanidines, etc.)
 This subclass is indented under subclass 107.  Compounds which contain an amino nitrogen doubly bonded to carbon.
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 108

  
[List of Patents for class 564 subclass 109]    109Acyclic
 This subclass is indented under subclass 107.  Compounds which do not contain a ring.
(1) Note. This subclass contains, for example:
  
[List of Patents for class 564 subclass 110]    110Containing nitro bonded directly to carbon (i.e., plural nitro groups containing)
 This subclass is indented under subclass 109.  Compounds which contain a nitro group bonded directly to carbon.
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 110

  
[List of Patents for class 564 subclass 111]    111Hydroxy, bonded directly to carbon, or ether containing (H of -OH may be replaced by a substituted or unsubstituted ammonium ion or a Group IA or IIA light metal)
 This subclass is indented under subclass 110.  Compounds which contain hydroxy bonded directly to carbon, or an ether, wherein the H of the -OH may be replaced by a substituted or unsubstituted ammonium ion or by a Group IA or IIA light metal.
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 111

  
[List of Patents for class 564 subclass 112]    112Nitrosamines (i.e., compounds containing nitroso bonded directly to amino nitrogen)
 This subclass is indented under subclass 1.  Compounds which are nitrosamines, wherein a nitroso group is attached directly to an amino nitrogen.
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 112

  
[List of Patents for class 564 subclass 113]    113Acyclic
 This subclass is indented under subclass 112.  Compounds which do not contain a ring.
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 113

  
[List of Patents for class 564 subclass 114]    114Haloamines (i.e., compounds containing halogen attached directly to amino nitrogen by nonionic bonding)
 This subclass is indented under subclass 1.  Compounds which are haloamines, wherein halogen is attached directly to an amino nitrogen by nonionic bonding.
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 114

SEE OR SEARCH CLASS:

562Organic Compounds,   subclasses 800+ for compounds wherein halogen is nonionically bonded to the nitrogen of a carboxamide.
  
[List of Patents for class 564 subclass 115]    115Containing nitrogen double bonded directly to carbon
 This subclass is indented under subclass 114.  Compounds which contain nitrogen doubly bonded to carbon.
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 115

  
[List of Patents for class 564 subclass 116]    116Amidine containing (i.e., containing -C(=N)-HNH, wherein substitution may be made for hydrogen only)
 This subclass is indented under subclass 115.  Compounds which contain the amidine group

Image 1 for class 564 subclass 116

(1) Note. This subclass contains, for example:

Image 2 for class 564 subclass 116

  
[List of Patents for class 564 subclass 117]    117Alicyclic ring containing
 This subclass is indented under subclass 114.  Compounds which contain an alicyclic group.
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 117

  
[List of Patents for class 564 subclass 118]    118Acyclic
 This subclass is indented under subclass 114.  Compounds which do not contain a ring.
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 118

  
[List of Patents for class 564 subclass 119]    119Hydroxy, bonded directly to carbon, or ether containing (H of -OH may be replaced by a substituted or unsubstituted ammonium ion or a Group IA or IIA light metal)
 This subclass is indented under subclass 118.  Compounds which contain a hydroxyl bonded directly to carbon, or an ether, wherein the H of the -OH may be replaced by a substituted or unsubstituted ammonium ion or by a Group IA or IIA light metal.
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 119

  
[List of Patents for class 564 subclass 120]    120Carbon to carbon unsaturation containing
 This subclass is indented under subclass 118.  Compounds which contain a carbon to carbon double or triple bond.
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 120

  
[List of Patents for class 564 subclass 121]    121Plural difluoramine groups containing
 This subclass is indented under subclass 118.  Compounds which contain plural difluoramino groups.
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 121

  
[List of Patents for class 564 subclass 122]    122Plural difluoramine groups bonded directly to the same carbon
 This subclass is indented under subclass 121.  Compounds wherein the plural difluoramino groups are bonded directly to the same carbon.
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 122

  
[List of Patents for class 564 subclass 123]    123Carboxamides (i.e., Q-CO-HNH, wherein Q is a substituent having carbon bonded directly to the carbonyl or is hydrogen and wherein any substituent replacing one or both hydrogens shown will be referred to as E)
 This subclass is indented under subclass 1.  Compounds which are carboxamides and contain one of the groupings

Image 1 for class 564 subclass 123

(1) Note. This subclass contains, for example:

Image 2 for class 564 subclass 123

SEE OR SEARCH CLASS:

260Chemistry of Carbon Compounds,   subclasses 401 , 402.5, 404 and 404.5 for amides of higher fatty acids.
530Chemistry: Natural Resins or Derivatives; Peptides or Reaction Products Thereof,   subclasses 200+ for amides of natural resin acids wherein the acids are the mixture of acids naturally occurring in natural resins or for a natural resin acid amide wherein the amide does not have a known chemical structure.
554Organic Compounds,   subclasses 35+ for amides of higher fatty acids.
  
[List of Patents for class 564 subclass 124]    124Preparing directly from cyano containing compound
 This subclass is indented under subclass 123.  Processes wherein a carboxamide is prepared directly from a cyano containing compound.
(1) Note. Processes which involve catalytic hydration or hydrolysis of nitriles combined with other chemical reactions, such as for example, reduction of a nitro group to an amine are placed in this subclass. Where the only reaction is catalytic hydration, see subclasses 126+; and where the only reaction is acid hydrolysis, see subclass 129, even if purification or recovery steps are included.
  
[List of Patents for class 564 subclass 125]    125From HCN or cyanogen
 This subclass is indented under subclass 124.  Processes which utilize HCN or cyanogen in the preparation of a carboxamide.
(1) Note. This subclass includes, for example:

Image 1 for class 564 subclass 125

  
[List of Patents for class 564 subclass 126]    126Catalytic hydration only of nitrile
 This subclass is indented under subclass 124.  Processes wherein the sole chemical reaction for amide formation is the hydrolysis of a nitrile in water in the presence of a catalyst.
(1) Note. For processes including simultaneous hydrolysis and other reactions, such as for example, amination, alkylation, or reduction, see subclass 124.
(2) Note. This subclass includes the combination of hydrolysis followed by purification or recovery.
  
[List of Patents for class 564 subclass 127]    127Copper containing catalyst utilized
 This subclass is indented under subclass 126.  Processes which utilize a copper containing catalyst.
  
[List of Patents for class 564 subclass 128]    128Of acrylonitriles
 This subclass is indented under subclass 126.  Processes wherein acrylonitriles are catalytically hydrated.
  
[List of Patents for class 564 subclass 129]    129Acid hydrolysis only of nitrile
 This subclass is indented under subclass 124.  Processes wherein the sole chemicl reaction for amide formation is the acid hydrolysis of a nitrile.
(1) Note. This subclass includes the combination of hydrolysis followed by purification or recovery.

SEE OR SEARCH THIS CLASS, SUBCLASS:

124,for processes including simultaneous acid hydrolysis combined with other reactions.
  
[List of Patents for class 564 subclass 130]    130From acyclic nitrile
 This subclass is indented under subclass 124.  Processes wherein a carboxamide is prepared from a nitrile which contains no ring.
  
[List of Patents for class 564 subclass 131]    131Which contains carbon to carbon unsaturation
 This subclass is indented under subclass 130.  Processes wherein the nitrile contains a double or triple bond between two carbons.
  
[List of Patents for class 564 subclass 132]    132Preparing directly from carbon monoxide or carbon dioxide
 This subclass is indented under subclass 123.  Processes wherein a carboxamide is prepared by a reaction utilizing carbon monoxide or carbon dioxide.
(1) Note. This subclass contains for example, the reaction of an aliphatic alcohol with ammonia and carbon monoxide to prepare a formamide, or the reaction of an amine with carbon dioxide and hydrogen to prepare a formamide.
  
[List of Patents for class 564 subclass 133]    133Preparing directly by amidation of -C(=O)X group, where X is O- or halogen
 This subclass is indented under subclass 123.  Processes wherein a carboxamide is formed by reaction of a carboxylic acid, salt, ester, acid halide, or anhydride with ammonia or an amino nitrogen containing compound.
  
[List of Patents for class 564 subclass 134]    134Of carboxylic acid ester
 This subclass is indented under subclass 133.  Processes wherein a carboxylic acid ester is utilized.
  
[List of Patents for class 564 subclass 135]    135Having acyclic acid moiety
 This subclass is indented under subclass 134.  Processes wherein the carboxylic acid of the ester does not contain a ring.
  
[List of Patents for class 564 subclass 136]    136Additional oxygen in the acid moiety
 This subclass is indented under subclass 135.  Processes wherein the carboxylic acid of the ester contains additional oxygen.
  
[List of Patents for class 564 subclass 137]    137Lower fatty acid
 This subclass is indented under subclass 135.  Processes wherein the carboxylic acid of the ester is a lower fatty acid.
  
[List of Patents for class 564 subclass 138]    138Of carboxylic acid
 This subclass is indented under subclass 133.  Processes wherein a carboxylic acid is utilized.
  
[List of Patents for class 564 subclass 139]    139Benzene ring containing
 This subclass is indented under subclass 138.  Processes wherein the carboxylic acid contains a benzene ring.
  
[List of Patents for class 564 subclass 140]    140Hydroxy naphthoic
 This subclass is indented under subclass 139.  Processes wherein hydroxy naphthoic acid is utilized.
  
[List of Patents for class 564 subclass 141]    141Lower fatty acid
 This subclass is indented under subclass 138.  Processes wherein a lower fatty acid is utilized.
  
[List of Patents for class 564 subclass 142]    142Of carboxylic acid halide
 This subclass is indented under subclass 133.  Processes wherein a carboxylic acid halide is utilized.
  
[List of Patents for class 564 subclass 143]    143Acyclic
 This subclass is indented under subclass 142.  Processes wherein the carboxylic acid halide does not contain a ring.
  
[List of Patents for class 564 subclass 144]    144Of acyclic carboxylic acid anhydride
 This subclass is indented under subclass 133.  Processes wherein a carboxylic acid anhydride which does not have a ring is utilized.
  
[List of Patents for class 564 subclass 145]    145Preparing directly by reacting sulfur or sulfur containing compound with ammonia; or directly from ammonium polysulfide
 This subclass is indented under subclass 123.  Processes wherein a carboxamide is prepared by utilizing a mixture of sulfur or a sulfur containing compound with ammonia or by utilizing an ammonium polysulfide, as for example, by the Willgerodt reaction.
  
[List of Patents for class 564 subclass 146]    146Preparing directly by nitration
 This subclass is indented under subclass 123.  Processes wherein a nitro group is introduced into a carboxamide.
  
[List of Patents for class 564 subclass 147]    147Aminimine containing
 This subclass is indented under subclass 123.  Compounds which are aminimines and contain the grouping

Image 1 for class 564 subclass 147

(1) Note. This subclass contains, for example:

Image 2 for class 564 subclass 147

  
[List of Patents for class 564 subclass 148]    148Hydrazine containing
 This subclass is indented under subclass 123.  Compounds which contain a hydrazine group.
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 148

  
[List of Patents for class 564 subclass 149]    149Substituent Q contains benzene ring
 This subclass is indented under subclass 148.  Compounds wherein the carboxylic acid residue contains a benzene ring.
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 149

  
[List of Patents for class 564 subclass 150]    150Hydroxy, bonded directly to carbon, or ether in substituent Q (H of -OH may be replaced by a substituted or unsubstituted ammonium ion or a Group IA or IIA light metal)
 This subclass is indented under subclass 149.  Compounds wherein the carboxylic acid residue contains hydroxy bonded directly to carbon, or an ether, wherein the H of the -OH may be replaced by a substituted or unsubstituted ammonium ion or a Group IA or IIA light metal.
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 150

  
[List of Patents for class 564 subclass 151]    151Substituent Q is acyclic
 This subclass is indented under subclass 148.  Compounds wherein the carboxylic acid residue does not contain a ring.
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 151

  
[List of Patents for class 564 subclass 152]    152Plural carboxamide groups containing or containing plural carbonyls bonded directly to the same nitrogen
 This subclass is indented under subclass 123.  Compounds which contain more than one carboxamide group or contain plural carbonyls bonded directly to the same nitrogen.
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 152

  
[List of Patents for class 564 subclass 153]    153Three or more carboxamide groups
 This subclass is indented under subclass 152.  Compounds which contain three or more carboxamides.
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 153

  
[List of Patents for class 564 subclass 154]    154Sulfur containing
 This subclass is indented under subclass 152.  Compounds which contain nonionically bonded sulfur.
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 154

  
[List of Patents for class 564 subclass 155]    155Benzene ring containing
 This subclass is indented under subclass 152.  Compounds which contain a benzene ring.
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 155

  
[List of Patents for class 564 subclass 156]    156Two carboxamido carbonyls having benzene ring between the carbonyls and no carboxamido nitrogen between the carbonyls
 This subclass is indented under subclass 155.  Compounds wherein the carbonyls of two carboxamides have a benzene ring between them and no carboxamide nitrogen between them.
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 156

  
[List of Patents for class 564 subclass 157]    157Amino nitrogen, not bonded directly to carbonyl, containing
 This subclass is indented under subclass 155.  Compounds which contain a noncarboxamide amino nitrogen.
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 157

  
[List of Patents for class 564 subclass 158]    158Hydroxy, bonded directly to carbon, or ether containing (H of -OH may be replaced by a substituted or unsubstituted ammonium ion or a Group IA or IIA light metal)
 This subclass is indented under subclass 155.  Compounds which contain a hydroxyl bonded directly to carbon, or ether, wherein the H of -OH may be replaced by a substituted or unsubstitued ammonium ion or by a Group IA or IIA light metal.
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 158

  
[List of Patents for class 564 subclass 159]    159Acyclic
 This subclass is indented under subclass 152.  Compounds which contain no ring.
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 159

  
[List of Patents for class 564 subclass 160]    160Two carboxamido carbonyls having no carboxamido nitrogen between the carbonyls
 This subclass is indented under subclass 159.  Compounds wherein the carbonyls of two carboxamides have no carboxamide nitrogen between them.
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 160

  
[List of Patents for class 564 subclass 161]    161Substituent Q contains benzene ring
 This subclass is indented under subclass 123.  Compounds wherein the residue of the carboxylic acid contains a benzene ring.
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 161

  
[List of Patents for class 564 subclass 162]    162Sulfur in substituent Q
 This subclass is indented under subclass 161.  Compounds wherein the residue of the carboxylic acid contains sulfur.
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 162

SEE OR SEARCH THIS CLASS, SUBCLASS:

80+,100, 101, and 102, for carboxamides which also contain sulfur bonded directly to amino nitrogen.
  
[List of Patents for class 564 subclass 163]    163Nitrogen in substituent Q
 This subclass is indented under subclass 161.  Compounds wherein the carboxylic acid residue contains nitrogen.
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 163

  
[List of Patents for class 564 subclass 164]    164The substituent nitrogen is an amino nitrogen attached indirectly to a ring by acyclic nonionic bonding
 This subclass is indented under subclass 163.  Compounds wherein the carboxylic acid residue contains an amine nitrogen indirectly attached to a ring through a carbon or through an acyclic chain.
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 164

  
[List of Patents for class 564 subclass 165]    165Hydroxy, bonded directly to carbon, or ether in substituent Q (H of -OH may be replaced by a substituted or unsubstituted ammonium ion or a Group IA or IIA light metal)
 This subclass is indented under subclass 164.  Compounds wherein the carboxylic acid residue contains a hydroxyl bonded directly to carbon or an ether, wherein the H of the -OH may be replaced by a substituted or unsubstituted ammonium ion or by a Group IA or IIA light metal.
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 165

  
[List of Patents for class 564 subclass 166]    166Nitro in substituent Q
 This subclass is indented under subclass 163.  Compounds wherein the residue of the carboxylic acid contains a nitro group.
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 166

  
[List of Patents for class 564 subclass 167]    167Hydroxy, bonded directly to carbon, or ether in substituent Q (H of -OH may be replaced by a substituted or unsubstituted ammonium ion or a Group IA or IIA light metal)
 This subclass is indented under subclass 163.  Compounds wherein the carboxylic acid residue contains a hydroxyl bonded directly to carbon or an ether, wherein the H of the -OH may be replaced by a substituted or unsubstituted ammonium ion or by a Group IA or IIA light metal.
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 167

  
[List of Patents for class 564 subclass 168]    168Ring in a substituent E
 This subclass is indented under subclass 163.  Compounds wherein the amino nitrogen containing residue contains a ring.
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 168

  
[List of Patents for class 564 subclass 169]    169Carbonyl in substituent Q
 This subclass is indented under subclass 161.  Compounds wherein the carboxylic acid residue contains an aldehyde or ketone group.
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 169

  
[List of Patents for class 564 subclass 170]    170Hydroxy, bonded directly to carbon, or ether in substituent Q (H of -OH may be replaced by a substituted or unsubstituted ammonium ion or a Group IA or IIA light metal)
 This subclass is indented under subclass 161.  Compounds wherein the carboxylic acid residue contains a hydroxyl bonded directly to carbon or an ether, wherein the H of the -OH may be replaced by a substituted or unsubstituted ammonium ion or by a Group IA or IIA light metal.
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 170

  
[List of Patents for class 564 subclass 171]    171Plural rings in substituent Q
 This subclass is indented under subclass 170.  Compounds wherein the carboxylic acid residue contains more than one ring.
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 171

  
[List of Patents for class 564 subclass 172]    172Polycyclo ring system in substituent Q
 This subclass is indented under subclass 171.  Compounds wherein the carboxylic acid residue contains a polycyclo ring system.
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 172

  
[List of Patents for class 564 subclass 173]    173Q contains an ortho-hydroxy naphthyl bicyclo ring system, or its partially hydrogenated form, bonded directly to the carbonyl (H of -OH may be replaced by a substituted or unsubstituted ammonium ion or a Group IA or IIA light metal)
 This subclass is indented under subclass 172.  Compounds wherein the carboxylic acid residue is an ortho-hydroxy naphthoic acid or a partially hydrogenated form thereof.
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 173

  
[List of Patents for class 564 subclass 174]    174Ring in a substituent E
 This subclass is indented under subclass 171.  Compounds wherein the amino nitrogen residue contains a ring.
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 174

  
[List of Patents for class 564 subclass 175]    175Oxygen, bonded directly to the benzene ring, is part of an acyclic chain between the benzene ring and the carbonyl
 This subclass is indented under subclass 170.  Compounds wherein the carboxylic acid residue contains oxygen which is directly bonded to a benzene ring and is part of an acyclic chain which also contains the acid carbonyl group.
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 175

  
[List of Patents for class 564 subclass 176]    176Benzene ring bonded directly to the carbonyl
 This subclass is indented under subclass 170.  Compounds wherein the carboxylic acid residue contains a benzene ring bonded directly to the acid carbonyl group.
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 176

  
[List of Patents for class 564 subclass 177]    177Hydroxy bonded directly to the benzene ring (H of -OH may be replaced by a substituted or unsubstituted ammonium ion or a Group IA or IIA light metal)
 This subclass is indented under subclass 176.  Compounds wherein the carboxylic acid residue contains a hydroxy group or its Group IA or IIA light metal or ammonium derivative bonded directly to a benzene ring.
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 177

  
[List of Patents for class 564 subclass 178]    178Preparing directly by halogenation
 This subclass is indented under subclass 177.  Processes wherein the compounds are prepared directly by halogenation.
  
[List of Patents for class 564 subclass 179]    179Benzene ring in a substituent E
 This subclass is indented under subclass 177.  Compounds wherein the amino nitrogen containing residue has a benzene ring.
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 179

  
[List of Patents for class 564 subclass 180]    180Polycyclo ring system in substituent Q
 This subclass is indented under subclass 161.  Compounds wherein the carboxylic acid residue contains a polycyclo ring system.
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 180

  
[List of Patents for class 564 subclass 181]    181Two rings bonded directly to the same carbon in substituent Q
 This subclass is indented under subclass 161.  Compounds wherein the carboxylic acid residue contains two rings bonded directly to the same carbon.
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 181

  
[List of Patents for class 564 subclass 182]    182Substituent Q is monocyclic
 This subclass is indented under subclass 161.  Compounds wherein the carboxylic acid residue contains only one ring.
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 182

  
[List of Patents for class 564 subclass 183]    183The ring is bonded directly to the carbonyl
 This subclass is indented under subclass 182.  Compounds wherein the carboxylic acid residue contains a benzene ring bonded directly to the acid carbonyl.
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 183

  
[List of Patents for class 564 subclass 184]    184Benzene ring in a substituent E
 This subclass is indented under subclass 183.  Compounds wherein the amino nitrogen containing residue contains a benzene ring.
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 184

  
[List of Patents for class 564 subclass 185]    185Ring or polycyclo ring system in substituent E is attached indirectly to the carboxamide nitrogen or to an amino nitrogen in substituent E by acyclic nonionic bonding
 This subclass is indented under subclass 184.  Compounds wherein the amino nitrogen containing residue contains a ring or a polycyclo ring system which is attached indirectly to the carboxamido nitrogen or to an additional amino nitrogen in the amino nitrogen containing residue by acyclic nonionic bonding.
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 185

  
[List of Patents for class 564 subclass 186]    186Oxygen in a substituent E
 This subclass is indented under subclass 183.  Compounds wherein the amino nitrogen containing residue contains oxygen.
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 186

  
[List of Patents for class 564 subclass 187]    187Acyclic carbon to carbon unsaturation in a substituent E
 This subclass is indented under subclass 183.  Compounds wherein the amino nitrogen containing residue contains a double or triple bond between two carbons.
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 187

  
[List of Patents for class 564 subclass 188]    188Plural alicyclic rings in substituent Q
 This subclass is indented under subclass 123.  Compounds wherein the carboxylic acid residue contains more than one alicyclic ring.
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 188

  
[List of Patents for class 564 subclass 189]    189Five-membered ring in substituent Q
 This subclass is indented under subclass 123.  Compounds wherein the carboxylic acid residue contains a five-membered ring.
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 189

  
[List of Patents for class 564 subclass 190]    190Three-membered ring in substituent Q
 This subclass is indented under subclass 123.  Compounds wherein the carboxylic acid residue contains a three-membered ring.
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 190

  
[List of Patents for class 564 subclass 191]    191Alicyclic ring and an atom other than oxygen, carbon, or hydrogen in substituent Q
 This subclass is indented under subclass 123.  Compounds wherein the carboxylic acid residue contains an alicyclic ring and an atom other than carbon, hydrogen, or oxygen.
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 191

  
[List of Patents for class 564 subclass 192]    192Substituent Q is acyclic
 This subclass is indented under subclass 123.  Compounds wherein the carboxylic acid residue does not contain a ring.
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 192

  
[List of Patents for class 564 subclass 193]    193Nitrogen in substituent Q
 This subclass is indented under subclass 192.  Compounds wherein the carboxylic acid residue contains nitrogen.
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 193

  
[List of Patents for class 564 subclass 194]    194Benzene ring in a substituent E
 This subclass is indented under subclass 193.  Compounds wherein the amino nitrogen containing residue contains a benzene ring.
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 194

  
[List of Patents for class 564 subclass 195]    195Two rings bonded directly to the same carbon in a substituent E
 This subclass is indented under subclass 194.  Compounds wherein the amino nitrogen containing residue contains two rings bonded directly to the same carbon.
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 195

  
[List of Patents for class 564 subclass 196]    196A ring or polycyclo ring system in a substituent E is attached indirectly to the carboxamide nitrogen or to an amino nitrogen in substituent E by acyclic nonionic bonding
 This subclass is indented under subclass 194.  Compounds wherein the amino nitrogen containing residue contains a ring or a polycyclo ring system which is attached indirectly to the carboxamido nitrogen or to an additional amino nitrogen in the amino nitrogen containing residue by acyclic nonionic bonding.
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 196

  
[List of Patents for class 564 subclass 197]    197The compound is acyclic
 This subclass is indented under subclass 193.  Compounds wherein the amino nitrogen containing residue does not contain a ring.
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 197

  
[List of Patents for class 564 subclass 198]    198The carboxamide nitrogen is unsubstituted
 This subclass is indented under subclass 197.  Compounds wherein the amino nitrogen containing residue is unsubstituted.
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 198

  
[List of Patents for class 564 subclass 199]    199Carbonyl in substituent Q
 This subclass is indented under subclass 192.  Compounds wherein the carboxylic acid residue contains an aldehyde or keto group.
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 199

  
[List of Patents for class 564 subclass 200]    200Benzene ring in a substituent E
 This subclass is indented under subclass 199.  Compounds wherein the amino nitrogen containing residue contains a benzene ring.
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 200

  
[List of Patents for class 564 subclass 201]    201Hydroxy, bonded directly to carbon, or ether in substituent Q (H of -OH may be replaced by a substituted or unsubstituted ammonium ion or a Group IA or IIA light metal)
 This subclass is indented under subclass 192.  Compounds wherein the carboxylic acid residue contains a hydroxyl bonded directly to carbon, or an ether, wherein the H of the -OH may be replaced by a substituted or unsubstituted ammonium ion or by a Group IA or IIA light metal.
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 201

  
[List of Patents for class 564 subclass 202]    202Benzene ring in a substituent E
 This subclass is indented under subclass 201.  Compounds wherein the amino nitrogen containing residue contains a benzene ring.
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 202

  
[List of Patents for class 564 subclass 203]    203Hydroxy, bonded directly to carbon, or ether in an acyclic substituent E (Hof -OH may be replaced by a substituted or unsubstututed ammonium ion or a Group IA or IIA light metal)
 This subclass is indented under subclass 201.  Compounds wherein the amino nitrogen containing residue does not have a ring and contains a hydroxyl bonded directly to carbon, or an ether, wherein the H of the -OH may be replaced by a substituted or unsubstituted ammonium ion or by a Group IA or IIA light metal.
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 203

  
[List of Patents for class 564 subclass 204]    204Carbon to carbon unsaturation in substituent Q
 This subclass is indented under subclass 192.  Compounds wherein the carboxylic acid residue contains a double or triple bond between two carbons.
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 204

  
[List of Patents for class 564 subclass 205]    205Process which includes forming the unsaturation
 This subclass is indented under subclass 204.  Processes wherein unsaturation is introduced into the carboxylic acid residue of a carboxamide, as for example, by pyrolyzing an alkoxy or acetoxy alkanoic acid amide to split off the alkoxy or acetoxy groups, respectively.
  
[List of Patents for class 564 subclass 206]    206Purification or recovery
 This subclass is indented under subclass 204.  Processes directed to the purification, separation, or recovery of unsaturated carboxylic acid amides.
  
[List of Patents for class 564 subclass 207]    207Benzene ring in a substituent E
 This subclass is indented under subclass 204.  Compounds wherein the amino nitrogen containing residue contains a benzene ring.
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 207

  
[List of Patents for class 564 subclass 208]    208Hydroxy, bonded directly to carbon, or ether in an acyclic substituent E (H of -OH may be replaced by a substituted or unsubstituted ammonium ion or a Group IA or IIA light metal)
 This subclass is indented under subclass 204.  Compounds wherein the amino nitrogen containing residue does not have a ring and contains a hydroxyl bonded directly to carbon, or an ether, wherein the H of the -OH may be replaced by a substituted or unsubstituted ammonium ion or by a Group IA or IIA light metal.
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 208

  
[List of Patents for class 564 subclass 209]    209Halogen, bonded directly to carbon, in substituent Q
 This subclass is indented under subclass 192.  Compounds wherein the carboxylic acid residue contains halogen bonded directly to carbon.
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 209

  
[List of Patents for class 564 subclass 210]    210Ring in a substituent E
 This subclass is indented under subclass 209.  Compounds wherein the amino nitrogen containing residue contains a ring.
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 210

  
[List of Patents for class 564 subclass 211]    211Benzene ring in a substituent E
 This subclass is indented under subclass 210.  Compounds wherein the amino nitrogen containing residue contains a benzene ring.
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 211

  
[List of Patents for class 564 subclass 212]    212A ring or polycyclo ring system in a substituent E is attached indirectly to the carboxamide nitrogen or to an amino nitrogen in substituent E by acyclic nonionic bonding
 This subclass is indented under subclass 211.  Compounds wherein the amino nitrogen containing residue contains a ring or a polycyclo ring system which is attached indirectly to the carboxamido nitrogen or to an additional amino nitrogen in the amino nitrogen containing residue by acyclic nonionic bonding.
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 212

  
[List of Patents for class 564 subclass 213]    213Nitro and hydroxy, bonded directly to carbon, or ether in the substituent E (H of -OH may be replaced by a substituted or unsubstituted ammonium ion or a Group IA or IIA light metal)
 This subclass is indented under subclass 212.  Compounds wherein the amino nitrogen containing residue contains a nitro group and an ether, or contains a nitro group an a hydroxyl, which hydroxyl is bonded directly to carbon and wherein the H of the -OH may be replaced by a substituted or unsubstituted ammonium or a Group IA or IIA light metal.
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 213

  
[List of Patents for class 564 subclass 214]    214The compound is monocyclic
 This subclass is indented under subclass 211.  Compounds wherein the amino nitrogen containing residue contains only one ring.
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 214

  
[List of Patents for class 564 subclass 215]    215Q is hydrogen or a lower saturated alkyl substituent
 This subclass is indented under subclass 192.  Compounds wherein the carboxylic acid residue is from a lower fatty acid.
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 215

  
[List of Patents for class 564 subclass 216]    216Purification or recovery
 This subclass is indented under subclass 215.  Processes directed to the purification, separation, or recovery of lower fatty acid amides.
  
[List of Patents for class 564 subclass 217]    217Ring in a substituent E
 This subclass is indented under subclass 215.  Compounds wherein the amino nitrogen containing residue contains a ring.
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 217

  
[List of Patents for class 564 subclass 218]    218Benzene ring in a substituent E
 This subclass is indented under subclass 217.  Compounds wherein the amino nitrogen containing residue contains a benzene ring.
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 218

  
[List of Patents for class 564 subclass 219]    219A ring or polycyclo ring system in a substituent E is attached indirectly to the carboxamide nitrogen or to an amino nitrogen in substituent E by acyclic nonionic bonding
 This subclass is indented under subclass 218.  Compounds wherein the amino nitrogen containing residue contains a ring or a polycyclo ring system which is attached indirectly to the carboxamido nitrogen or to an additional amino nitrogen in the amino nitrogen containing residue by acyclic nonionic bonding.
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 219

  
[List of Patents for class 564 subclass 220]    220Amino nitrogen in the substituent E (i.e.,plural amino nitrogens containing)
 This subclass is indented under subclass 219.  Compounds wherein the amino nitrogen containing residue contains an additional amino nitrogen.
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 220

  
[List of Patents for class 564 subclass 221]    221Plural rings in a substituent E
 This subclass is indented under subclass 218.  Compounds wherein the amino nitrogen containing residue contains more than one ring.
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 221

  
[List of Patents for class 564 subclass 222]    222Polycyclo ring system in a substituent E
 This subclass is indented under subclass 221.  Compounds wherein the amino nitrogen containing residue contains a polycyclo ring system.
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 222

  
[List of Patents for class 564 subclass 223]    223Hydroxy, bonded directly to carbon, or ether in a substituent E (H of -OH may be replaced by a substituted or unsubstituted ammonium ion or a Group IA or IIA light metal)
 This subclass is indented under subclass 218.  Compounds wherein the amino nitrogen containing residue contains a hydroxyl bonded directly to carbon, or an ether, where H of the -OH may be replaced by a substituted or unsubstituted ammonium ion or by a Group IA or IIA light metal.
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 223

  
[List of Patents for class 564 subclass 224]    224Hydroxy, bonded directly to carbon, ether or nitrogen in a substituent E (H of -OH may be replaced by a substituted or unsubstituted ammonium ion or a Group IA or IIA light metal)
 This subclass is indented under subclass 215.  Compounds wherein the amino nitrogen residue contains a hydroxyl bonded directly to carbon, or an ether or an additional nitrogen, wherein the H of the -OH may be replaced by a substituted or unsubstituted ammonium ion or a Group IA and IIA light metal.
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 224

  
[List of Patents for class 564 subclass 225]    225Amidines (i.e., HN=CH-HNH, wherein substition may be made for hydrogen only)
 This subclass is indented under subclass 1.  Compounds which are amidines and contains the grouping

Image 1 for class 564 subclass 225

(1) Note. This subclass contains, for example:

Image 2 for class 564 subclass 225

  
[List of Patents for class 564 subclass 226]    226Amidino hydrazines or hydrazones (i.e., HNH-N=CH-HNH or HN=CH-NH-HNH, wherein substitution may be made for hydrogen only)
 This subclass is indented under subclass 225.  Compounds which are amidino hydrazine containing the grouping in Fig. 1 or amidino hydrazones containing the grouping in Fig. 2.

FIGURE 1

FIGURE 1

FIGURE 2

FIGURE 2

(1) Note. This subclass contains, for example:

Image 3 for class 564 subclass 226

  
[List of Patents for class 564 subclass 227]    227Guanyl hydrazines or hydrozones (i.e., HNH-N=C(-HNH)-HNH or HN=C(-HNH)-NH HNH, wherein substitution may be made for hydrogen only)
 This subclass is indented under subclass 226.  Compounds which are guanylhydrazines containing the grouping in Fig. 1 below, or guanylhydrazones containing the grouping in Fig. 2.

FIGURE 1

FIGURE 1

FIGURE 2

FIGURE 2

(1) Note. This subclass contains, for example:

Image 3 for class 564 subclass 227

  
[List of Patents for class 564 subclass 228]    228Benzene ring containing
 This subclass is indented under subclass 227.  Compounds which contain a benzene ring.
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 228

  
[List of Patents for class 564 subclass 229]    229Amidoximes (i.e., HON=CH-HNH, wherein substitution may be made for hydrogen only)
 This subclass is indented under subclass 225.  Compounds which are amidoximes containing the grouping below, wherein R may be H, an ester forming group or an ether forming group.

Image 1 for class 564 subclass 229

(1) Note. This subclass contains, for example:

Image 2 for class 564 subclass 229

  
[List of Patents for class 564 subclass 230]    230Guanidines (i.e., HN=C(-HNH)-HNH, wherein substitution may be made for hydrogen only)
 This subclass is indented under subclass 225.  Compounds which are guanidines, containing the grouping

Image 1 for class 564 subclass 230

(1) Note. This subclass contains, for example:

Image 2 for class 564 subclass 230

  
[List of Patents for class 564 subclass 231]    231Preparing from thioureas
 This subclass is indented under subclass 230.  Processes wherein a guanidine is prepared from a thiourea, as for example, by reaction with ammonia or an amino nitrogen containing compound in the presence of a desulfurizing agent.
  
[List of Patents for class 564 subclass 232]    232Preparing by reacting cyanogen halide with amino nitrogen containing compound
 This subclass is indented under subclass 230.  Processes wherein a guanidine is prepared by reaction of a cyanogen halide and an amino nitrogen containing compound, as for example:

Image 1 for class 564 subclass 232

  
[List of Patents for class 564 subclass 233]    233Biguanides (i.e., HN=C(-HNH)-NH-(HNH-)C=NH, wherein substitution may be made for hydrogen only)
 This subclass is indented under subclass 230.  Compounds which are biguanides, containing the grouping

Image 1 for class 564 subclass 233

(1) Note. This subclass contains, for example:

Image 2 for class 564 subclass 233

Image 3 for class 564 subclass 233

  
[List of Patents for class 564 subclass 234]    234Benzene ring containing
 This subclass is indented under subclass 233.  Compounds wherein a biguanide contains a benzene ring.
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 234

  
[List of Patents for class 564 subclass 235]    235Plural rings containing
 This subclass is indented under subclass 234.  Compounds wherein a biguanide contains more than one ring.
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 235

  
[List of Patents for class 564 subclass 236]    236Polyguanidines
 This subclass is indented under subclass 230.  Compounds wherein there are at least two guanidine groups.
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 236

  
[List of Patents for class 564 subclass 237]    237Benzene ring containing
 This subclass is indented under subclass 230.  Compounds wherein a guanidine contains a benzene ring.
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 237

  
[List of Patents for class 564 subclass 238]    238Benzene ring bonded directly to guanidine nitrogen
 This subclass is indented under subclass 237.  Compounds wherein a guanidine contains a benzene ring bonded directly to a guanidine nitrogen.
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 238

  
[List of Patents for class 564 subclass 239]    239Hydroxy, bonded directly to carbon, or ether containing (H of -OH may be replaced by a substituted or unsubstituted ammonium ion or a Group IA or IIA light metal)
 This subclass is indented under subclass 238.  Compounds wherein a guanidine contains a hydroxyl bonded directly to carbon, or an ether, wherein the H of the -OH may be replaced by a substituted or unsubstituted ammonium ion or by a Group IA or IIA light metal.
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 239

  
[List of Patents for class 564 subclass 240]    240Acyclic
 This subclass is indented under subclass 230.  Compounds wherein a guanidine does not contain a ring.
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 240

  
[List of Patents for class 564 subclass 241]    241Guanidine per se or salt thereof
 This subclass is indented under subclass 240.  The compound which is guanidine or its salts and processes of preparation not provided for above.
  
[List of Patents for class 564 subclass 242]    242Guanidine nitrate
 This subclass is indented under subclass 241.  The compound which is guanidine nitrate and processes of preparation not provided for above.
  
[List of Patents for class 564 subclass 243]    243Polyamidines
 This subclass is indented under subclass 225.  Compounds wherein there is more than one amidine group.
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 243

  
[List of Patents for class 564 subclass 244]    244Benzene ring containing
 This subclass is indented under subclass 225.  Compounds wherein an amidine contains a benzene ring.
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 244

  
[List of Patents for class 564 subclass 245]    245N(prime)-aryl formimidines (i.e., benzene-N=CH-HNH, wherein substitution may be made for hydrogen, including those bonded directly to the benzene ring only)
 This subclass is indented under subclass 244.  Compounds which are N (prime)-aryl formamidines containing the grouping

Image 1 for class 564 subclass 245

(1) Note. This subclass contains, for example:

Image 2 for class 564 subclass 245

  
[List of Patents for class 564 subclass 246]    246Additional nitrogen attached indirectly to amidine nitrogen by nonionic bonding
 This subclass is indented under subclass 244.  Compounds wherein an amidine contains an additional nitrogen which is nonionically bonded.
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 246

  
[List of Patents for class 564 subclass 247]    247Hydroxy, bonded directly to carbon, or ether containing (H of -OH may be replaced by a substituted or unsubstituted ammonium ion or a Group IA or IIA light metal)
 This subclass is indented under subclass 244.  Compounds wherein an amidine contains a hydroxyl bonded directly to carbon, or an ether, wherein the H of the -OH may be replaced by a substituted or unsubstituted ammonium ion or by a Group IA or IIA light metal.
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 247

  
[List of Patents for class 564 subclass 248]    248Containing nitrogen double bonded directly to carbon
 This subclass is indented under subclass 1.  Compounds which are characterized by the presence of the grouping below and correspond in constitution to those formed by reacting an aldehyde or ketone with ammonia or an amino nitrogen containing compound.

Image 1 for class 564 subclass 248

(1) Note. This subclass contains, for example:

Image 2 for class 564 subclass 248

  
[List of Patents for class 564 subclass 249]    249Azines (i.e., HCH=N-N=HCH, wherein substitution may be made for hydrogen)
 This subclass is indented under subclass 248.  Compounds which are azines and contain the grouping below.

Image 1 for class 564 subclass 249

(1) Note. This subclass contains, for example:

Image 2 for class 564 subclass 249

  
[List of Patents for class 564 subclass 250]    250Hydrazones (i.e., HCH=N-HNH, wherein substitution may be made for hydrogen only)
 This subclass is indented under subclass 248.  Compounds which are hydrazones containing the grouping below.

Image 1 for class 564 subclass 250

(1) Note. This subclass contains, for example:

Image 2 for class 564 subclass 250

  
[List of Patents for class 564 subclass 251]    251Benzene ring containing
 This subclass is indented under subclass 250.  Compounds wherein the hydrazone contains a benzene ring.
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 251

  
[List of Patents for class 564 subclass 252]    252Carbodiimides (i.e., HN=C=NH, wherein substitution may be made for hydrogen only)
 This subclass is indented under subclass 248.  Compounds which are carbodiimides containing the grouping below.

Image 1 for class 564 subclass 252

(1) Note. This subclass contains, for example:

Image 2 for class 564 subclass 252

  
[List of Patents for class 564 subclass 253]    253Oximes (HCH=N-OH, i.e., wherein substitution may be made for hydrogen only)
 This subclass is indented under subclass 248.  Compounds which are oximes containing the grouping below wherein X may be hydrogen, the carbon of an ether forming group or the residue of an ester forming compound not provided for above.

Image 1 for class 564 subclass 253

(1) Note. This subclass contains, for example:

Image 2 for class 564 subclass 253

  
[List of Patents for class 564 subclass 254]    254O-esters (i.e., H of oxime -OH replaced by ester forming group)
 This subclass is indented under subclass 253.  Compounds which are O-esters of oximes wherein X is the residue of an ester forming compound.
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 254

SEE OR SEARCH THIS CLASS, SUBCLASS:

15,for phosphorus containing acid O-esters of oximes.
  
[List of Patents for class 564 subclass 255]    255O-carbamoyl
 This subclass is indented under subclass 254.  Compounds wherein the residue of the ester forming group is that of a carbamic acid.
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 255

  
[List of Patents for class 564 subclass 256]    256O-ethers (i.e., H of oxime -OH replaced by ether forming group)
 This subclass is indented under subclass 253.  Compounds which are O-ethers of oximes wherein X is the carbon of an ether forming group.
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 256

  
[List of Patents for class 564 subclass 257]    257Polycyclo ring system
 This subclass is indented under subclass 256.  Compounds wherein the O-ether oxime contains a polycyclo ring system.
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 257

  
[List of Patents for class 564 subclass 258]    258Oxygen double bonded, or hydroxy or ether oxygen bonded directly to an alpha carbon (H of -OH may be replaced by a substituted or unsubstituted ammonium ion or a Group Ia or IIA light metal)
 This subclass is indented under subclass 253.  Compounds wherein a carbon atom in a position alpha to the oxime group is substituted by a double-bonded oxygen or an -OX, wherein X may be H, C, or a substituted or unsubstituted ammonium ion or a Group IA or IIA light metal.
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 258

  
[List of Patents for class 564 subclass 259]    259Preparing directly by reacting carbonyl with hydroxylamine or salt thereof
 This subclass is indented under subclass 253.  Processes wherein an oxime is produced directly by reaction of an aldehyde or ketone with hydroxyl amine or a salt thereof.
  
[List of Patents for class 564 subclass 260]    260Preparing directly by reducing nitronic acid salt
 This subclass is indented under subclass 253.  Processes wherein an oxime is produced directly by reduction of a nitronic acid salt, as for example, an alkali metal salt of a nitroparaffin.
  
[List of Patents for class 564 subclass 261]    261Preparing directly by reducing nitro group
 This subclass is indented under subclass 253.  Processes wherein an oxime is produced directly by reduction of a nitro group, as for example, with hydrogen or carbon monoxide.
  
[List of Patents for class 564 subclass 262]    262Preparing directly by oxidizing a hydroxyl amine
 This subclass is indented under subclass 253.  Processes wherein an oxime is produced directly by oxidation of a hydroxyl amine group.
  
[List of Patents for class 564 subclass 263]    263Preparing directly by nitrosation of olefin
 This subclass is indented under subclass 253.  Processes wherein an oxime is produced directly by reaction of an olefinic compound with a nitrosating agent such as, for example, nitrous acid or nitrosyl chloride.
  
[List of Patents for class 564 subclass 264]    264Purification or recovery
 This subclass is indented under subclass 253.  Processes which are directed to the purification, separation, or recovery of oximes.
  
[List of Patents for class 564 subclass 265]    265Benzene ring containing
 This subclass is indented under subclass 253.  Compounds wherein an oxime contains a benzene ring.
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 265

  
[List of Patents for class 564 subclass 266]    266The oxime carbon is acyclic and has two rings bonded directly thereto
 This subclass is indented under subclass 265.  Compounds wherein two rings are bonded directly to the carbon of an oxime group.
(1) Note. This subclass contains, for example:

Image 1 for class 564 subclass 266

  
[List of Patents for class 564 subclass 267]    267Six-membered alicyclic ring double bonded directly to the oxime nitrogen
 This subclass is indented under subclass 253.  Compounds wherein a carbon of a cyclohexyl group is bonded directly to the oxime nitrogen.
(1) Note. This subclass contains, for example:

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[List of Patents for class 564 subclass 268]    268Acyclic
 This subclass is indented under subclass 253.  Compounds wherein an oxime does not contain a ring.
(1) Note. This subclass contains, for example:

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[List of Patents for class 564 subclass 269]    269Nitrogen double bonded and two rings bonded directly to the same acyclic carbon (e.g., auramines, etc.)
 This subclass is indented under subclass 248.  Compounds wherein two rings are directly bonded to the same carbon which, in turn, is double bonded to an amino nitrogen, e.g., auramines.
(1) Note. This subclass contains, for example:

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[List of Patents for class 564 subclass 270]    270Polycyclo ring system
 This subclass is indented under subclass 248.  Compounds wherein an aldimine or ketimine containing compound contains a polycyclo ring system.
(1) Note. This subclass contains, for example:

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[List of Patents for class 564 subclass 271]    271Aldimines or ketimines which contain benzene ring (i.e., HCH=NH, wherein substitution may be made for hydrogen only but a hydrogen or carbon must be bonded directly to the carbon)
 This subclass is indented under subclass 248.  Compounds which are aldimines or ketimines and contain a benzene ring.
(1) Note. This subclass contains, for example:

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[List of Patents for class 564 subclass 272]    272Benzylidene imines (i.e., Q-benzene-CH=NH, wherein Q is a substituent or hydrogen and substitution may be made for hydrogen only)
 This subclass is indented under subclass 271.  Compounds which are benzylideneimines containing the grouping below.

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(1) Note. This subclass contains, for example:

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[List of Patents for class 564 subclass 273]    273Substituent Q contains nitrogen bonded directly to carbon
 This subclass is indented under subclass 272.  Compounds wherein a substituent attached to the ring of the benzylidene group contains a nitrogen which is directly bonded to carbon.
(1) Note. This subclass contains, for example:

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[List of Patents for class 564 subclass 274]    274Substituent Q contains hydroxy, bonded directly to carbon, or ether (H of -OH may be replaced by a substituted or unsubstituted ammonium ion or a Group IA or IIA light metal)
 This subclass is indented under subclass 272.  Compounds wherein a substituent attached to the ring of the benzylidene group contains an OH bonded directly to carbon, or an ether, wherein the H of the -OH may be replaced by a substituted or unsubstituted ammonium ion or by a Group IA or IIA light metal.
(1) Note. This subclass contains, for example:

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[List of Patents for class 564 subclass 275]    275Q is hydrogen only
 This subclass is indented under subclass 272.  Compounds wherein the benzene of the benzylidene group is unsubstituted.
(1) Note. This subclass contains, for example:

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[List of Patents for class 564 subclass 276]    276Hydroxy, bonded diretly to carbon, or ether containing (H of -OH may be replaced by a substituted or unsubstituted ammonium ion or a Group IA or IIA light metal)
 This subclass is indented under subclass 271.  Compounds wherein the aldimine or ketimine contains hydroxyl bonded directly to carbon, or an ether, wherein the H of the -OH may be replaced by a substituted or unsubstituted ammonium ion or by a Group IA or IIA light metal.
(1) Note. This subclass contains, for example:

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[List of Patents for class 564 subclass 277]    277Unsubstituted phenyl bonded directly to the aldimine or ketimine nitrogen
 This subclass is indented under subclass 271.  Compounds wherein an unsubstituted benzene is directly attached to the imino nitrogen.
(1) Note. This subclass contains, for example:

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[List of Patents for class 564 subclass 278]    278Aldimines or ketimines which are acyclic
 This subclass is indented under subclass 248.  Compounds wherein an aldimine or ketimine does not contain a ring.
(1) Note. This subclass contains, for example:

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[List of Patents for class 564 subclass 279]    279Carbon to carbon unsaturation containing
 This subclass is indented under subclass 278.  Compounds wherein the aldimine or ketimine contains a double or triple bond between two carbons.
(1) Note. This subclass contains, for example:

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[List of Patents for class 564 subclass 280]    280Phenol or thiophenol addition salts
 This subclass is indented under subclass 1.  Compounds which are formed by addition of a phenol or thiophenol to an amino nitrogen containing compound, as for example: RNH2 . HOC6H5.
  
[List of Patents for class 564 subclass 281]    281Quaternary ammonium containing
 This subclass is indented under subclass 1.  Compounds which are quaternary ammonium compounds wherein a pentavalent nitrogen is bonded by four valences to carbon.
(1) Note. This subclass contains, for example:

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[List of Patents for class 564 subclass 282]    282Benzene ring containing
 This subclass is indented under subclass 281.  Compounds wherein the quaternary ammonium compound contains a benzene ring.
(1) Note. This subclass contains, for example:

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[List of Patents for class 564 subclass 283]    283Two rings bonded directly to the same carbon
 This subclass is indented under subclass 282.  Compounds wherein the quaternary ammonium contains two rings bonded directly to the same carbon.
(1) Note. This subclass contains, for example:

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[List of Patents for class 564 subclass 284]    284Nitro or nitroso, bonded directly to carbon containing
 This subclass is indented under subclass 282.  Compounds wherein the quaternary ammonium contains a nitro or nitroso group directly bonded to carbon.
(1) Note. This subclass contains, for example:

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[List of Patents for class 564 subclass 285]    285Hydroxy, bonded directly to carbon, or ether containing (H of -OH may be replaced by a substituted or unsubstituted ammonium ion or a Group IA or IIA light metal)
 This subclass is indented under subclass 282.  Compounds wherein the quaternary ammonium contains an OH bonded directly to carbon, or an ether group, wherein the H of the -OH may be replaced by a substituted or unsubstituted ammonium ion or by a Group IA or IIA light metal.
(1) Note. This subclass contains, for example:

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[List of Patents for class 564 subclass 286]    286Polyquaternary ammonium
 This subclass is indented under subclass 285.  Compounds which contain more than one quaternary ammonium group.
(1) Note. This subclass contains, for example:

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[List of Patents for class 564 subclass 287]    287The hydroxy or ether oxygen is bonded directly to a ring
 This subclass is indented under subclass 285.  Compounds wherein the quaternary ammonium contains an -OX group bonded directly to a ring carbon, where X may be H, C, a substituted or unsubstituted ammonium ion or a Group IA or IIA light metal.
(1) Note. This subclass contains, for example:

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[List of Patents for class 564 subclass 288]    288Acyclic carbon to carbon unsaturation containing
 This subclass is indented under subclass 282.  Compounds wherein the quaternary ammonium contains a double or triple bond between two acyclic carbons.
(1) Note. This subclass contains, for example:

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[List of Patents for class 564 subclass 289]    289Halogen attached indirectly to the ammonium nitrogen by nonionic bonding
 This subclass is indented under subclass 282.  Compounds wherein the quaternary ammonium contains nonionically bonded halogen.
(1) Note. This subclass contains, for example:

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[List of Patents for class 564 subclass 290]    290Polyquaternary ammonium
 This subclass is indented under subclass 282.  Compounds which contain more than one quaternary ammonium group.
(1) Note. This subclass contains, for example:

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[List of Patents for class 564 subclass 291]    291Acyclic
 This subclass is indented under subclass 281.  Compounds wherein a quaternary ammonium compound does not contain a ring.
(1) Note. This subclass contains, for example:

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[List of Patents for class 564 subclass 292]    292Hydroxy, bonded directly to carbon, or ether containing (H of -OH may be replaced by a substituted or unsubstituted ammonium ion or a Group IA or IIA light metal)
 This subclass is indented under subclass 291.  Compounds which contain an OH bonded directly to carbon, or an ether group, wherein the H of the -OH may be replaced by a substituted or unsubstituted ammonium ion or by a Group IA or IIA light metal.
(1) Note. This subclass contains, for example:

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[List of Patents for class 564 subclass 293]    293Choline, beta-alkylcholines, ethers thereof, and salts thereof
 This subclass is indented under subclass 292.  Compounds which are choline, beta-alkyl cholines, or ethers thereof and their salts having the structure below wherein X and Y are H or C.

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(1) Note. This subclass contains, for example:

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[List of Patents for class 564 subclass 294]    294Polyoxyalkylene
 This subclass is indented under subclass 292.  Compounds wherein a quaternary ammonium contains the grouping below where n and m are positive integers and m is greater than one.

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(1) Note. This subclass contains, for example:

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[List of Patents for class 564 subclass 295]    295Polyquaternary ammonium
 This subclass is indented under subclass 291.  Compounds which contain more than one quaternary ammounium group.
(1) Note. This subclass contains, for example:

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[List of Patents for class 564 subclass 296]    296Processes
 This subclass is indented under subclass 291.  Processes for the preparation, purification, separation, or recovery of quaternary ammonium compounds classifiable only in that subclass.
  
[List of Patents for class 564 subclass 297]    297Amine oxides
 This subclass is indented under subclass 1.  Compounds which are amine oxides characterized by the structure below.