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| You are viewing a USPC Schedule. |
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| Class 372 | COHERENT LIGHT GENERATORS |
| Click here for a printable version of this file | |
![[List of Pre Grant Publications for class 372 subclass 1]](../as.gif) | ![[List of Patents for class 372 subclass 1]](../ps.gif) | 1 | SUPERRADIANT LASER |
| | 2 | FREE ELECTRON LASER |
| | 3 | RAMAN LASER |
| | 4 | LONG WAVELENGTH (E.G., FAR INFRARED) |
| | 5 | SHORT WAVELENGTH LASER |
| | 6 | OPTICAL FIBER LASER |
| | 7 | THIN FILM LASER |
| | 8 | LASER LOGIC SYSTEM |
| | 9 | PARTICULAR BEAM CONTROL DEVICE |
| | 10 |  Q-switch |
| | 18 | Mode locking |
| | 19 | Mode discrimination |
| | 20 | Tuning |
| | 21 | Nonlinear device |
| | 23 | Producing plural wavelength output |
| | 24 | Scanning |
| | 25 | Control of pulse characteristics |
| | 26 | Modulation |
| | 29.01 | Having particular beam control circuit component |
| | 29.011 |  Feedback circuitry |
| | 29.012 | Power supply |
| | 29.013 | Having particular electrode structure |
| | 29.014 | Controlling light intensity |
| | 29.015 | Controlling current or voltage |
| | 29.016 | Controlling beam phase |
| | 29.02 | Optical output stabilization |
| | 33 | PARTICULAR OPERATING COMPENSATION MEANS |
| | 34 | PARTICULAR TEMPERATURE CONTROL |
| | 37 | HAVING AN APPLIED MAGNETIC FIELD |
| | 38.1 | PARTICULAR COMPONENT CIRCUITRY |
| | 38.01 | Having feedback circuitry |
| | 38.02 | For driving or controlling laser |
| | 38.03 | Switch (e.g., thyratron, etc.) |
| | 38.04 | Power supply |
| | 38.05 | Electrode |
| | 38.06 | Optical pumping |
| | 38.07 | Controlling current or voltage to laser |
| | 38.08 | Having noise suppression circuitry |
| | 38.09 | Having fault protection circuitry |
| | 39 | PARTICULAR ACTIVE MEDIA |
| | 40 | Amorphous (e.g., glass) |
| | 41 | Insulating crystal |
| | 43.01 | Semiconductor |
| | 44.01 | Injection |
| | 44.011 |  Crystal orientation |
| | 45.01 | Particular confinement layer |
| | 45.011 |  With strained layer |
| | 45.012 | With superlattice structure |
| | 45.013 | With saturable absorption layer |
| | 46.01 | Particular current control structure |
| | 46.011 | Transverse junction |
| | 46.012 | Channeled substrate |
| | 46.013 | Having oxidized region |
| | 46.014 | Having air gap region |
| | 46.015 | Having implant region |
| | 46.016 | Disordered region |
| | 49.01 | Particular coating on facet |
| | 50.1 | Monolithic integrated |
| | 51 | Liquid |
| | 55 | Gas |
| | 56 | Metal vapor |
| | 57 | Excimer or exciplex |
| | 58 | With means for controlling gas flow |
| | 59 | Gas maintenance (e.g., purification, replenishment, etc.) |
| | 60 | Including a specified gas additive |
| | 61 | Discharge tube feature |
| | 66 | Active media with particular shape |
| | 68 | Plural active media or active media having plural dopants |
| | 69 | PARTICULAR PUMPING MEANS |
| | 70 | Pumping with optical or radiant energy |
| | 71 | End-pumped laser |
| | 72 | Pump cavity |
| | 73 | High-energy particles |
| | 75 | Semiconductor |
| | 76 | Plasma |
| | 77 | Exploding or combustible material |
| | 78 | Heat |
| | 79 | Solar |
| | 80 | Excited phosphor |
| | 81 | Electrical |
| | 82 | Inductive or capactive excitation |
| | 83 | Transversely excited |
| | 85 | Glow discharge |
| | 86 | Having an auxiliary ionization means |
| | 87 | Having particular electrode structure |
| | 89 | Chemical |
