PATENTS   
Patents > Guidance, Tools, and Manuals > Classification > Class Schedule
    Class Numbers & Titles   | Class Numbers Only   | USPC Index   | International   | HELP  
You are viewing a USPC Schedule.
[Search a list of Patent Appplications for class 528]  Class   528SYNTHETIC RESINS OR NATURAL RUBBERS -- PART OF THE CLASS 520 SERIES
Click here for a printable version of this file
  Turn Outline  
     Expand/Contract Processing Please Wait
This Class 528 is considered to be an integral part of Class 520 (see the Class 520 schedule for the position of this Class in schedule hierarchy). This Class retains all pertinent definitions and class lines of Class 520
                SYNTHETIC RESINS (CLASS 520, SUBCLASS 1)
   [List of Patents for class 528 subclass 1]  1           Subclass 1 indent level is 1 FROM PLANT MATERIAL OF UNKNOWN CONSTITUTION
    [List of Patents for class 528 subclass 2]  2           Subclass 2 indent level is 2 From cashew material with a sulfur-containing reactant
    [List of Patents for class 528 subclass 3]  3           Subclass 3 indent level is 2 From cashew material with an aldehyde or derivative
   [List of Patents for class 528 subclass 4]  4           Subclass 4 indent level is 1 FROM BORON REACTANT HAVING AT LEAST ONE BORON TO HYDROGEN OR BORON TO CARBON BOND
    [List of Patents for class 528 subclass 5]  5           Subclass 5 indent level is 2 Boron reactant contains a silicon atom
    [List of Patents for class 528 subclass 6]  6           Subclass 6 indent level is 2 Boron reactant contains a phosphorus atom
    [List of Patents for class 528 subclass 7]  7           Subclass 7 indent level is 2 Boron reactant contains a nitrogen atom
    [List of Patents for class 528 subclass 8]  8           Subclass 8 indent level is 2 Boron reactant contains a boron atom bonded to at least one atom of oxygen
    [List of Patents for class 528 subclass 9]  9           Subclass 9 indent level is 1 FROM HEAVY METAL OR ALUMINUM REACTANT HAVING AT LEAST ONE HYDROGEN-TO-HEAVY METAL OR -ALUMINUM BOND OR AT LEAST ONE CARBON-TO-HEAVY METAL OR -ALUMINUM BOND
   [List of Patents for class 528 subclass 10]  10           Subclass 10 indent level is 1 FROM SILICON REACTANT HAVING AT LEAST ONE SILICON-TO-HYDROGEN OR -CARBON BOND
   [List of Patents for class 528 subclass 12]  12           Subclass 12 indent level is 2 Polymerizing in the pressence of a specified material other than a reactant
   [List of Patents for class 528 subclass 25]  25           Subclass 25 indent level is 2 With organic silicon-free reactant
    [List of Patents for class 528 subclass 30]  30           Subclass 30 indent level is 2 From silicon-containing reactant having at least one polyvalent atom other than carbon, oxygen, or nitrogen
    [List of Patents for class 528 subclass 31]  31           Subclass 31 indent level is 2 Silicon reactant contains a silicon-to-hydrogen bond
    [List of Patents for class 528 subclass 32]  32           Subclass 32 indent level is 2 Silicon reactant contains an ethylenically unsaturated group
   [List of Patents for class 528 subclass 33]  33           Subclass 33 indent level is 2 Silicon reactant contains two or more silicon atoms
    [List of Patents for class 528 subclass 38]  38           Subclass 38 indent level is 2 Silicon reactant contains an amine nitrogen atom
    [List of Patents for class 528 subclass 39]  39           Subclass 39 indent level is 2 With silicon reactant which is free of any silicon to carbon bond
    [List of Patents for class 528 subclass 40]  40           Subclass 40 indent level is 2 Silicon reactant contains a fused, bridged, or cycloaliphatic ring
    [List of Patents for class 528 subclass 41]  41           Subclass 41 indent level is 2 Silicon containing carboxylic acid or derivative or from a silicon derivative of a nonsilicon containing carboxylic acid
    [List of Patents for class 528 subclass 42]  42           Subclass 42 indent level is 2 Silicon reactant contains at least one halogen atom bonded to a carbon atom which carbon atom is not an acyl halide carbon atom
    [List of Patents for class 528 subclass 43]  43           Subclass 43 indent level is 2 Silicon reactant contains an aryl group
   [List of Patents for class 528 subclass 44]  44           Subclass 44 indent level is 1 FROM REACTANT HAVING AT LEAST ONE -N=C=X GROUP (WHEREIN X IS A CHALCOGEN ATOM) AS WELL AS PRECURSORS THEREOF, E.G., BLOCKED ISOCYANATE, ETC.
    [List of Patents for class 528 subclass 45]  45           Subclass 45 indent level is 2 From at least one blocked -N=C=X group
   [List of Patents for class 528 subclass 48]  48           Subclass 48 indent level is 2 Process of polymerizing in the presence of a specified material other than reactant
   [List of Patents for class 528 subclass 59]  59           Subclass 59 indent level is 2 From N=C=X reactant having at least two -C-NH-C(=X)- groups
    [List of Patents for class 528 subclass 67]  67           Subclass 67 indent level is 2 From two or more reactants containing -N=C=X groups
    [List of Patents for class 528 subclass 68]  68           Subclass 68 indent level is 2 With organic compound reactant containing at least two NH, HNH or =NH groups and wherein the reactant composition is devoid of -C-XH, -C(=X)XH or anhydride
    [List of Patents for class 528 subclass 69]  69           Subclass 69 indent level is 2 Reactant contains a single -N=C=X group
    [List of Patents for class 528 subclass 70]  70           Subclass 70 indent level is 2 Reactant contains a fluorine atom
    [List of Patents for class 528 subclass 71]  71           Subclass 71 indent level is 2 Reactant contains at least one salt group, e.g., quaternary ammonium salt, etc.
    [List of Patents for class 528 subclass 72]  72           Subclass 72 indent level is 2 Reactant contains at least one phosphorus atom
    [List of Patents for class 528 subclass 73]  73           Subclass 73 indent level is 2 Reactant contains at least one heterocyclic ring
    [List of Patents for class 528 subclass 74]  74           Subclass 74 indent level is 2 Reactant contains at least one bridged- or fused-ring system
    [List of Patents for class 528 subclass 74.5]  74.5           Subclass 74.5 indent level is 2 Reactant which is a fatty acid glycerol ester, a fatty acid or salt derived from a naturally occurring glyceride, tall oil, or a fatty acid derived from tall oil
    [List of Patents for class 528 subclass 75]  75           Subclass 75 indent level is 2 Reactant contains at least one ethylenically unsaturated group
   [List of Patents for class 528 subclass 76]  76           Subclass 76 indent level is 2 With ether or thioether compound containing at least two -C-X-C- groups
   [List of Patents for class 528 subclass 80]  80           Subclass 80 indent level is 2 With reactant compound containing at least two -C-C(=X)-X-C groups and which compound is devoid of C-NH, C=NH or C-N(H)-H groups
    [List of Patents for class 528 subclass 84]  84           Subclass 84 indent level is 2 With reactant containing at least two -C-C(=X)-X groups
    [List of Patents for class 528 subclass 85]  85           Subclass 85 indent level is 2 With reactant containing at least two -XH groups
   [List of Patents for class 528 subclass 86]  86           Subclass 86 indent level is 1 FROM PHENOL, PHENOL ETHER, OR INORGANIC PHENOLATE
   [List of Patents for class 528 subclass 87]  87           Subclass 87 indent level is 2 From 1,2-epoxy-containing phenolic reactant or with 1,2-epoxy-containing reactant
   [List of Patents for class 528 subclass 88]  88           Subclass 88 indent level is 3 Polymerizing in the presence of a specified material other than reactant
    [List of Patents for class 528 subclass 96]  96           Subclass 96 indent level is 3 Phenolic reactant contains a heterocyclic group other than a 1,2-epoxy group per se
    [List of Patents for class 528 subclass 97]  97           Subclass 97 indent level is 3 Phenolic reactant contains a fused-or bridged-ring other than as a 1,2 epoxy group fused to carbocyclic or aromatic ring
    [List of Patents for class 528 subclass 98]  98           Subclass 98 indent level is 3 Phenolic reactant contains at least three distinct aromatic or carbocyclic rings or mixtures thereof
    [List of Patents for class 528 subclass 99]  99           Subclass 99 indent level is 3 Phenolic reactant contains at least one nitrogen, phosphorus, or sulfur atom
    [List of Patents for class 528 subclass 100]  100           Subclass 100 indent level is 3 Phenolic reactant contains a carboxylic acid or carboxylic acid derivative thereof
    [List of Patents for class 528 subclass 101]  101           Subclass 101 indent level is 3 Phenolic reactant contains ethylenic unsaturation or contains a 1,2-epoxy group fused to a carbocyclic ring
    [List of Patents for class 528 subclass 102]  102           Subclass 102 indent level is 3 Phenolic reactant contains a halogen atom directly bonded to a nuclear carbon atom of the aryl-oxygen group
   [List of Patents for class 528 subclass 103]  103           Subclass 103 indent level is 3 Two or more 1,2-epoxy reactants
    [List of Patents for class 528 subclass 104]  104           Subclass 104 indent level is 3 Two or more phenolic reactants
  <